Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PPARG | P37231 | 2/20 | 0.40 |
| ▸ | PPARA | Q07869 | 2/20 | 0.40 |
| ▸ | ESR1 | P03372 | 1/20 | 0.40 |
| ▸ | CES2 | O00748 | 3/20 | 0.39 |
| ▸ | CES1 | P23141 | 3/20 | 0.39 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.38 |
| ▸ | PTGS2 | P35354 | 3/20 | 0.38 |
| ▸ | S1PR3 | Q99500 | 1/20 | 0.37 |
| ▸ | LMNA | P02545 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6440944 | 0.88 | CES2 (0.39) | CES2CES1NPSR1PTGS2LMNA | |
| SCHEMBL12629320 | 0.88 | CES2 (0.39) | CES2CES1NPSR1PTGS2LMNA | |
| SCHEMBL30098776 | 0.86 | L3MBTL1 (0.47) | PPARGPPARACES2CES1NPSR1 | |
| SCHEMBL2701036 | 0.81 | ALDH1A1 (0.41) | CES2CES1NPSR1PTGS2LMNA | |
| SCHEMBL2701039 | 0.81 | ALDH1A1 (0.41) | CES2CES1NPSR1PTGS2LMNA | |
| SCHEMBL4893356 | 0.77 | CES1 (0.36) | PPARGPPARACES2CES1PTGS2 | |
| SCHEMBL28223368 | 0.76 | ALDH1A1 (0.40) | CES2CES1PTGS2LMNA | |
| SCHEMBL12923559 | 0.75 | SMN1; SMN2 (0.35) | LMNA | |
| SCHEMBL18720502 | 0.75 | SMN1; SMN2 (0.35) | LMNA | |
| SCHEMBL4897509 | 0.75 | UBE2M (0.33) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8092977-B2 | additional resin contains an oxime sulfonate group, which is insoluble in an alkali developer and becomes soluble in alkali developer by acid generating from acid generator; use in ultramicrolithography; resolution, sensitivity, good defocus latitude, good pattern profile, line edge roughness | FUJIFILM CORPORATION (JP) | 2012-01-10 | — | — | US | disclosed |
| US-20080220370-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2008-09-11 | — | — | US | disclosed |