SCHEMBL9949665

SCHEMBL9949665

CC1CCC(Cc2ccccc2C=O)CC1

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 2/20 0.39
KMT2A Q03164 2/20 0.39
LMNA P02545 1/20 0.39
THRB P10828 1/20 0.39
BLM P54132 1/20 0.39
TDP1 Q9NUW8 1/20 0.39
ALDH1A1 P00352 4/20 0.37
TSHR P16473 2/20 0.37
ACHE P22303 3/20 0.36
GAA P10253 1/20 0.35
SMN1; SMN2 Q16637 2/20 0.34
HPGD P15428 2/20 0.34
HTT P42858 1/20 0.34
MAPT P10636 1/20 0.33
P2RX7 Q99572 1/20 0.33
TRIM24 O15164 1/20 0.33
TRIM33 Q9UPN9 1/20 0.33
SRC P12931 1/20 0.33
TP53 P04637 1/20 0.33
CYP3A4 P08684 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9950949 0.87 MEN1 (0.39) MEN1KMT2ALMNATHRBBLM
Ethylene SCHEMBL9950383 0.84 HTR1A (0.32) GAAHTR1AADRA2AADRA2BADRA2C
SCHEMBL9949655 0.84 LMNA (0.36) MEN1KMT2ALMNATHRBBLM
SCHEMBL9950673 0.84 MEN1 (0.36) MEN1KMT2ALMNATHRBBLM
SCHEMBL9950572 0.83 SRC (0.46) MEN1KMT2ALMNATHRBBLM
SCHEMBL9950515 0.83 SRC (0.36) MEN1KMT2ALMNATHRBBLM
SCHEMBL9950508 0.76 SRC (0.36) MEN1KMT2ALMNATHRBBLM
SCHEMBL16191112 0.75 ACHE (0.54) MEN1KMT2ALMNAALDH1A1ACHE
SCHEMBL9950266 0.74 LMNA (0.36) MEN1KMT2ALMNATHRBBLM
Ethylene SCHEMBL9950804 0.74 HTR1A (0.33) HTR1AADRA2AADRA2BADRA2CKCNH2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8748078-B2 Cyclic compound, process for preparation thereof, radiation-sensitive composition, and method for formation of resist pattern MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2014-06-10 US disclosed
EP-2476662-A1 CYCLIC COMPOUND, PROCESS FOR PREPARATION THEREOF, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN Mitsubishi Gas Chemical Company, Inc. (JP) 2012-07-18 EP disclosed
CN-102596874-A Cyclic compound, method for producing same, radiation-sensitive composition, and method for forming resist pattern MITSUBISHI GAS CHEMICAL CO 2012-07-18 CN disclosed
US-20120164576-A1 CYCLIC COMPOUND, PROCESS FOR PREPARATION THEREOF, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2012-06-28 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20120164576-A1 CYCLIC COMPOUND, PROCESS FOR PREPARATION THEREOF, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN RAD1, RER1, REV1 MEN1 187/4885KMT2A 3487/4885LMNA 298/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.