Ethylene

Ethylene

SCHEMBL9949783

C=C.CCCC1CCC(Cc2ccc(C=O)cc2)CC1.CCOC(C)OCC

nearest known ligand 0.33

Full drug profile on Sugi Atlas →

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.33
MAPT P10636 2/20 0.33
LMNA P02545 1/20 0.33
HPGD P15428 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.33
ALDH1A3 P47895 1/20 0.31
TYR P14679 1/20 0.30
HTT P42858 1/20 0.30
CYP2C9 P11712 1/20 0.30
L3MBTL1 Q9Y468 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Ethylene SCHEMBL9949780 0.90 ALDH1A1 (0.34) ALDH1A1MAPTLMNAHPGDSMN1; SMN2
Ethylene SCHEMBL9950678 0.90 ALDH1A1 (0.31) ALDH1A1MAPTLMNAHPGDSMN1; SMN2
Ethylene SCHEMBL9950276 0.89 HPGD (0.33) ALDH1A1MAPTLMNAHPGDSMN1; SMN2
Ethylene SCHEMBL9950782 0.88 LTA4H (0.35) ALDH1A1MAPTLMNAHPGDSMN1; SMN2
Ethylene SCHEMBL9949721 0.86 DRD2 (0.33) ALDH1A1MAPTHTTL3MBTL1
SCHEMBL9950212 0.85 ALDH1A1 (0.38) ALDH1A1MAPTLMNAHPGDSMN1; SMN2
Ethylene SCHEMBL9950476 0.83 PTGS1 (0.38) ALDH1A1MAPTLMNAHPGDSMN1; SMN2
Ethylene SCHEMBL9950142 0.83 TYR (0.35) ALDH1A3TYR
Ethylene SCHEMBL9950206 0.82 ALDH1A1 (0.32) ALDH1A1MAPTLMNAHPGDSMN1; SMN2
Ethylene SCHEMBL9949564 0.81 ALDH1A1 (0.32) ALDH1A1MAPTLMNAHPGDSMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2476662-B1 CYCLIC COMPOUND, PROCESS FOR PREPARATION THEREOF, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN MITSUBISHI GAS CHEMICAL CO (JP) 2018-05-30 EP claimed
EP-2476662-B1 CYCLIC COMPOUND, PROCESS FOR PREPARATION THEREOF, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN MITSUBISHI GAS CHEMICAL CO (JP) 2018-05-30 EP disclosed
US-8748078-B2 Cyclic compound, process for preparation thereof, radiation-sensitive composition, and method for formation of resist pattern MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2014-06-10 US disclosed
EP-2476662-A1 CYCLIC COMPOUND, PROCESS FOR PREPARATION THEREOF, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN Mitsubishi Gas Chemical Company, Inc. (JP) 2012-07-18 EP disclosed
US-20120164576-A1 CYCLIC COMPOUND, PROCESS FOR PREPARATION THEREOF, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2012-06-28 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20120164576-A1 CYCLIC COMPOUND, PROCESS FOR PREPARATION THEREOF, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN RAD1, RER1, REV1 ALDH1A1 1204/4885MAPT 4472/4885LMNA 298/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.