⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Fluoride Ion SCHEMBL6232001 | 0.97 | TSHR (0.37) | — | |
| Fluoride Ion SCHEMBL946248 | 0.97 | TSHR (0.37) | — | |
| Hydrochloric Acid SCHEMBL6425322 | 0.97 | TSHR (0.37) | — | |
| Bromide SCHEMBL11582419 | 0.97 | TSHR (0.37) | — | |
| Water SCHEMBL6427091 | 0.97 | TSHR (0.37) | — | |
| SCHEMBL2475486 | 0.91 | LMNA (0.33) | — | |
| SCHEMBL11518513 | 0.88 | ALDH1A1 (0.35) | — | |
| SCHEMBL31047812 | 0.88 | LMNA (0.32) | — | |
| Perchlorate SCHEMBL3299468 | 0.88 | PTGS2 (0.32) | — | |
| SCHEMBL31047848 | 0.88 | LMNA (0.32) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1792 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9845416-B1 | Curable adhesive compositions for flexible substrates | SAES GETTERS S.P.A. (IT) | 2017-12-19 | — | — | US | claimed |
| US-20170349794-A1 | CURABLE ADHESIVE COMPOSITIONS FOR FLEXIBLE SUBSTRATES | SAES GETTERS S.P.A. (IT) | 2017-12-07 | — | — | US | claimed |
| EP-3180381-B1 | CURABLE ADHESIVE COMPOSITIONS FOR FLEXIBLE SUBSTRATES | GETTERS SPA (IT) | 2017-11-22 | — | — | EP | claimed |
| EP-3180381-A1 | CURABLE ADHESIVE COMPOSITIONS FOR FLEXIBLE SUBSTRATES | Saes Getters S.p.A. (IT) | 2017-06-21 | — | — | EP | claimed |
| WO-2017067865-A1 | CURABLE ADHESIVE COMPOSITIONS FOR FLEXIBLE SUBSTRATES | SAES GETTERS S.P.A. (IT) | 2017-04-27 | — | — | WO | claimed |
| EP-2469337-B1 | Positive photosensitive resin composition, method for forming pattern, and electronic component | HITACHI CHEM DUPONT MICROSYS (JP) | 2014-01-22 | — | — | EP | claimed |
| EP-1710230-B1 | Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | SHINETSU CHEMICAL CO (JP) | 2013-08-14 | — | — | EP | claimed |
| EP-1780199-B1 | Novel fluorohydroxyalkyl sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | SHINETSU CHEMICAL CO (JP) | 2012-02-01 | — | — | EP | claimed |
| EP-1780198-B1 | Novel fluorosulfonyloxyalkyl sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | SHINETSU CHEMICAL CO (JP) | 2011-10-05 | — | — | EP | claimed |
| US-6440634-B1 | MICROFABRICATION OF INTEGRATED CIRCUITS, DEEP UV LITHOGRAPHY; PHENYLSULFONATE SALTS OF SULFONIUM OR IODINIUM CATIONS | SHIN-ETSU CHEMICAL CO., LTD (JP) | 2002-08-27 | — | — | US | claimed |
| EP-0220792-B1 | A METHOD FOR PRODUCING 2-ARYL-PROPIONALDEHYDES | HAMARI YAKUHIN KOGYO KABUSHIKI KAISHA also known as HAMARI CHEMICALS, LTD. (JP) | 1990-08-29 | — | — | EP | claimed |
| US-4225497-A | ACID CATALYSTS FOR IMIDATION | RHONE-POULENC INDUSTRIES (FR) | 1980-09-30 | — | — | US | claimed |
| WO-2026100367-A1 | RESIST MATERIAL AND PATTERN FORMATION METHOD | 東京応化工業株式会社 | 2026-05-15 | — | — | WO | disclosed |
| US-12613465-B2 | Photosensitive resin composition and method for producing cured relief pattern | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2026-04-28 | — | — | US | disclosed |
| EP-4722810-A1 | RESIST MATERIAL, PATTERN FORMING METHOD, AND PATTERNED STRUCTURE | Tokyo Ohka Kogyo Co., Ltd. (JP) | 2026-04-08 | — | — | EP | disclosed |
| EP-4722811-A1 | RESIST COMPOSITION AND PATTERN FORMING METHOD | TOKYO OHKA KOGYO CO., LTD. (JP) | 2026-04-08 | — | — | EP | disclosed |
| EP-0220792-A1 | A method for producing 2-aryl-propionaldehydes | HAMARI YAKUHIN KOGYO KABUSHIKI KAISHA also known as HAMARI CHEMICALS, LTD. (JP) | 1987-05-06 | — | — | EP | disclosed |
| US-4632891-A | Process for the production of images | CIBA-GEIGY CORPORATION (US) | 1986-12-30 | — | — | US | disclosed |
| EP-0177453-A2 | Image-producing process | CIBA-GEIGY AG (CH) | 1986-04-09 | — | — | EP | disclosed |
| US-4225497-A | ACID CATALYSTS FOR IMIDATION | RHONE-POULENC INDUSTRIES (FR) | 1980-09-30 | — | — | US | disclosed |