Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TRPV1 | Q8NER1 | 3/20 | 0.38 |
| ▸ | PDK1 | Q15118 | 1/20 | 0.38 |
| ▸ | PDK2 | Q15119 | 1/20 | 0.38 |
| ▸ | PDK3 | Q15120 | 1/20 | 0.38 |
| ▸ | PDK4 | Q16654 | 1/20 | 0.38 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.38 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.38 |
| ▸ | SRD5A2 | P31213 | 1/20 | 0.37 |
| ▸ | MAPT | P10636 | 3/20 | 0.37 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.37 |
| ▸ | MEN1 | O00255 | 1/20 | 0.37 |
| ▸ | NPC1 | O15118 | 1/20 | 0.37 |
| ▸ | XBP1 | P17861 | 1/20 | 0.37 |
| ▸ | HTT | P42858 | 1/20 | 0.37 |
| ▸ | RAB9A | P51151 | 1/20 | 0.37 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.37 |
| ▸ | ACHE | P22303 | 1/20 | 0.37 |
| ▸ | LMNA | P02545 | 2/20 | 0.36 |
| ▸ | TYR | P14679 | 1/20 | 0.36 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL545396 | 0.84 | PDK1 (0.38) | TRPV1PDK1PDK2PDK3PDK4 | |
| SCHEMBL10907991 | 0.82 | CA2 (0.38) | HDAC1SMN1; SMN2MAPTMEN1NPC1 | |
| SCHEMBL548375 | 0.80 | IKBKB (0.41) | HDAC1SMN1; SMN2SRD5A2MAPTMAPK1 | |
| SCHEMBL242690 | 0.79 | CES2 (0.41) | PDK1PDK2PDK3PDK4SMN1; SMN2 | |
| SCHEMBL107377 | 0.78 | CES1 (0.42) | HDAC1ACHE | |
| SCHEMBL10003829 | 0.75 | MAPT (0.45) | TRPV1HDAC1SMN1; SMN2SRD5A2MAPT | |
| SCHEMBL3439642 | 0.75 | HDAC1 (0.37) | HDAC1SMN1; SMN2SRD5A2MAPTMAPK1 | |
| SCHEMBL761110 | 0.74 | CES2 (0.44) | SMN1; SMN2NPC1HTTRAB9AKMT2A | |
| SCHEMBL10492099 | 0.73 | HDAC1 (0.44) | PDK1PDK2PDK3PDK4HDAC1 | |
| SCHEMBL6851503 | 0.73 | MAPT (0.54) | TRPV1SMN1; SMN2MAPTMAPK1MEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 97 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240352203-A1 | FILM-FORMING MATERIAL FOR SEMICONDUCTOR, MEMBER-FORMING MATERIAL FOR SEMICONDUCTOR, PROCESS MEMBER-FORMING MATERIAL FOR SEMICONDUCTOR, UNDERLAYER FILM-FORMING MATERIAL, UNDERLAYER FILM, AND SEMICONDUCTOR DEVICE | ADEKA CORPORATION (JP) | 2024-10-24 | — | — | US | disclosed |
| EP-4375750-A1 | FILM-FORMING MATERIAL FOR SEMICONDUCTOR, MEMBER-FORMING MATERIAL FOR SEMICONDUCTOR, PROCESS MEMBER-FORMING MATERIAL FOR SEMICONDUCTOR, UNDERLAYER FILM-FORMING MATERIAL, UNDERLAYER FILM, AND SEMICONDUCTOR DEVICE | ADEKA CORPORATION (JP) | 2024-05-29 | — | — | EP | disclosed |
| WO-2023002928-A1 | FILM-FORMING MATERIAL FOR SEMICONDUCTOR, MEMBER-FORMING MATERIAL FOR SEMICONDUCTOR, PROCESS MEMBER-FORMING MATERIAL FOR SEMICONDUCTOR, UNDERLAYER FILM-FORMING MATERIAL, UNDERLAYER FILM, AND SEMICONDUCTOR DEVICE | 株式会社ADEKA | 2023-01-26 | — | — | WO | disclosed |
| US-11450445-B2 | Electroconductive film and method for manufacturing electroconductive pattern | TOKYO UNIVERSITY OF SCIENCE FOUNDATION (JP) | 2022-09-20 | — | — | US | disclosed |
| US-11281102-B2 | Fluorine-containing monomer, fluorine-containing polymer, pattern forming composition using same, and pattern forming method of same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2022-03-22 | — | — | US | disclosed |
| US-20200303086-A1 | ELECTROCONDUCTIVE FILM AND METHOD FOR MANUFACTURING ELECTROCONDUCTIVE PATTERN | TOKYO UNIVERSITY OF SCIENCE FOUNDATION (JP) | 2020-09-24 | — | — | US | disclosed |
| US-10720259-B2 | Electroconductive film and method for manufacturing electroconductive pattern | TOKYO UNIVERSITY OF SCIENCE FOUNDATION (JP) | 2020-07-21 | — | — | US | disclosed |
| US-20200089116-A1 | Fluorine-Containing Monomer, Fluorine-Containing Polymer, Pattern Forming Composition Using Same, and Pattern Forming Method of Same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2020-03-19 | — | — | US | disclosed |
| US-10551745-B2 | Photopatternable compositions and methods of fabricating transistor devices using same | FLEXTERRA, INC. (US) | 2020-02-04 | — | — | US | disclosed |
| US-10392699-B2 | Method for manufacturing structure having recessed pattern, resin composition, method for forming electroconductive film, electronic circuit, and electronic device | JSR CORPORATION (JP) | 2019-08-27 | — | — | US | disclosed |
| US-20020172873-A1 | Photosensitive resin composition, color filter, and copolymer resin useful for them | DAI NIPPON PRINTING CO., LTD. (JP) | 2002-11-21 | — | — | US | disclosed |
| EP-1235104-A1 | COMPOSITION HAVING REFRACTIVE INDEX SENSITIVELY CHANGEABLE BY RADIATION AND METHOD FOR FORMING REFRACTIVE INDEX PATTERN | JSR Corporation (JP) | 2002-08-28 | — | — | EP | disclosed |
| US-6410206-B1 | MIXTURE OF (METH)ACRYLIC ACID, ACRYLATED ESTER AND EPOXYCOMPOUND | DAI NIPPON PRINTING CO., LTD. (JP) | 2002-06-25 | — | — | US | disclosed |
| EP-0880075-B1 | Radiation sensitive resin composition | JSR CORP (JP) | 2001-10-17 | — | — | EP | disclosed |
| US-5958648-A | Radiation sensitive resin composition | JSR CORPORATION (JP) | 1999-09-28 | — | — | US | disclosed |
| EP-0880075-A1 | Radiation sensitive resin composition | JSR Corporation (JP) | 1998-11-25 | — | — | EP | disclosed |
| EP-0594452-B1 | Radiation sensitive resin composition for microlens | JAPAN SYNTHETIC RUBBER CO LTD (JP) | 1997-01-15 | — | — | EP | disclosed |
| US-5587224-A | COATING COMPRISES PHOTOLYSIS REACTION PRODUCT OF CHARGE TRANSPORTING POLYMER AND PHOTO ACID COMPOUND | XEROX CORPORATION (US) | 1996-12-24 | — | — | US | disclosed |
| US-5432039-A | Radiation sensitive quinone diazide and resin composition for microlens | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1995-07-11 | — | — | US | disclosed |
| EP-0594452-A2 | Radiation sensitive resin composition for microlens | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1994-04-27 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20240352203-A1 | FILM-FORMING MATERIAL FOR SEMICONDUCTOR, MEMBER-FORMING MATERIAL FOR SEMICONDUCTOR, PROCESS MEMBER-FORMING MATERIAL FOR SEMICONDUCTOR, UNDERLAYER FILM-FORMING MATERIAL, UNDERLAYER FILM, AND SEMICONDUCTOR DEVICE | FBXL19, SRSF9, CNOT9 | TRPV1 3692/4885PDK1 3509/4885PDK2 3933/4885 |
| US-11281102-B2 | Fluorine-containing monomer, fluorine-containing polymer, pattern forming composition using same, and pattern forming method of same | AFF4, AFF1, AFF2 | TRPV1 1867/4885PDK1 4441/4885PDK2 4078/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.