Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.46 |
| ▸ | POLB | P06746 | 2/20 | 0.46 |
| ▸ | APEX1 | P27695 | 1/20 | 0.46 |
| ▸ | HTT | P42858 | 1/20 | 0.46 |
| ▸ | ESR1 | P03372 | 4/20 | 0.45 |
| ▸ | TSHR | P16473 | 2/20 | 0.45 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.45 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.45 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.45 |
| ▸ | KDR | P35968 | 1/20 | 0.45 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.44 |
| ▸ | NPC1 | O15118 | 2/20 | 0.44 |
| ▸ | RAB9A | P51151 | 2/20 | 0.44 |
| ▸ | MAPT | P10636 | 1/20 | 0.44 |
| ▸ | LMNA | P02545 | 1/20 | 0.43 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.43 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.43 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.43 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.43 |
| ▸ | NR1H2 | P55055 | 1/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18906123 | 0.89 | POLB (0.46) | TDP1POLBAPEX1HTTESR1 | |
| SCHEMBL18904505 | 0.89 | KMT2A (0.41) | TDP1POLBAPEX1HTTESR1 | |
| SCHEMBL14001889 | 0.89 | POLB (0.48) | TDP1POLBAPEX1HTTESR1 | |
| SCHEMBL26312599 | 0.87 | HTT (0.47) | TDP1POLBAPEX1HTTRAB9A | |
| SCHEMBL16243833 | 0.87 | TDP1 (0.60) | TDP1POLBAPEX1HTTTSHR | |
| SCHEMBL9880800 | 0.87 | HRH3 (0.55) | TDP1POLBAPEX1HTTALDH1A1 | |
| SCHEMBL19763407 | 0.87 | ESR1 (0.53) | TDP1ESR1TSHRALDH1A1CHRM1 | |
| SCHEMBL13609723 | 0.86 | HRH3 (0.51) | TDP1POLBAPEX1HTTALDH1A1 | |
| SCHEMBL4541500 | 0.85 | ESR1 (0.62) | TDP1POLBAPEX1HTTESR1 | |
| SCHEMBL16661817 | 0.85 | KDM4E (0.51) | TDP1POLBAPEX1HTTALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 97 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10703917-B2 | Coating compositions suitable for use with an overcoated photoresist | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2020-07-07 | — | — | US | disclosed |
| US-20170313889-A1 | COATING COMPOSITIONS SUITABLE FOR USE WITH AN OVERCOATED PHOTORESIST | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2017-11-02 | — | — | US | disclosed |
| US-20170313889-A1 | COATING COMPOSITIONS SUITABLE FOR USE WITH AN OVERCOATED PHOTORESIST | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2017-11-02 | — | — | US | disclosed |
| US-9708493-B2 | Coating compositions suitable for use with an overcoated photoresist | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2017-07-18 | — | — | US | disclosed |
| US-9708493-B2 | Coating compositions suitable for use with an overcoated photoresist | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2017-07-18 | — | — | US | disclosed |
| US-20170153547-A1 | COATING COMPOSITIONS FOR USE WITH AN OVERCOATED PHOTORESIST | DUPONT SPECIALTY MATERIALS KOREA LTD (KR) | 2017-06-01 | — | — | US | disclosed |
| US-9551928-B2 | Actinic-ray- or radiation-sensitive resin composition and method of forming pattern therewith | FUJIFILM CORPORATION (JP) | 2017-01-24 | — | — | US | disclosed |
| US-9551932-B2 | Patterning process and resist composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-01-24 | — | — | US | disclosed |
| US-9551932-B2 | Patterning process and resist composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-01-24 | — | — | US | disclosed |
| US-20160009924-A1 | COATING COMPOSITIONS SUITABLE FOR USE WITH AN OVERCOATED PHOTORESIST | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2016-01-14 | — | — | US | disclosed |
| US-20120009527-A1 | PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-01-12 | — | — | US | disclosed |
| US-20120009527-A1 | PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-01-12 | — | — | US | disclosed |
| US-20110236831-A1 | ACETAL COMPOUND, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-09-29 | — | — | US | disclosed |
| US-20110236831-A1 | ACETAL COMPOUND, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-09-29 | — | — | US | disclosed |
| US-20110236826-A1 | PATTERNING PROCESS, RESIST COMPOSITION, AND ACETAL COMPOUND | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-09-29 | — | — | US | disclosed |
| US-20110236826-A1 | PATTERNING PROCESS, RESIST COMPOSITION, AND ACETAL COMPOUND | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-09-29 | — | — | US | disclosed |
| US-20110003250-A1 | COATING COMPOSITIONS SUITABLE FOR USE WITH AN OVERCOATED PHOTORESIST | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2011-01-06 | — | — | US | disclosed |
| US-20110003250-A1 | COATING COMPOSITIONS SUITABLE FOR USE WITH AN OVERCOATED PHOTORESIST | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2011-01-06 | — | — | US | disclosed |
| EP-2261738-A2 | Coating compositions suitable for use with an overcoated photoresist | Rohm and Haas Electronic Materials, L.L.C. (US) | 2010-12-15 | — | — | EP | disclosed |
| US-20100255418-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN THEREWITH | FUJIFILM CORPORATION (JP) | 2010-10-07 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (7 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20100255418-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN THEREWITH | RER1, NOC2L, RAD51 | TDP1 2002/4885POLB 1047/4885APEX1 180/4885 |
| US-20110003250-A1 | COATING COMPOSITIONS SUITABLE FOR USE WITH AN OVERCOATED PHOTORESIST | DHPS, HAAO, FTO | TDP1 1888/4885POLB 1439/4885APEX1 170/4885 |
| US-10703917-B2 | Coating compositions suitable for use with an overcoated photoresist | DHPS, HAAO, FTO | TDP1 1888/4885POLB 1439/4885APEX1 170/4885 |
| US-20170313889-A1 | COATING COMPOSITIONS SUITABLE FOR USE WITH AN OVERCOATED PHOTORESIST | DHPS, HAAO, FTO | TDP1 1888/4885POLB 1439/4885APEX1 170/4885 |
| US-20110236826-A1 | PATTERNING PROCESS, RESIST COMPOSITION, AND ACETAL COMPOUND | PARG, RAD51, CD38 | TDP1 1866/4885POLB 215/4885APEX1 168/4885 |
| US-20160009924-A1 | COATING COMPOSITIONS SUITABLE FOR USE WITH AN OVERCOATED PHOTORESIST | DHPS, HAAO, FTO | TDP1 1888/4885POLB 1439/4885APEX1 170/4885 |
| US-20110236831-A1 | ACETAL COMPOUND, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | ADH1A, ADH1C, ADH5 | TDP1 2989/4885POLB 1444/4885APEX1 93/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.