Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | RXRA | P19793 | 2/20 | 0.40 |
| ▸ | RXRB | P28702 | 2/20 | 0.40 |
| ▸ | RXRG | P48443 | 2/20 | 0.40 |
| ▸ | S1PR1 | P21453 | 7/20 | 0.40 |
| ▸ | IDO1 | P14902 | 2/20 | 0.39 |
| ▸ | MRGPRX4 | Q96LA9 | 5/20 | 0.38 |
| ▸ | SRD5A2 | P31213 | 1/20 | 0.37 |
| ▸ | S1PR3 | Q99500 | 2/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.36 |
| ▸ | KDM4C | Q9H3R0 | 1/20 | 0.36 |
| ▸ | NR4A2 | P43354 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30892335 | 0.83 | GLA (0.45) | SRD5A2 | |
| SCHEMBL278277 | 0.83 | GLA (0.45) | SRD5A2 | |
| SCHEMBL22199854 | 0.76 | KIF11 (0.46) | SRD5A2 | |
| SCHEMBL15247155 | 0.75 | GLA (0.36) | SRD5A2 | |
| SCHEMBL15745809 | 0.75 | TRPV1 (0.39) | SRD5A2ALDH1A1 | |
| SCHEMBL28424524 | 0.74 | ADH5 (0.48) | RXRARXRBRXRGSRD5A2 | |
| SCHEMBL10036561 | 0.73 | PARP10 (0.46) | RXRARXRBRXRGMRGPRX4ALDH1A1 | |
| SCHEMBL31542017 | 0.71 | NOTUM (0.42) | RXRARXRBRXRGALDH1A1 | |
| SCHEMBL2680326 | 0.71 | NOTUM (0.42) | RXRARXRBRXRGALDH1A1 | |
| SCHEMBL10323581 | 0.71 | RXRA (0.61) | RXRARXRBRXRGS1PR1MRGPRX4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8133550-B2 | Good breaking elongation characteristics, achievable high sensitivity and high film remaining rate, little in pattern size fluctuation at the heating time after lithographic process, capable of stable pattern formation; manufacturing a semiconductor device | FUJIFILM CORPORATION (JP) | 2012-03-13 | — | — | US | disclosed |
| US-20080076849-A1 | POLYBENZOXAZOLE PRECURSOR, PHOTOSENSITIVE RESIN COMPOSITION USING THE SAME, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE | FUJIFILM CORPORATION (JP) | 2008-03-27 | — | — | US | disclosed |