SCHEMBL9949655

SCHEMBL9949655

CCCC1CCC(Cc2ccccc2C=O)CC1

nearest known ligand 0.36

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 2/20 0.36
MEN1 O00255 2/20 0.36
KMT2A Q03164 2/20 0.36
THRB P10828 1/20 0.36
BLM P54132 1/20 0.36
TDP1 Q9NUW8 1/20 0.36
CYP2C9 P11712 1/20 0.36
OPRL1 P41146 3/20 0.36
ALDH1A1 P00352 3/20 0.35
TSHR P16473 1/20 0.35
MAPT P10636 2/20 0.35
OPRM1 P35372 2/20 0.34
OPRK1 P41145 1/20 0.34
HPGD P15428 1/20 0.33
HTT P42858 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.33
DRD3 P35462 2/20 0.32
BCHE P06276 1/20 0.32
HRH3 Q9Y5N1 1/20 0.32
MAPK1 P28482 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9950298 0.88 LMNA (0.36) LMNAMEN1KMT2ATHRBBLM
SCHEMBL9950949 0.87 MEN1 (0.39) LMNAMEN1KMT2ATHRBBLM
SCHEMBL9950011 0.87 CHRNA7 (0.35) LMNAMEN1KMT2ATHRBBLM
Ethylene SCHEMBL9950554 0.86 HTR1A (0.32)
SCHEMBL9949665 0.84 MEN1 (0.39) LMNAMEN1KMT2ATHRBBLM
SCHEMBL9950572 0.80 SRC (0.46) LMNAMEN1KMT2ATHRBBLM
SCHEMBL9951217 0.79 CA1 (0.35) LMNAMEN1KMT2ATHRBBLM
SCHEMBL9950261 0.78 MEN1 (0.36) LMNAMEN1KMT2ATHRBBLM
SCHEMBL7788617 0.78 CYP2C9 (0.42) LMNAMEN1KMT2ATHRBBLM
SCHEMBL9949855 0.78 CHRNA7 (0.35) LMNAMEN1KMT2ATHRBBLM

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8748078-B2 Cyclic compound, process for preparation thereof, radiation-sensitive composition, and method for formation of resist pattern MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2014-06-10 US disclosed
EP-2476662-A1 CYCLIC COMPOUND, PROCESS FOR PREPARATION THEREOF, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN Mitsubishi Gas Chemical Company, Inc. (JP) 2012-07-18 EP disclosed
CN-102596874-A Cyclic compound, method for producing same, radiation-sensitive composition, and method for forming resist pattern MITSUBISHI GAS CHEMICAL CO 2012-07-18 CN disclosed
US-20120164576-A1 CYCLIC COMPOUND, PROCESS FOR PREPARATION THEREOF, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2012-06-28 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20120164576-A1 CYCLIC COMPOUND, PROCESS FOR PREPARATION THEREOF, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN RAD1, RER1, REV1 LMNA 298/4885MEN1 187/4885KMT2A 3487/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.