SCHEMBL9949465

SCHEMBL9949465

O=Cc1ccccc1CCC1CCCCC1

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CEL P19835 4/20 0.45
SRC P12931 1/20 0.44
RAB9A P51151 3/20 0.39
L3MBTL1 Q9Y468 1/20 0.39
BCHE P06276 2/20 0.39
MEN1 O00255 1/20 0.39
LMNA P02545 1/20 0.39
THRB P10828 1/20 0.39
BLM P54132 1/20 0.39
KMT2A Q03164 1/20 0.39
TDP1 Q9NUW8 1/20 0.39
NPC1 O15118 2/20 0.38
SIGMAR1 Q99720 1/20 0.38
EPHX2 P34913 2/20 0.37
DAO P14920 1/20 0.36
CYSLTR2 Q9NS75 1/20 0.36
CYSLTR1 Q9Y271 1/20 0.36
ALDH1A1 P00352 1/20 0.36
HPGD P15428 1/20 0.36
NFKB1 P19838 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9950280 0.90 CEL (0.48) CELSRCRAB9ABCHEMEN1
SCHEMBL9949898 0.89 CEL (0.49) CELSRCRAB9ABCHENPC1
SCHEMBL9480562 0.88 CYSLTR2 (0.49) CELSRCBCHESIGMAR1CYSLTR2
SCHEMBL9950298 0.84 LMNA (0.36) MEN1LMNATHRBBLMKMT2A
SCHEMBL9950673 0.84 MEN1 (0.36) MEN1LMNATHRBBLMKMT2A
SCHEMBL9950261 0.84 MEN1 (0.36) MEN1LMNATHRBBLMKMT2A
Ethylene SCHEMBL9950628 0.83 SRC (0.37) CELSRCBCHEMEN1KMT2A
SCHEMBL9951041 0.83 SRC (0.34) CELSRCMEN1LMNATHRB
SCHEMBL9949855 0.83 CHRNA7 (0.35) SRCBCHEMEN1LMNATHRB
SCHEMBL9949687 0.83 SRC (0.34) CELSRCMEN1LMNATHRB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8748078-B2 Cyclic compound, process for preparation thereof, radiation-sensitive composition, and method for formation of resist pattern MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2014-06-10 US disclosed
US-20130004894-A1 UNDER COAT FILM MATERIAL AND METHOD OF FORMING MULTILAYER RESIST PATTERN MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2013-01-03 US disclosed
EP-2535768-A1 UNDERLAYER FILM MATERIAL, AND METHOD FOR FORMATION OF MULTILAYER RESIST PATTERN Mitsubishi Gas Chemical Company, Inc. (JP) 2012-12-19 EP disclosed
EP-2476662-A1 CYCLIC COMPOUND, PROCESS FOR PREPARATION THEREOF, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN Mitsubishi Gas Chemical Company, Inc. (JP) 2012-07-18 EP disclosed
US-20120164576-A1 CYCLIC COMPOUND, PROCESS FOR PREPARATION THEREOF, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2012-06-28 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20120164576-A1 CYCLIC COMPOUND, PROCESS FOR PREPARATION THEREOF, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN RAD1, RER1, REV1 CEL 2007/4885SRC 3498/4885RAB9A 929/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.