SCHEMBL9929709

SCHEMBL9929709

C=C(CC(CC1CCCCC1)C1CCCCC1)C(=O)O

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.49
TET2 Q6N021 3/20 0.36
TET3 O43151 1/20 0.36
TET1 Q8NFU7 1/20 0.36
GRIK1 P39086 1/20 0.35
GRIK2 Q13002 1/20 0.35
GRM1 Q13255 1/20 0.35
GRM2 Q14416 1/20 0.35
EPHX1 P07099 3/20 0.35
LTA4H P09960 1/20 0.34
KMT2A Q03164 2/20 0.33
HPGD P15428 1/20 0.33
DPP4 P27487 1/20 0.32
MEN1 O00255 1/20 0.32
MITF O75030 1/20 0.32
LMNA P02545 1/20 0.32
TP53 P04637 1/20 0.32
CYP3A4 P08684 1/20 0.32
MAPT P10636 1/20 0.32
ALOX15 P16050 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16267285 0.77 ALDH1A1 (0.47) ALDH1A1TET2TET3TET1GRIK1
SCHEMBL676351 0.74 ALDH1A1 (0.44) ALDH1A1TET2TET3TET1GRIK1
SCHEMBL19404066 0.73 EPHX1 (0.40) ALDH1A1EPHX1LMNATP53MAPT
SCHEMBL2999144 0.73 EPHX1 (0.40) ALDH1A1EPHX1LMNATP53MAPT
SCHEMBL28480892 0.72 ALDH1A1 (0.77) ALDH1A1EPHX1KMT2AMEN1MITF
SCHEMBL23494790 0.72 ALDH1A1 (0.42) ALDH1A1TET2TET3TET1GRIK1
SCHEMBL3635972 0.71 EPHX1 (0.39) ALDH1A1EPHX1LMNATP53MAPT
SCHEMBL8753797 0.71 SLC1A3 (0.33) ALDH1A1EPHX1
SCHEMBL10814953 0.70 EPHX1 (0.45) EPHX1KMT2AHPGDLMNA
SCHEMBL4610177 0.70 EPHX1 (0.45) EPHX1KMT2AHPGDLMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8758978-B2 Radiation-sensitive resin composition, resist pattern formation method, and polymer JSR CORPORATION (JP) 2014-06-24 US disclosed
US-8535871-B2 Radiation-sensitive resin composition, method for forming a resist pattern, compound, and polymer JSR CORPORATION (JP) 2013-09-17 US disclosed
US-20120171612-A1 RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN FORMATION METHOD, AND POLYMER JSR CORPORATION (JP) 2012-07-05 US disclosed
US-20120156612-A1 RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING A RESIST PATTERN, COMPOUND, AND POLYMER JSR CORPORATION (JP) 2012-06-21 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20120156612-A1 RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING A RESIST PATTERN, COMPOUND, AND POLYMER RER1, PRMT1, REV1 ALDH1A1 2002/4885TET2 1186/4885TET3 476/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.