SCHEMBL9950673

SCHEMBL9950673

CC1CCC(CCc2ccccc2C=O)CC1

nearest known ligand 0.37

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 1/20 0.36
LMNA P02545 1/20 0.36
THRB P10828 1/20 0.36
BLM P54132 1/20 0.36
KMT2A Q03164 1/20 0.36
TDP1 Q9NUW8 1/20 0.36
ALDH1A1 P00352 2/20 0.35
TSHR P16473 1/20 0.35
ADAMTS4 O75173 2/20 0.34
ADAMTS5 Q9UNA0 2/20 0.34
MMP2 P08253 1/20 0.34
HRH1 P35367 1/20 0.33
MAOA P21397 1/20 0.33
MAOB P27338 1/20 0.33
ACHE P22303 1/20 0.33
GAA P10253 1/20 0.33
HPGD P15428 1/20 0.33
SLC6A4 P31645 2/20 0.33
SLC18A2 Q05940 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9950261 0.88 MEN1 (0.36) MEN1LMNATHRBBLMKMT2A
SCHEMBL9950298 0.88 LMNA (0.36) MEN1LMNATHRBBLMKMT2A
Ethylene SCHEMBL9949690 0.85 ALDH1A1 (0.30) ALDH1A1
SCHEMBL9949465 0.84 CEL (0.45) MEN1LMNATHRBBLMKMT2A
SCHEMBL9949665 0.84 MEN1 (0.39) MEN1LMNATHRBBLMKMT2A
SCHEMBL9949687 0.84 SRC (0.34) MEN1LMNATHRBBLMKMT2A
SCHEMBL8450967 0.82 MAOA (0.43) MAOAMAOB
SCHEMBL9949855 0.78 CHRNA7 (0.35) MEN1LMNATHRBBLMKMT2A
SCHEMBL9951041 0.78 SRC (0.34) MEN1LMNATHRBBLMKMT2A
SCHEMBL16191827 0.77 ACHE (0.51) ALDH1A1ADAMTS4ADAMTS5MMP2HRH1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8748078-B2 Cyclic compound, process for preparation thereof, radiation-sensitive composition, and method for formation of resist pattern MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2014-06-10 US disclosed
EP-2476662-A1 CYCLIC COMPOUND, PROCESS FOR PREPARATION THEREOF, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN Mitsubishi Gas Chemical Company, Inc. (JP) 2012-07-18 EP disclosed
CN-102596874-A Cyclic compound, method for producing same, radiation-sensitive composition, and method for forming resist pattern MITSUBISHI GAS CHEMICAL CO 2012-07-18 CN disclosed
US-20120164576-A1 CYCLIC COMPOUND, PROCESS FOR PREPARATION THEREOF, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2012-06-28 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20120164576-A1 CYCLIC COMPOUND, PROCESS FOR PREPARATION THEREOF, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN RAD1, RER1, REV1 MEN1 187/4885LMNA 298/4885THRB 2930/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.