Iodide

Iodide

SCHEMBL9934390

C=CCN(CC=C)C(C)c1ccccc1.I

nearest known ligand 0.40

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ACHECHRM1CHRM3CHRNA1CHRNB1CHRNDCHRNECHRNG

The experimentally established mechanism targets of Iodide. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
HTR2A P28223 3/20 0.38
HRH1 P35367 3/20 0.38
ALOX5 P09917 1/20 0.38
CYP2C19 P33261 1/20 0.38
TAAR1 Q96RJ0 2/20 0.36
RIPK1 Q13546 2/20 0.36
AOC3 Q16853 1/20 0.36
OPRD1 P41143 1/20 0.36
ALDH1A1 P00352 1/20 0.36
TDP1 Q9NUW8 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1137366 0.98 HTR2A (0.39) HTR2AHRH1ALOX5CYP2C19TAAR1
Hydrochloric Acid SCHEMBL1898617 0.96 TDP1 (0.39) HTR2AHRH1ALOX5CYP2C19TAAR1
Bromide SCHEMBL9933509 0.96 HTR2A (0.38) HTR2AHRH1ALOX5CYP2C19TAAR1
SCHEMBL7166960 0.83 ALOX5 (0.42) ALOX5CYP2C19
SCHEMBL9933271 0.83 RAB9A (0.39) ALOX5CYP2C19ALDH1A1TDP1
SCHEMBL3259406 0.81 HTR2A (0.42) HTR2AHRH1ALOX5CYP2C19AOC3
SCHEMBL15389719 0.80 HCAR2 (0.35) ALOX5CYP2C19ALDH1A1TDP1
SCHEMBL1628983 0.79
SCHEMBL4828076 0.79 PYCR1 (0.47) HTR2AHRH1ALOX5CYP2C19
SCHEMBL4828058 0.79 PYCR1 (0.47) HTR2AHRH1ALOX5CYP2C19

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-107075036-B Polyacrylamide resin, papermaking additive and paper HARIMA CHEMICALS, INC. (JP) 2019-11-01 CN disclosed
CN-110003386-A Polyacrylamide resin, additive for paper making and paper 哈利玛化成株式会社 2019-07-12 CN disclosed
CN-107075036-A Polyacrylamide resin, papermaking additive and paper 哈利玛化成株式会社 2017-08-18 CN disclosed
CN-102533220-B Polishing composition for magnetic disk substrate KAO CORP. (JP) 2015-11-18 CN disclosed
US-9159352-B2 Polishing liquid composition for magnetic disk substrate KAO CORPORATION (JP) 2015-10-13 US disclosed
CN-102190848-B Metal-containing crosslinked amphiphilic copolymer and manufacture method thereof and deodorant NITTO BOSEIKI CO., LTD. (JP) 2014-10-08 CN disclosed
CN-103503068-A Manufacturing method of magnetic disk substrate KAO CORP 2014-01-08 CN disclosed
US-20140001155-A1 MANUFACTURING METHOD OF MAGNETIC DISK SUBSTRATE KAO CORPORATION (JP) 2014-01-02 US disclosed
US-20130309946-A1 METHOD FOR MANUFACTURING MAGNETIC DISC SUBSTRATE KAO CORPORATION (JP) 2013-11-21 US disclosed
CN-103339673-A Method for manufacturing magnetic disc substrate KAO CORP 2013-10-02 CN disclosed
CN-101687698-B Glass fiber sizing agent containing amphoteric polymer compound NITTO BOSEKI CO LTD 2012-08-01 CN disclosed
CN-102533220-A Polishing composition for magnetic disk substrate KAO CORP 2012-07-04 CN disclosed
US-20120156968-A1 POLISHING LIQUID COMPOSITION FOR MAGNETIC DISK SUBSTRATE KAO CORPORATION (JP) 2012-06-21 US disclosed
CN-102190848-A Metal-containing crosslinked amphiphilic copolymer and manufacture method thereof and deodorant NITTO BOSEKI CO LTD 2011-09-21 CN disclosed
CN-101687698-A Glass fiber sizing agent containing amphoteric polymer compound NITTO BOSEKI CO LTD 2010-03-31 CN disclosed