Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TYR | P14679 | 1/20 | 0.43 |
| ▸ | PKM | P14618 | 1/20 | 0.41 |
| ▸ | CTDSP1 | Q9GZU7 | 1/20 | 0.41 |
| ▸ | MEN1 | O00255 | 2/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.39 |
| ▸ | MITF | O75030 | 1/20 | 0.39 |
| ▸ | SLC6A2 | P23975 | 2/20 | 0.39 |
| ▸ | SLC6A3 | Q01959 | 2/20 | 0.39 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.37 |
| ▸ | SHBG | P04278 | 1/20 | 0.37 |
| ▸ | ALDH1A3 | P47895 | 2/20 | 0.37 |
| ▸ | ALDH3A1 | P30838 | 1/20 | 0.37 |
| ▸ | ADH1C | P00326 | 1/20 | 0.36 |
| ▸ | ADH1A | P07327 | 1/20 | 0.36 |
| ▸ | LMNA | P02545 | 1/20 | 0.35 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.35 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.35 |
| ▸ | CYP2A6 | P11509 | 1/20 | 0.34 |
| ▸ | DHODH | Q02127 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Ethylene SCHEMBL9949458 | 0.87 | MEN1 (0.37) | TYRPKMCTDSP1MEN1KMT2A | |
| SCHEMBL21753666 | 0.78 | ESR1 (0.50) | PKMCTDSP1MEN1KMT2AMITF | |
| SCHEMBL9950279 | 0.78 | TYR (0.52) | TYRSLC6A2SLC6A3SLC6A4ALDH1A1 | |
| SCHEMBL2465315 | 0.78 | PKM (0.62) | PKMCTDSP1MEN1KMT2ASLC6A2 | |
| SCHEMBL15134830 | 0.76 | SLC6A2 (0.43) | PKMCTDSP1MEN1KMT2AMITF | |
| SCHEMBL27391812 | 0.75 | PKM (0.59) | PKMCTDSP1MEN1KMT2ASLC6A2 | |
| SCHEMBL26629764 | 0.75 | PKM (0.55) | PKMCTDSP1MEN1KMT2ALMNA | |
| SCHEMBL6818944 | 0.75 | SLC6A2 (0.54) | PKMCTDSP1MEN1KMT2AMITF | |
| SCHEMBL14040100 | 0.75 | DHODH (0.54) | TYRALDH1A1ALDH1A3KDM4ESMN1; SMN2 | |
| SCHEMBL10359511 | 0.74 | ALDH1A1 (0.51) | PKMCTDSP1MEN1KMT2AMITF |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2476662-B1 | CYCLIC COMPOUND, PROCESS FOR PREPARATION THEREOF, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN | MITSUBISHI GAS CHEMICAL CO (JP) | 2018-05-30 | — | — | EP | claimed |
| EP-2476662-B1 | CYCLIC COMPOUND, PROCESS FOR PREPARATION THEREOF, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN | MITSUBISHI GAS CHEMICAL CO (JP) | 2018-05-30 | — | — | EP | disclosed |
| US-8748078-B2 | Cyclic compound, process for preparation thereof, radiation-sensitive composition, and method for formation of resist pattern | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2014-06-10 | — | — | US | disclosed |
| EP-2476662-A1 | CYCLIC COMPOUND, PROCESS FOR PREPARATION THEREOF, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN | Mitsubishi Gas Chemical Company, Inc. (JP) | 2012-07-18 | — | — | EP | disclosed |
| US-20120164576-A1 | CYCLIC COMPOUND, PROCESS FOR PREPARATION THEREOF, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2012-06-28 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20120164576-A1 | CYCLIC COMPOUND, PROCESS FOR PREPARATION THEREOF, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN | RAD1, RER1, REV1 | TYR 4864/4885PKM 1608/4885CTDSP1 846/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.