SCHEMBL993109

SCHEMBL993109

NOc1nc(O)nc(O)n1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5671535 0.74 SHBG (0.32)
SCHEMBL1426652 0.73
Hydrazine SCHEMBL3475792 0.71
SCHEMBL24459 0.71
SCHEMBL192561 0.69 LMNA (0.35)
SCHEMBL8935319 0.69
Bromide SCHEMBL7178493 0.67
Fluoride SCHEMBL498862 0.67
Hydrochloric Acid SCHEMBL546609 0.67
SCHEMBL21385109 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 35 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-105824197-A Coating compositions for use with an overcoated photoresist 罗门哈斯电子材料有限公司 2016-08-03 CN claimed
US-9244352-B2 Coating compositions for use with an overcoated photoresist ROHM AND HAAS ELECTRONIC MATERIALS, LLC (US) 2016-01-26 US claimed
US-20110033800-A1 COATING COMPOSITIONS FOR USE WITH AN OVERCOATED PHOTORESIST ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2011-02-10 US claimed
US-20110033801-A1 COATING COMPOSITIONS FOR USE WITH AN OVERCOATED PHOTORESIST ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2011-02-10 US claimed
EP-2275490-A1 Coating compositions for use with an overcoated photoresist Rohm and Haas Electronic Materials, L.L.C. (US) 2011-01-19 EP claimed
EP-2258691-A1 Coating compositions for use with an overcoated photoresist Rohm and Haas Electronic Materials, L.L.C. (US) 2010-12-08 EP claimed
US-4223073-A POLYCYANURATE MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1980-09-16 US claimed
US-11269252-B2 Method for forming pattern using antireflective coating composition including photoacid generator ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2022-03-08 US disclosed
CN-112285998-A Method for forming pattern using antireflective coating composition comprising photoacid generator 罗门哈斯电子材料有限责任公司 2021-01-29 CN disclosed
US-20210026242-A1 METHOD FOR FORMING PATTERN USING ANTIREFLECTIVE COATING COMPOSITION INCLUDING PHOTOACID GENERATOR U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2021-01-28 US disclosed
CN-109822702-A A kind of high steady wood fire retardant 王金华 2019-05-31 CN disclosed
CN-106738147-B A kind of preparation method of anti-current mistake type wood fire retardant 江苏凯尔消防工程设备有限公司 2018-09-07 CN disclosed
US-9796859-B2 Insulation layer-forming composition and use thereof HILTI AKTIENGESELLSCHAFT (LI) 2017-10-24 US disclosed
US-20110033800-A1 COATING COMPOSITIONS FOR USE WITH AN OVERCOATED PHOTORESIST ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2011-02-10 US disclosed
EP-2275490-A1 Coating compositions for use with an overcoated photoresist Rohm and Haas Electronic Materials, L.L.C. (US) 2011-01-19 EP disclosed
EP-2258691-A1 Coating compositions for use with an overcoated photoresist Rohm and Haas Electronic Materials, L.L.C. (US) 2010-12-08 EP disclosed
EP-2258691-A1 Coating compositions for use with an overcoated photoresist Rohm and Haas Electronic Materials, L.L.C. (US) 2010-12-08 EP disclosed
CN-101688056-A Polyester polycarbonate composition, its preparation method and by its goods that form SABIC INNOVATIVE PLASTICS IP 2010-03-31 CN disclosed
US-4223073-A POLYCYANURATE MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1980-09-16 US disclosed
US-4075094-A OXIDATION, PH FMC CORPORATION (US) 1978-02-21 US disclosed