SCHEMBL9856484

SCHEMBL9856484

CCC(C)Sc1ccc(O)cc1

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 8/20 0.45
SLC6A2 P23975 3/20 0.45
LMNA P02545 2/20 0.45
CYP1A2 P05177 2/20 0.45
PGR P06401 2/20 0.45
CHRM2 P08172 2/20 0.45
CYP3A4 P08684 2/20 0.45
ADORA3 P0DMS8 2/20 0.45
AR P10275 2/20 0.45
CYP2D6 P10635 2/20 0.45
MAPT P10636 2/20 0.45
CHRM1 P11229 2/20 0.45
CYP2C9 P11712 2/20 0.45
ALOX15 P16050 2/20 0.45
DRD1 P21728 2/20 0.45
TBXA2R P21731 2/20 0.45
PTGS1 P23219 2/20 0.45
CYP2C19 P33261 2/20 0.45
ADRA1A P35348 2/20 0.45
OPRM1 P35372 2/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6933131 0.81 TAAR1 (0.42) ESR1SLC6A2CYP2D6CYP2C9ALOX15
SCHEMBL11556171 0.80 ESR1 (0.40) ESR1SLC6A2LMNACYP1A2CHRM2
SCHEMBL4960257 0.80 ESR1 (0.46) ESR1SLC6A2LMNACYP1A2PGR
SCHEMBL10394300 0.78 SLC6A4 (0.50) HTTHTR2AHTR2CSLC6A4HTR2B
SCHEMBL9856255 0.78 HTT (0.34) HTTTSHRSLC6A4
SCHEMBL10144008 0.78 TSHR (0.50) SLC6A2CYP1A2CYP3A4CYP2D6MAPT
SCHEMBL12860701 0.78 SLC6A4 (0.39) ESR1SLC6A2LMNACYP1A2CHRM2
SCHEMBL9855446 0.78 MAOA (0.47) HTTTAAR1MEN1ALDH1A1KMT2A
SCHEMBL11309197 0.78 MAPK1 (0.42) CYP3A4MAPTTDP1HTTTSHR
SCHEMBL1453904 0.77 L3MBTL1 (0.45) LMNAMAPTTDP1HTTMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230132693-A1 RINSING LIQUID AND PATTERN FORMING METHOD FUJIFILM CORPORATION (JP) 2023-05-04 US disclosed
US-9551933-B2 Actinic ray-sensitive or radiation-sensitive resin composition, resist film, using the same, pattern forming method, manufacturing method of electronic device, and electronic device FUJIFILM CORPORATION (JP) 2017-01-24 US disclosed
US-20150140484-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, USING THE SAME, PATTERN FORMING METHOD, MANUFACTURING METHOD OF ELECTRONIC DEVICE, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2015-05-21 US disclosed
US-5037991-A Insecticides SANDOZ LTD. (CH) 1991-08-06 US disclosed
US-4968829-A ANTHELMINTICS, PARASITICIDES, NEMATOCIDES SANDOZ LTD. (CH) 1990-11-06 US disclosed
US-4697033-A INSECTICIDES SANDOZ LTD. (CH) 1987-09-29 US disclosed
US-4661617-A PESTICIDES SANDOZ LTD. (CH) 1987-04-28 US disclosed
US-4590282-A Pest control agents SANDOZ LTD. (CH) 1986-05-20 US disclosed
US-4143076-A MERCAPTO PHENOLIC AND ALKYLTHIO PHENOLIC ANTIOXIDANTS THE GOODYEAR TIRE & RUBBER COMPANY (US) 1979-03-06 US disclosed
US-4128530-A Mercapto phenolic and alkylthio phenolic antioxidants THE GOODYEAR TIRE & RUBBER COMPANY (US) 1978-12-05 US disclosed