SCHEMBL9950460

SCHEMBL9950460

CC(CCCc1ccccc1C=O)C1CCCCC1

nearest known ligand 0.36

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.36
HTT P42858 1/20 0.36
EPHX2 P34913 2/20 0.35
PKM P14618 1/20 0.34
CTDSP1 Q9GZU7 1/20 0.34
SRC P12931 1/20 0.33
KMT2A Q03164 4/20 0.32
MEN1 O00255 3/20 0.32
LMNA P02545 1/20 0.32
THRB P10828 1/20 0.32
BLM P54132 1/20 0.32
TDP1 Q9NUW8 1/20 0.32
TSHR P16473 1/20 0.31
P2RX7 Q99572 1/20 0.31
NPC1 O15118 1/20 0.31
RAB9A P51151 1/20 0.31
MITF O75030 1/20 0.30
HTR6 P50406 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9950378 0.92 ALDH1A1 (0.38) ALDH1A1HTTEPHX2PKMCTDSP1
Ethylene SCHEMBL9949742 0.89 TSHR (0.31) ALDH1A1HTTPKMCTDSP1SRC
SCHEMBL9949971 0.83 SRC (0.36) ALDH1A1HTTEPHX2PKMCTDSP1
Ethylene SCHEMBL9949389 0.81 TSHR (0.32) ALDH1A1HTTPKMCTDSP1SRC
SCHEMBL9950380 0.78 PKM (0.36) ALDH1A1HTTEPHX2PKMCTDSP1
SCHEMBL11729960 0.78 MEN1 (0.41) ALDH1A1HTTPKMKMT2AMEN1
SCHEMBL9950280 0.76 CEL (0.48) SRCKMT2AMEN1LMNATHRB
SCHEMBL9949898 0.74 CEL (0.49) SRCNPC1RAB9A
SCHEMBL9950904 0.74 PKM (0.37) ALDH1A1HTTPKMCTDSP1SRC
SCHEMBL9949746 0.74 ALDH1A1 (0.33) ALDH1A1HTTEPHX2PKMCTDSP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2476662-B1 CYCLIC COMPOUND, PROCESS FOR PREPARATION THEREOF, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN MITSUBISHI GAS CHEMICAL CO (JP) 2018-05-30 EP claimed
EP-2476662-B1 CYCLIC COMPOUND, PROCESS FOR PREPARATION THEREOF, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN MITSUBISHI GAS CHEMICAL CO (JP) 2018-05-30 EP disclosed
US-8748078-B2 Cyclic compound, process for preparation thereof, radiation-sensitive composition, and method for formation of resist pattern MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2014-06-10 US disclosed
EP-2476662-A1 CYCLIC COMPOUND, PROCESS FOR PREPARATION THEREOF, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN Mitsubishi Gas Chemical Company, Inc. (JP) 2012-07-18 EP disclosed
US-20120164576-A1 CYCLIC COMPOUND, PROCESS FOR PREPARATION THEREOF, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2012-06-28 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20120164576-A1 CYCLIC COMPOUND, PROCESS FOR PREPARATION THEREOF, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN RAD1, RER1, REV1 ALDH1A1 1204/4885HTT 4828/4885EPHX2 2262/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.