Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TERT | O14746 | 3/20 | 0.50 |
| ▸ | PTPN1 | P18031 | 3/20 | 0.50 |
| ▸ | PPARG | P37231 | 3/20 | 0.50 |
| ▸ | PPARD | Q03181 | 3/20 | 0.50 |
| ▸ | PPARA | Q07869 | 3/20 | 0.50 |
| ▸ | FAAH | O00519 | 3/20 | 0.50 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.50 |
| ▸ | MAPT | P10636 | 2/20 | 0.50 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.50 |
| ▸ | BLM | P54132 | 2/20 | 0.50 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.50 |
| ▸ | FABP4 | P15090 | 2/20 | 0.50 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.50 |
| ▸ | GMNN | O75496 | 1/20 | 0.50 |
| ▸ | USP2 | O75604 | 1/20 | 0.50 |
| ▸ | LMNA | P02545 | 1/20 | 0.50 |
| ▸ | POLB | P06746 | 1/20 | 0.50 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.50 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.50 |
| ▸ | APEX1 | P27695 | 1/20 | 0.50 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL969558 | 0.91 | CES2 (0.39) | PTPN1PPARGPPARDPPARAHSD17B10 | |
| SCHEMBL1147859 | 0.91 | CES2 (0.39) | PTPN1PPARGPPARDPPARAHSD17B10 | |
| SCHEMBL21060503 | 0.90 | TERT (0.47) | TERTPTPN1PPARGPPARDPPARA | |
| SCHEMBL6933653 | 0.83 | TERT (0.55) | TERTPTPN1PPARGPPARDPPARA | |
| SCHEMBL11805820 | 0.83 | EP300 (0.45) | TERTPTPN1PPARGPPARDPPARA | |
| SCHEMBL11005612 | 0.83 | EP300 (0.45) | TERTPTPN1PPARGPPARDPPARA | |
| SCHEMBL11130016 | 0.83 | EP300 (0.45) | TERTPTPN1PPARGPPARDPPARA | |
| SCHEMBL11005625 | 0.83 | EP300 (0.45) | TERTPTPN1PPARGPPARDPPARA | |
| SCHEMBL11130007 | 0.83 | EP300 (0.45) | TERTPTPN1PPARGPPARDPPARA | |
| SCHEMBL1502818 | 0.83 | EP300 (0.45) | TERTPTPN1PPARGPPARDPPARA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 218 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-5320678-A | Heating the corresponding disulfonic acid with a mineral acid or salt to cause desulfonation, mixing with surfactant, filtering | SUMITOMO CHEMICAL CO. LTD. (JP) | 1994-06-14 | — | — | US | claimed |
| US-4339276-A | PETROLEUM WAX, CARBOXYLIC ACID MODIFIED WAX, WATER | NIPPON OIL COMPANY, LIMITED (JP) | 1982-07-13 | — | — | US | claimed |
| US-4038196-A | SOFTENING AGENT FOR WOVEN FABRICS | KAO SOAP CO., LTD. (JA) | 1977-07-26 | — | — | US | claimed |
| US-20260118751-A1 | ORGANOMETALLIC COMPOUND, RESIST COMPOSITION COMPRISING THE SAME, AND PATTERN FORMATION METHOD USING THE RESIST COMPOSITION | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2026-04-30 | — | — | US | disclosed |
| US-12606739-B2 | Luminescent compound, method for producing luminescent compound, luminescent composition, luminescent thin film and luminescent particles | Konica Minolta, Inc. (JP) | 2026-04-21 | — | — | US | disclosed |
| US-20260093178-A1 | POLYMER, METHOD OF PRODUCING THE SAME, RESIST COMPOSITION INCLUDING THE POLYMER, AND PATTERN FORMATION METHOD USING THE RESIST COMPOSITION | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2026-04-02 | — | — | US | disclosed |
| US-20260010070-A1 | RESIST COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2026-01-08 | — | — | US | disclosed |
| US-20250333554-A1 | POLYMER, RESIST COMPOSITION COMPRISING THE SAME AND PATTERN FORMATION METHOD USING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2025-10-30 | — | — | US | disclosed |
| US-20250123563-A1 | POLYMER, RESIST COMPOSITION COMPRISING THE SAME AND METHOD OF FORMING PATTERN USING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2025-04-17 | — | — | US | disclosed |
| US-20250102906-A1 | ORGANOMETALLIC COMPOUND, RESIST COMPOSITION INCLUDING THE SAME AND PATTERN FORMATION METHOD USING THE RESIST COMPOSITION | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2025-03-27 | — | — | US | disclosed |
| US-20250021003-A1 | POLYMER, MONOMER, RESIST COMPOSITION COMPRISING THE SAME AND METHOD OF FORMING PATTERN USING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2025-01-16 | — | — | US | disclosed |
| EP-0182253-A2 | Reflective photographic material | KONICA CORPORATION (JP) | 1986-05-28 | — | — | EP | disclosed |
| EP-0030461-B1 | DETERGENT COMPOSITION | KUREHA KAGAKU KOGYO KABUSHIKI KAISHA (JP) | 1983-05-04 | — | — | EP | disclosed |
| US-4349447-A | Phosphate-free detergent composition | KUREHA KAGAKU KOGYO KABUSHIKI KAISHA (JP) | 1982-09-14 | — | — | US | disclosed |
| US-4339276-A | PETROLEUM WAX, CARBOXYLIC ACID MODIFIED WAX, WATER | NIPPON OIL COMPANY, LIMITED (JP) | 1982-07-13 | — | — | US | disclosed |
| EP-0030461-A1 | Detergent composition | KUREHA KAGAKU KOGYO KABUSHIKI KAISHA (JP) | 1981-06-17 | — | — | EP | disclosed |
| US-4189415-A | Aqueous vinylchloride/vinyl acetate/ethylene copolymers and process | WACKER-CHEMIE GMBH (DE) | 1980-02-19 | — | — | US | disclosed |
| US-4042409-A | EMULSION OF PARAFFIN AND OXIDIZED PARAFFIN IN ALKALI OR AMMONIUM BASEN | MITSUBISHI CHEMICAL INDUSTRIES LIMITED (JA) | 1977-08-16 | — | — | US | disclosed |
| US-4038196-A | SOFTENING AGENT FOR WOVEN FABRICS | KAO SOAP CO., LTD. (JA) | 1977-07-26 | — | — | US | disclosed |
| US-4038196-A | SOFTENING AGENT FOR WOVEN FABRICS | KAO SOAP CO., LTD. (JA) | 1977-07-26 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12606739-B2 | Luminescent compound, method for producing luminescent compound, luminescent composition, luminescent thin film and luminescent particles | SCLY, SELENOI, SLC43A1 | TERT 728/4885PTPN1 2026/4885PPARG 3141/4885 |
| US-20250102906-A1 | ORGANOMETALLIC COMPOUND, RESIST COMPOSITION INCLUDING THE SAME AND PATTERN FORMATION METHOD USING THE RESIST COMPOSITION | PRMT1, RER1, RCOR1 | TERT 260/4885PTPN1 734/4885PPARG 4520/4885 |
| US-20260010070-A1 | RESIST COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME | CCNA1, POT1, RIF1 | TERT 20/4885PTPN1 421/4885PPARG 3836/4885 |
| US-20260093178-A1 | POLYMER, METHOD OF PRODUCING THE SAME, RESIST COMPOSITION INCLUDING THE POLYMER, AND PATTERN FORMATION METHOD USING THE RESIST COMPOSITION | RPS21, CA11, RPL21 | TERT 1781/4885PTPN1 1312/4885PPARG 4182/4885 |
| US-20260118751-A1 | ORGANOMETALLIC COMPOUND, RESIST COMPOSITION COMPRISING THE SAME, AND PATTERN FORMATION METHOD USING THE RESIST COMPOSITION | LBR, RER1, MNS1 | TERT 178/4885PTPN1 460/4885PPARG 3894/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.