Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PKM | P14618 | 1/20 | 0.38 |
| ▸ | HSD11B1 | P28845 | 5/20 | 0.35 |
| ▸ | NR1I2 | O75469 | 1/20 | 0.34 |
| ▸ | RORC | P51449 | 1/20 | 0.34 |
| ▸ | TP53 | P04637 | 1/20 | 0.34 |
| ▸ | POLB | P06746 | 1/20 | 0.34 |
| ▸ | MAPT | P10636 | 1/20 | 0.34 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.34 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.33 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.33 |
| ▸ | EGFR | P00533 | 1/20 | 0.33 |
| ▸ | ERBB2 | P04626 | 1/20 | 0.33 |
| ▸ | FFAR1 | O14842 | 1/20 | 0.33 |
| ▸ | FFAR4 | Q5NUL3 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL482039 | 0.93 | HSD11B1 (0.36) | HSD11B1NR1I2POLBSMN1; SMN2KDM4E | |
| SCHEMBL16195277 | 0.92 | HSD11B1 (0.41) | HSD11B1NR1I2RORCTP53MAPT | |
| SCHEMBL16195208 | 0.89 | AR (0.36) | NR1I2RORCMAPTSMN1; SMN2KMT2A | |
| SCHEMBL16195015 | 0.87 | CNR1 (0.40) | RORCALDH1A1L3MBTL1KMT2A | |
| SCHEMBL16195062 | 0.86 | EPHX2 (0.38) | RORCTP53SMN1; SMN2ALDH1A1KMT2A | |
| SCHEMBL16195010 | 0.85 | HSD11B1 (0.45) | HSD11B1NR1I2RORCTP53MAPT | |
| SCHEMBL954742 | 0.85 | HSD11B1 (0.45) | HSD11B1NR1I2MAPTALDH1A1 | |
| SCHEMBL6116193 | 0.85 | HSD11B1 (0.42) | PKMHSD11B1MAPTSMN1; SMN2KDM4E | |
| SCHEMBL16195001 | 0.84 | FFAR4 (0.36) | HSD11B1TP53MAPTSMN1; SMN2KDM4E | |
| SCHEMBL16195569 | 0.84 | FAAH (0.39) | TP53 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2455811-B1 | Sulfonium salt-containing polymer, resist composition, patterning process, and sulfonium salt monomer and making method | SHINETSU CHEMICAL CO (JP) | 2016-01-13 | — | — | EP | disclosed |
| US-9233919-B2 | Sulfonium salt-containing polymer, resist composition, patterning process, and sulfonium salt monomer and making method | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-01-12 | — | — | US | disclosed |
| US-9164384-B2 | Patterning process and resist composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-10-20 | — | — | US | disclosed |
| US-20140322650-A1 | PATTERNING PROCESS AND RESIST COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-10-30 | — | — | US | disclosed |
| US-20140296561-A1 | SULFONIUM SALT-CONTAINING POLYMER, RESIST COMPOSITION, PATTERNING PROCESS, AND SULFONIUM SALT MONOMER AND MAKING METHOD | SHINETSU CHEMICAL CO (JP) | 2014-10-02 | — | — | US | disclosed |
| US-8785105-B2 | Sulfonium salt-containing polymer, resist composition, patterning process, and sulfonium salt monomer and making method | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-07-22 | — | — | US | disclosed |
| US-20120129103-A1 | SULFONIUM SALT-CONTAINING POLYMER, RESIST COMPOSITION, PATTERNING PROCESS, AND SULFONIUM SALT MONOMER AND MAKING METHOD | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-05-24 | — | — | US | disclosed |
| EP-2455811-A1 | Sulfonium salt-containing polymer, resist composition, patterning process, and sulfonium salt monomer and making method | Shin-Etsu Chemical Co., Ltd. (JP) | 2012-05-23 | — | — | EP | disclosed |
| US-8173354-B2 | Sulfonium salt, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-05-08 | — | — | US | disclosed |
| US-20110008735-A1 | SULFONIUM SALT, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-01-13 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20140296561-A1 | SULFONIUM SALT-CONTAINING POLYMER, RESIST COMPOSITION, PATTERNING PROCESS, AND SULFONIUM SALT MONOMER AND MAKING METHOD | RER1, SMC4, SMCHD1 | PKM 2978/4885HSD11B1 3048/4885NR1I2 3323/4885 |
| US-20120129103-A1 | SULFONIUM SALT-CONTAINING POLYMER, RESIST COMPOSITION, PATTERNING PROCESS, AND SULFONIUM SALT MONOMER AND MAKING METHOD | RER1, SMC4, SMCHD1 | PKM 2978/4885HSD11B1 3048/4885NR1I2 3323/4885 |
| US-20110008735-A1 | SULFONIUM SALT, RESIST COMPOSITION, AND PATTERNING PROCESS | ETV6, ETV1, VPS4B | PKM 3047/4885HSD11B1 3921/4885NR1I2 3531/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.