SCHEMBL9908412

SCHEMBL9908412

CC(OC(=O)C1CC2CCC1C2)C1CCOC1=O

nearest known ligand 0.36

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NPC1 O15118 2/20 0.36
RAB9A P51151 2/20 0.36
MEN1 O00255 1/20 0.36
KMT2A Q03164 1/20 0.36
HSD11B1 P28845 1/20 0.34
POLB P06746 2/20 0.33
KCNQ3 O43525 1/20 0.33
KCNQ2 O43526 1/20 0.33
KCNQ4 P56696 1/20 0.33
KCNQ5 Q9NR82 1/20 0.33
L3MBTL1 Q9Y468 2/20 0.32
KDM4E B2RXH2 1/20 0.32
HTT P42858 1/20 0.32
TSHR P16473 1/20 0.31
HPGD P15428 3/20 0.31
SLC6A3 Q01959 1/20 0.31
HSD17B10 Q99714 1/20 0.31
ALDH1A1 P00352 1/20 0.31
MAPT P10636 1/20 0.31
MAPK1 P28482 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14625818 0.80 POLB (0.30) POLB
SCHEMBL2065143 0.75 POLB (0.46) NPC1RAB9AMEN1KMT2AHSD11B1
SCHEMBL9908400 0.74 ALDH1A1 (0.43) MEN1KMT2APOLBL3MBTL1KDM4E
SCHEMBL9908405 0.72 HPGD (0.34) NPC1MEN1KMT2APOLBHPGD
SCHEMBL17281548 0.71 POLB (0.42) NPC1RAB9AMEN1KMT2AHSD11B1
SCHEMBL2680079 0.71 POLB (0.36) POLBKDM4ETSHRALDH1A1MAPK1
SCHEMBL9908411 0.69 ALDH1A1 (0.32) NPC1RAB9AMEN1KMT2AKDM4E
SCHEMBL10115322 0.69 POLB (0.38) POLBKDM4EHPGDHSD17B10ALDH1A1
SCHEMBL23827198 0.69 POLB (0.44) NPC1RAB9AMEN1KMT2AHSD11B1
SCHEMBL9908387 0.68 LMNA (0.33) NPC1MEN1KMT2APOLBHTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9448482-B2 Pattern forming method, resist pattern formed by the method, method for manufacturing electronic device using the same, and electronic device FUJIFILM CORPORATION (JP) 2016-09-20 US disclosed
US-20150253673-A1 PATTERN FORMING METHOD, RESIST PATTERN FORMED BY THE METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE USING THE SAME, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2015-09-10 US disclosed
US-8198016-B2 Patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-06-12 US disclosed
US-20090286188-A1 Patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-11-19 US disclosed
US-7163778-B2 Anti-reflection film material and a substrate having an anti-reflection film and a method for forming a pattern SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-01-16 US disclosed