Known targets — ChEMBL curated mechanism
AGTR1DHFRGABBR1GABBR2GABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQGARTNR3C2PBP2XPTGS1PTGS2VKORC1blablaT-3blaT-4blaT-5blaT-6dacAdacBdacCfolAftsImrcAmrcBmrdApbp1apbp1bpbp2apbp2bpbp3polthyA
The experimentally established mechanism targets of Potassium Ion. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL131346 | 0.97 | — | — | |
| Lithium Ion SCHEMBL7968674 | 0.97 | — | — | |
| SCHEMBL7198451 | 0.97 | — | — | |
| Potassium Ion SCHEMBL10714712 | 0.87 | — | — | |
| SCHEMBL10711369 | 0.84 | — | — | |
| Potassium Ion SCHEMBL10748159 | 0.83 | CA2 (0.32) | — | |
| SCHEMBL1547924 | 0.80 | CA2 (0.35) | — | |
| SCHEMBL10707451 | 0.80 | CA2 (0.35) | — | |
| Potassium Ion SCHEMBL31105848 | 0.77 | CYP3A4 (0.34) | — | |
| SCHEMBL3321509 | 0.76 | FABP3 (0.39) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-114846183-B | Heater coating agent for false twist machine | 竹本油脂株式会社 | 2023-12-01 | — | — | CN | disclosed |
| CN-114846183-A | Heater coating agent for false twist processing machine | 竹本油脂株式会社 | 2022-08-02 | — | — | CN | disclosed |
| EP-2475000-B1 | PROCESSING AGENT COMPOSITION FOR SEMICONDUCTOR SURFACE AND METHOD FOR PROCESSING SEMICONDUCTOR SURFACE USING SAME | WAKO PURE CHEM IND LTD (JP) | 2015-07-01 | — | — | EP | disclosed |
| US-9034810-B2 | Processing agent composition for semiconductor surface and method for processing semiconductor surface using same | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2015-05-19 | — | — | US | disclosed |
| US-9006164-B2 | Resist remover composition and method for removing resist using the composition | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2015-04-14 | — | — | US | disclosed |
| EP-2474862-B1 | COMPOSITION FOR REMOVING A RESIST ON A SEMICONDUCTOR SUBSTRATE AND METHOD FOR REMOVING RESIST USING THE COMPOSITION | WAKO PURE CHEM IND LTD (JP) | 2015-02-25 | — | — | EP | disclosed |
| EP-2474862-A1 | RESIST REMOVER COMPOSITION AND METHOD FOR REMOVING RESIST USING THE COMPOSITION | Wako Pure Chemical Industries, Ltd. (JP) | 2012-07-11 | — | — | EP | disclosed |
| EP-2475000-A1 | PROCESSING AGENT COMPOSITION FOR SEMICONDUCTOR SURFACE AND METHOD FOR PROCESSING SEMICONDUCTOR SURFACE USING SAME | Wako Pure Chemical Industries, Ltd. (JP) | 2012-07-11 | — | — | EP | disclosed |
| US-20120172274-A1 | RESIST REMOVER COMPOSITION AND METHOD FOR REMOVING RESIST USING THE COMPOSITION | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2012-07-05 | — | — | US | disclosed |
| US-20120157368-A1 | PROCESSING AGENT COMPOSITION FOR SEMICONDUCTOR SURFACE AND METHOD FOR PROCESSING SEMICONDUCTOR SURFACE USING SAME | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2012-06-21 | — | — | US | disclosed |
| US-4883586-A | INCREASING THE RECOVERY OF MINERAL VALUES USING A COLUMN FLOT-ATION UNIT CELL | J. R. SIMPLOT CO. (US) | 1989-11-28 | — | — | US | disclosed |
| EP-0121398-B1 | ANTISTATIC ACRYLIC RESIN COMPOSITION AND METHOD FOR THE PRODUCTION THEREOF | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1988-08-17 | — | — | EP | disclosed |
| US-4699964-A | COPOLYMER OF METHYL METHACRYLATE, ALLYL SULFONATE, IN PRESENCE OF AN ALKYLENE OXIDE AND PHOSPHATE | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1987-10-13 | — | — | US | disclosed |
| US-4604414-A | Antistatic acrylic resin composition and method for the production thereof | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1986-08-05 | — | — | US | disclosed |
| EP-0121398-A1 | Antistatic acrylic resin composition and method for the production thereof | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1984-10-10 | — | — | EP | disclosed |