SCHEMBL9869680

SCHEMBL9869680

CC(=O)Nc1ccccc1OCCO

nearest known ligand 0.65

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
LMNA P02545 5/20 0.65
SMN1; SMN2 Q16637 3/20 0.65
BRD4 O60885 1/20 0.65
HSD17B10 Q99714 1/20 0.55
KDM4E B2RXH2 1/20 0.55
POLB P06746 1/20 0.55
L3MBTL1 Q9Y468 1/20 0.55
KMT2A Q03164 2/20 0.54
RAB9A P51151 2/20 0.53
GAA P10253 2/20 0.51
NPC1 O15118 1/20 0.51
MAPT P10636 3/20 0.51
ALDH1A1 P00352 2/20 0.49
PKM P14618 1/20 0.49
HTT P42858 1/20 0.49
NLRP1 Q9C000 1/20 0.49
TSHR P16473 1/20 0.49
HPGD P15428 1/20 0.49

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1545262 0.92 LMNA (0.63) LMNASMN1; SMN2BRD4HSD17B10KDM4E
SCHEMBL11546122 0.91 LMNA (0.75) LMNASMN1; SMN2BRD4HSD17B10KDM4E
SCHEMBL9570553 0.88 LMNA (0.67) LMNASMN1; SMN2BRD4HSD17B10KDM4E
SCHEMBL9570675 0.88 LMNA (0.67) LMNASMN1; SMN2BRD4HSD17B10KDM4E
SCHEMBL7959649 0.87 RAB9A (0.67) LMNASMN1; SMN2BRD4HSD17B10KDM4E
SCHEMBL7956544 0.85 KMT2A (0.72) LMNASMN1; SMN2BRD4HSD17B10KDM4E
SCHEMBL248401 0.84 KMT2A (0.66) LMNASMN1; SMN2BRD4HSD17B10KDM4E
SCHEMBL13652613 0.84 GAA (0.60) LMNASMN1; SMN2KDM4EPOLBKMT2A
SCHEMBL1645837 0.83 GAA (0.73) LMNASMN1; SMN2BRD4HSD17B10KDM4E
SCHEMBL11482525 0.83 KMT2A (0.64) LMNASMN1; SMN2BRD4HSD17B10KDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5006660-A Reacting a halogenbenzene with alcohol or phenol in presence od copper(or compound thereof), amine, and base FUJI PHOTO FILM CO., LTD. (JP) 1991-04-09 US disclosed