Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAOA | P21397 | 1/20 | 0.37 |
| ▸ | MAOB | P27338 | 1/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.36 |
| ▸ | LMNA | P02545 | 1/20 | 0.36 |
| ▸ | MAPT | P10636 | 1/20 | 0.36 |
| ▸ | HPGD | P15428 | 1/20 | 0.36 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.36 |
| ▸ | ALDH1A3 | P47895 | 2/20 | 0.35 |
| ▸ | ALDH3A1 | P30838 | 1/20 | 0.35 |
| ▸ | HDAC3 | O15379 | 1/20 | 0.35 |
| ▸ | HDAC4 | P56524 | 1/20 | 0.35 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.35 |
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.35 |
| ▸ | HDAC6 | Q9UBN7 | 1/20 | 0.35 |
| ▸ | HDAC5 | Q9UQL6 | 1/20 | 0.35 |
| ▸ | LTB4R | Q15722 | 1/20 | 0.34 |
| ▸ | LTB4R2 | Q9NPC1 | 1/20 | 0.34 |
| ▸ | CHRNA7 | P36544 | 1/20 | 0.34 |
| ▸ | SLC18A2 | Q05940 | 1/20 | 0.33 |
| ▸ | CYP2A6 | P11509 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9949268 | 0.91 | ALDH1A1 (0.36) | MAOAMAOBALDH1A1LMNAMAPT | |
| SCHEMBL9949678 | 0.89 | MAOB (0.42) | MAOAMAOBALDH1A1LMNAMAPT | |
| SCHEMBL9950018 | 0.88 | ALDH1A1 (0.36) | ALDH1A1LMNAMAPTHPGDSMN1; SMN2 | |
| SCHEMBL9950007 | 0.85 | SLC18A2 (0.33) | ALDH1A1LMNAMAPTHPGDSMN1; SMN2 | |
| SCHEMBL9950063 | 0.83 | DRD2 (0.41) | MAOAMAOBALDH1A1LTB4RLTB4R2 | |
| SCHEMBL9950282 | 0.82 | DAO (0.42) | ALDH1A1HPGDSMN1; SMN2HDAC3HDAC4 | |
| SCHEMBL16762080 | 0.80 | GPR84 (0.42) | MAOAMAOBALDH1A1LMNAMAPT | |
| SCHEMBL9950514 | 0.80 | CA1 (0.37) | ALDH1A1LMNAMAPTHPGDSMN1; SMN2 | |
| SCHEMBL9950189 | 0.80 | MAOB (0.39) | MAOAMAOBALDH1A1LMNAMAPT | |
| SCHEMBL22084115 | 0.79 | S1PR4 (0.45) | ALDH1A1HPGDSMN1; SMN2HDAC3HDAC4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2476662-B1 | CYCLIC COMPOUND, PROCESS FOR PREPARATION THEREOF, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN | MITSUBISHI GAS CHEMICAL CO (JP) | 2018-05-30 | — | — | EP | claimed |
| EP-2476662-B1 | CYCLIC COMPOUND, PROCESS FOR PREPARATION THEREOF, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN | MITSUBISHI GAS CHEMICAL CO (JP) | 2018-05-30 | — | — | EP | disclosed |
| US-8748078-B2 | Cyclic compound, process for preparation thereof, radiation-sensitive composition, and method for formation of resist pattern | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2014-06-10 | — | — | US | disclosed |
| EP-2476662-A1 | CYCLIC COMPOUND, PROCESS FOR PREPARATION THEREOF, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN | Mitsubishi Gas Chemical Company, Inc. (JP) | 2012-07-18 | — | — | EP | disclosed |
| US-20120164576-A1 | CYCLIC COMPOUND, PROCESS FOR PREPARATION THEREOF, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2012-06-28 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20120164576-A1 | CYCLIC COMPOUND, PROCESS FOR PREPARATION THEREOF, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN | RAD1, RER1, REV1 | MAOA 4597/4885MAOB 4132/4885ALDH1A1 1204/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.