Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PPARG | P37231 | 1/20 | 0.40 |
| ▸ | PPARD | Q03181 | 1/20 | 0.40 |
| ▸ | PPARA | Q07869 | 1/20 | 0.40 |
| ▸ | MCHR1 | Q99705 | 2/20 | 0.37 |
| ▸ | NPC1 | O15118 | 1/20 | 0.36 |
| ▸ | HSP90AA1 | P07900 | 1/20 | 0.36 |
| ▸ | RAB9A | P51151 | 1/20 | 0.36 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.36 |
| ▸ | NAAA | Q02083 | 3/20 | 0.36 |
| ▸ | ASAH1 | Q13510 | 1/20 | 0.36 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.35 |
| ▸ | RORC | P51449 | 1/20 | 0.35 |
| ▸ | CARM1 | Q86X55 | 1/20 | 0.34 |
| ▸ | PRMT6 | Q96LA8 | 1/20 | 0.34 |
| ▸ | APP | P05067 | 1/20 | 0.34 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10149081 | 0.89 | PPARG (0.40) | PPARGPPARDPPARAMCHR1NPC1 | |
| SCHEMBL10148496 | 0.86 | MCHR1 (0.39) | PPARGPPARDPPARAMCHR1NPC1 | |
| SCHEMBL12056817 | 0.83 | CA1 (0.44) | NPC1HSP90AA1RAB9AL3MBTL1HIF1A | |
| SCHEMBL10138464 | 0.81 | KDM4E (0.36) | NPC1HSP90AA1RAB9AL3MBTL1HIF1A | |
| SCHEMBL10088188 | 0.81 | ALDH1A1 (0.39) | PPARGL3MBTL1HIF1A | |
| SCHEMBL10138459 | 0.80 | HIF1A (0.40) | L3MBTL1HIF1A | |
| SCHEMBL10138857 | 0.78 | NPC1 (0.39) | NPC1HSP90AA1RAB9AL3MBTL1HIF1A | |
| SCHEMBL12056820 | 0.78 | HRH3 (0.38) | NPC1HSP90AA1RAB9AL3MBTL1NAAA | |
| SCHEMBL10138480 | 0.74 | ALDH1A1 (0.41) | NPC1HSP90AA1RAB9AL3MBTL1CYP3A4 | |
| SCHEMBL10138477 | 0.74 | RORC (0.39) | NPC1HSP90AA1RAB9AL3MBTL1RORC |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8092978-B2 | Positive resist composition for electron beam, X-ray or EUV and pattern forming method using the same | FUJIFILM CORPORATION (JP) | 2012-01-10 | — | — | US | disclosed |
| US-8084183-B2 | Resist composition for electron beam, X-ray, or EUV, and pattern-forming method using the same | FUJIFILM CORPORATION (JP) | 2011-12-27 | — | — | US | disclosed |
| US-20090246685-A1 | POSITIVE RESIST COMPOSITION FOR ELECTRON BEAM, X-RAY OR EUV AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2009-10-01 | — | — | US | disclosed |
| US-20090047598-A1 | RESIST COMPOSITION FOR ELECTRON BEAM, X-RAY, OR EUV, AND PATTERN-FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2009-02-19 | — | — | US | disclosed |