Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TAS1R3 | Q7RTX0 | 10/20 | 0.36 |
| ▸ | TAS1R1 | Q7RTX1 | 10/20 | 0.36 |
| ▸ | WDR5 | P61964 | 1/20 | 0.31 |
| ▸ | MGLL | Q99685 | 1/20 | 0.31 |
| ▸ | THRA | P10827 | 1/20 | 0.31 |
| ▸ | THRB | P10828 | 1/20 | 0.31 |
| ▸ | STS | P08842 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16638151 | 0.87 | TAS1R3 (0.35) | TAS1R3TAS1R1STS | |
| SCHEMBL12040221 | 0.85 | STS (0.38) | STS | |
| SCHEMBL9963746 | 0.85 | TAS1R3 (0.34) | TAS1R3TAS1R1MGLLSTS | |
| SCHEMBL12039862 | 0.82 | ALOX5 (0.30) | — | |
| SCHEMBL17409190 | 0.81 | HTR7 (0.32) | TAS1R3TAS1R1MGLL | |
| SCHEMBL25699334 | 0.74 | HDAC1 (0.33) | TAS1R3TAS1R1 | |
| SCHEMBL12040232 | 0.73 | CXCR2 (0.36) | STS | |
| SCHEMBL12399135 | 0.72 | HTR7 (0.34) | MGLL | |
| SCHEMBL18217988 | 0.71 | ALDH1A1 (0.37) | — | |
| SCHEMBL10204976 | 0.70 | CXCR2 (0.36) | STS |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20160327859-A1 | COLORING COMPOSITION, AND CURED FILM, COLOR FILTER, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING COLOR FILTER, SOLID-STATE IMAGING DEVICE, IMAGE DISPLAY DEVICE, AND DYE MULTIMER, EACH USING THE COLORING COMPOSITION | FUJIFILM CORPORATION (JP) | 2016-11-10 | — | — | US | disclosed |
| US-9052590-B2 | Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition | FUJIFILM CORPORATION (JP) | 2015-06-09 | — | — | US | disclosed |
| US-20120156618-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2012-06-21 | — | — | US | disclosed |
| US-20110318693-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2011-12-29 | — | — | US | disclosed |