Ethylene

Ethylene

SCHEMBL9949578

C=C.CCC1CCCC(Cc2cccc(C=O)c2)C1.CCOC(C)OCC

nearest known ligand 0.34

Full drug profile on Sugi Atlas →

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
EED O75530 1/20 0.34
DRD2 P14416 1/20 0.33
DRD1 P21728 1/20 0.33
DRD4 P21917 1/20 0.33
DRD5 P21918 1/20 0.33
DRD3 P35462 1/20 0.33
MAOA P21397 3/20 0.32
MAOB P27338 3/20 0.32
BRD4 O60885 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Ethylene SCHEMBL9951497 0.92 DRD2 (0.34) EEDDRD2DRD1DRD4DRD5
Ethylene SCHEMBL9950535 0.90 EED (0.34) EEDDRD2DRD1DRD4DRD5
Ethylene SCHEMBL9949856 0.90 DRD2 (0.34) EEDDRD2DRD1DRD4DRD5
Ethylene SCHEMBL9949994 0.90 MAOA (0.33) DRD2DRD1DRD4DRD5DRD3
SCHEMBL9950299 0.87 DRD2 (0.40) EEDDRD2DRD1DRD4DRD5
Ethylene SCHEMBL9950206 0.86 ALDH1A1 (0.32)
Ethylene SCHEMBL9950593 0.84 MAOA (0.33) DRD2DRD1DRD4DRD5DRD3
Ethylene SCHEMBL9950309 0.83 DRD2 (0.33) DRD2DRD1DRD4DRD5DRD3
Ethylene SCHEMBL9949721 0.83 DRD2 (0.33) DRD2DRD1DRD4DRD5DRD3
Ethylene SCHEMBL9950433 0.81 DRD2 (0.32) DRD2DRD1DRD4DRD5DRD3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8748078-B2 Cyclic compound, process for preparation thereof, radiation-sensitive composition, and method for formation of resist pattern MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2014-06-10 US disclosed
EP-2476662-A1 CYCLIC COMPOUND, PROCESS FOR PREPARATION THEREOF, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN Mitsubishi Gas Chemical Company, Inc. (JP) 2012-07-18 EP disclosed
US-20120164576-A1 CYCLIC COMPOUND, PROCESS FOR PREPARATION THEREOF, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2012-06-28 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20120164576-A1 CYCLIC COMPOUND, PROCESS FOR PREPARATION THEREOF, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN RAD1, RER1, REV1 EED 4723/4885DRD2 2661/4885DRD1 1092/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.