Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ENPP2 | Q13822 | 1/20 | 0.54 |
| ▸ | TSHR | P16473 | 1/20 | 0.52 |
| ▸ | PRSS1 | P07477 | 2/20 | 0.50 |
| ▸ | PRSS2 | P07478 | 2/20 | 0.50 |
| ▸ | PRSS3 | P35030 | 2/20 | 0.50 |
| ▸ | PRKCI | P41743 | 1/20 | 0.48 |
| ▸ | DAO | P14920 | 1/20 | 0.47 |
| ▸ | CYP11B1 | P15538 | 1/20 | 0.46 |
| ▸ | CYP11B2 | P19099 | 1/20 | 0.46 |
| ▸ | IDH1 | O75874 | 1/20 | 0.43 |
| ▸ | CALM1 | P0DP23 | 1/20 | 0.43 |
| ▸ | MRGPRX4 | Q96LA9 | 1/20 | 0.43 |
| ▸ | NOS3 | P29474 | 2/20 | 0.42 |
| ▸ | NOS1 | P29475 | 2/20 | 0.42 |
| ▸ | NOS2 | P35228 | 2/20 | 0.42 |
| ▸ | CFTR | P13569 | 1/20 | 0.42 |
| ▸ | S1PR1 | P21453 | 2/20 | 0.41 |
| ▸ | ACMSD | Q8TDX5 | 1/20 | 0.40 |
| ▸ | CHRNB4 | P30926 | 1/20 | 0.40 |
| ▸ | CHRNA3 | P32297 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11576495 | 0.93 | TSHR (0.52) | ENPP2TSHRPRSS1PRSS2PRSS3 | |
| SCHEMBL4430768 | 0.93 | TSHR (0.59) | ENPP2TSHRPRSS1PRSS2PRSS3 | |
| SCHEMBL123838 | 0.91 | TSHR (0.61) | ENPP2TSHRPRSS1PRSS2PRSS3 | |
| SCHEMBL12284517 | 0.89 | ENPP2 (0.45) | ENPP2TSHRPRSS1PRSS2PRSS3 | |
| Hydrochloric Acid SCHEMBL14334287 | 0.88 | ENPP2 (0.58) | ENPP2TSHRPRSS1PRSS2PRSS3 | |
| SCHEMBL12002732 | 0.85 | IDH1 (0.42) | ENPP2TSHRPRSS1PRSS2PRSS3 | |
| SCHEMBL27299642 | 0.85 | SLC5A2 (0.49) | ENPP2TSHRPRSS1PRSS2PRSS3 | |
| SCHEMBL8713097 | 0.85 | ENPP2 (0.42) | ENPP2TSHRPRSS1PRSS2PRSS3 | |
| SCHEMBL12782166 | 0.85 | IDH1 (0.42) | ENPP2TSHRPRSS1PRSS2PRSS3 | |
| SCHEMBL19440607 | 0.82 | MTNR1A (0.43) | ENPP2PRSS1PRSS2PRSS3DAO |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11028323-B2 | Liquid crystal aligning agent containing crosslinking agent and polymer that has site having isocyanate group and/or blocked isocyanate group and site having photoreactivity, liquid crystal alignment film, and liquid crystal display element | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2021-06-08 | — | — | US | disclosed |
| US-10921650-B2 | Liquid crystal aligning agent, liquid crystal alignment film and liquid crystal display element | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2021-02-16 | — | — | US | disclosed |
| US-20190023987-A1 | LIQUID CRYSTAL ALIGNING AGENT CONTAINING CROSSLINKING AGENT AND POLYMER THAT HAS SITE HAVING ISOCYANATE GROUP AND/OR BLOCKED ISOCYANATE GROUP AND SITE HAVING PHOTOREACTIVITY, LIQUID CRYSTAL ALIGNMENT FILM, AND LIQUID CRYSTAL DISPLAY ELEMENT | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2019-01-24 | — | — | US | disclosed |
| US-20190018289-A1 | LIQUID CRYSTAL ALIGNING AGENT, LIQUID CRYSTAL ALIGNMENT FILM AND LIQUID CRYSTAL DISPLAY ELEMENT | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2019-01-17 | — | — | US | disclosed |
| US-9905768-B2 | Semiconductor device and insulating layer-forming composition | FUJIFILM CORPORATION (JP) | 2018-02-27 | — | — | US | disclosed |
| US-9905768-B2 | Semiconductor device and insulating layer-forming composition | FUJIFILM CORPORATION (JP) | 2018-02-27 | — | — | US | disclosed |
| US-20170054076-A1 | SEMICONDUCTOR DEVICE AND INSULATING LAYER-FORMING COMPOSITION | FUJIFILM CORPORATION (JP) | 2017-02-23 | — | — | US | disclosed |
| US-20170054076-A1 | SEMICONDUCTOR DEVICE AND INSULATING LAYER-FORMING COMPOSITION | FUJIFILM CORPORATION (JP) | 2017-02-23 | — | — | US | disclosed |
| US-20170005266-A1 | SEMICONDUCTOR ELEMENT AND INSULATING LAYER-FORMING COMPOSITION | FUJIFILM CORPORATION (JP) | 2017-01-05 | — | — | US | disclosed |
| US-20170005266-A1 | SEMICONDUCTOR ELEMENT AND INSULATING LAYER-FORMING COMPOSITION | FUJIFILM CORPORATION (JP) | 2017-01-05 | — | — | US | disclosed |
| US-9400430-B2 | Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film, mask blank and method of forming pattern | FUJIFILM CORPORATION (JP) | 2016-07-26 | — | — | US | disclosed |
| US-9400430-B2 | Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film, mask blank and method of forming pattern | FUJIFILM CORPORATION (JP) | 2016-07-26 | — | — | US | disclosed |
| US-20140242502-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM, MASK BLANK AND METHOD OF FORMING PATTERN | FUJIFILM CORPORATION (JP) | 2014-08-28 | — | — | US | disclosed |
| US-20140242502-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM, MASK BLANK AND METHOD OF FORMING PATTERN | FUJIFILM CORPORATION (JP) | 2014-08-28 | — | — | US | disclosed |
| WO-2013069812-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM, MASK BLANK AND METHOD OF FORMING PATTERN | FUJIFILM CORPORATION (JP) | 2013-05-16 | — | — | WO | disclosed |
| US-8436103-B2 | Star polymer and method of producing the same | NIPPON SODA CO., LTD. (JP) | 2013-05-07 | — | — | US | disclosed |
| US-20120187349-A1 | MATERIALS FOR ELECTRONIC DEVICES | MERCK PATENT GMBH (DE) | 2012-07-26 | — | — | US | disclosed |
| WO-2012014898-A1 | LIQUID CRYSTAL ALIGNING AGENT, LIQUID CRYSTAL ALIGNMENT FILM, AND LIQUID CRYSTAL DISPLAY ELEMENT | 日産化学工業株式会社 (JP) | 2012-02-02 | — | — | WO | disclosed |
| US-20090118436-A1 | Star Polymer and Method of Producing the Same | NIPPON SODA CO., LTD. (JP) | 2009-05-07 | — | — | US | disclosed |
| US-20090118436-A1 | Star Polymer and Method of Producing the Same | NIPPON SODA CO., LTD. (JP) | 2009-05-07 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20120187349-A1 | MATERIALS FOR ELECTRONIC DEVICES | SLC26A3, SLCO4C1, SLCO2A1 | ENPP2 1853/4885TSHR 4776/4885PRSS1 4232/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.