Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.40 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.40 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.40 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.40 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.40 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.40 |
| ▸ | MEN1 | O00255 | 2/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.39 |
| ▸ | NPC1 | O15118 | 1/20 | 0.39 |
| ▸ | RAB9A | P51151 | 1/20 | 0.39 |
| ▸ | EPHX2 | P34913 | 2/20 | 0.39 |
| ▸ | POLB | P06746 | 1/20 | 0.34 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.34 |
| ▸ | INPP5A | Q14642 | 1/20 | 0.32 |
| ▸ | HPGD | P15428 | 2/20 | 0.32 |
| ▸ | P2RX7 | Q99572 | 1/20 | 0.32 |
| ▸ | PER2 | O15055 | 1/20 | 0.32 |
| ▸ | CRY1 | Q16526 | 1/20 | 0.32 |
| ▸ | CRY2 | Q49AN0 | 1/20 | 0.32 |
| ▸ | MEP1B | Q16820 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18775645 | 0.89 | CYP1A2 (0.38) | HSD17B10CYP1A2CYP2D6CYP2C9CYP2C19 | |
| SCHEMBL13005302 | 0.80 | INPP5A (0.47) | HSD17B10CYP1A2CYP2D6CYP2C9CYP2C19 | |
| SCHEMBL25233759 | 0.76 | MEN1 (0.41) | MEN1KMT2ANPC1RAB9AEPHX2 | |
| SCHEMBL18403046 | 0.76 | MEN1 (0.34) | MEN1KMT2ANPC1RAB9AP2RX7 | |
| SCHEMBL10172863 | 0.74 | MEN1 (0.45) | MEN1KMT2ANPC1RAB9APOLB | |
| SCHEMBL18785775 | 0.74 | CYP1A2 (0.35) | HSD17B10CYP1A2CYP2D6CYP2C9CYP2C19 | |
| SCHEMBL18775721 | 0.74 | MEN1 (0.38) | HSD17B10CYP1A2CYP2D6CYP2C9CYP2C19 | |
| SCHEMBL23781764 | 0.74 | CYP1A2 (0.38) | HSD17B10CYP1A2CYP2D6CYP2C9CYP2C19 | |
| SCHEMBL10835600 | 0.73 | NPC1 (0.42) | HSD17B10MEN1KMT2ANPC1RAB9A | |
| SCHEMBL222555 | 0.73 | MEN1 (0.41) | HSD17B10CYP1A2CYP2D6CYP2C9CYP2C19 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 50 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11822240-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-11-21 | — | — | US | disclosed |
| US-11747726-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-09-05 | — | — | US | disclosed |
| WO-2023153296-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD | JSR株式会社 | 2023-08-17 | — | — | WO | disclosed |
| US-11709425-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-07-25 | — | — | US | disclosed |
| US-11635686-B2 | Resist composition, method of forming resist pattern, and compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-04-25 | — | — | US | disclosed |
| US-20220121118-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2022-04-21 | — | — | US | disclosed |
| US-11221557-B2 | Resist composition, method of forming resist pattern, compound, and acid generator | TOKYO OHKA KOGYO CO., LTD. (JP) | 2022-01-11 | — | — | US | disclosed |
| US-20210397086-A1 | RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD | TOKYO OHKA KOGYO CO., LTD. (JP) | 2021-12-23 | — | — | US | disclosed |
| US-11204551-B2 | Resist composition and method for forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2021-12-21 | — | — | US | disclosed |
| US-20210200087-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2021-07-01 | — | — | US | disclosed |
| US-20120015299-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUND, AND ACID GENERATOR | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-01-19 | — | — | US | disclosed |
| US-8012669-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2011-09-06 | — | — | US | disclosed |
| US-20110117499-A1 | POSITIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN USING THE SAME, AND FLUORINE-CONTAINING POLYMERIC COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2011-05-19 | — | — | US | disclosed |
| US-7914968-B2 | Positive resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2011-03-29 | — | — | US | disclosed |
| US-20100304289-A1 | POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-12-02 | — | — | US | disclosed |
| US-20100273106-A1 | POSITIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COMPOUND, AND COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-10-28 | — | — | US | disclosed |
| US-20100233626-A1 | POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-09-16 | — | — | US | disclosed |
| US-20100233624-A1 | POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-09-16 | — | — | US | disclosed |
| US-20100035192-A1 | METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-02-11 | — | — | US | disclosed |
| US-20090226842-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-09-10 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-11709425-B2 | Resist composition and method of forming resist pattern | RER1, RRS1, RXFP4 | HSD17B10 661/4885CYP1A2 717/4885CYP2D6 950/4885 |
| US-20120015299-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUND, AND ACID GENERATOR | RER1, ASIC1, ABCC1 | HSD17B10 305/4885CYP1A2 379/4885CYP2D6 1449/4885 |
| US-20100273106-A1 | POSITIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COMPOUND, AND COMPOUND | RDX, DAD1, DDX1 | HSD17B10 2909/4885CYP1A2 2875/4885CYP2D6 4184/4885 |
| US-11635686-B2 | Resist composition, method of forming resist pattern, and compound | FXR1, HNRNPA1, RBM3 | HSD17B10 3497/4885CYP1A2 2965/4885CYP2D6 2622/4885 |
| US-11221557-B2 | Resist composition, method of forming resist pattern, compound, and acid generator | RER1, GRM1, RRS1 | HSD17B10 1461/4885CYP1A2 1000/4885CYP2D6 826/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.