Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | RORC | P51449 | 2/20 | 0.39 |
| ▸ | IRAK4 | Q9NWZ3 | 4/20 | 0.38 |
| ▸ | PDE4D | Q08499 | 3/20 | 0.36 |
| ▸ | PDE4B | Q07343 | 2/20 | 0.36 |
| ▸ | PDE4A | P27815 | 1/20 | 0.36 |
| ▸ | PDE4C | Q08493 | 1/20 | 0.36 |
| ▸ | GRM4 | Q14833 | 5/20 | 0.35 |
| ▸ | ACACB | O00763 | 2/20 | 0.34 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.33 |
| ▸ | NPC1 | O15118 | 1/20 | 0.33 |
| ▸ | HSP90AA1 | P07900 | 1/20 | 0.33 |
| ▸ | RAB9A | P51151 | 1/20 | 0.33 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10138464 | 0.87 | KDM4E (0.36) | IRAK4PDE4DPDE4BPDE4APDE4C | |
| SCHEMBL10138857 | 0.80 | NPC1 (0.39) | NPSR1NPC1HSP90AA1RAB9AL3MBTL1 | |
| SCHEMBL10088188 | 0.78 | ALDH1A1 (0.39) | NPSR1L3MBTL1 | |
| SCHEMBL10138459 | 0.76 | HIF1A (0.40) | PDE4DPDE4BPDE4APDE4CNPSR1 | |
| SCHEMBL10138462 | 0.75 | NPSR1 (0.36) | NPSR1NPC1HSP90AA1RAB9AL3MBTL1 | |
| SCHEMBL12056817 | 0.74 | CA1 (0.44) | NPSR1NPC1HSP90AA1RAB9AL3MBTL1 | |
| SCHEMBL10138465 | 0.74 | PPARG (0.40) | RORCNPC1HSP90AA1RAB9AL3MBTL1 | |
| SCHEMBL10138480 | 0.73 | ALDH1A1 (0.41) | NPC1HSP90AA1RAB9AL3MBTL1 | |
| SCHEMBL12054789 | 0.73 | NPSR1 (0.39) | NPSR1NPC1HSP90AA1RAB9AL3MBTL1 | |
| SCHEMBL18903275 | 0.73 | KDM4E (0.35) | IRAK4PDE4DPDE4BPDE4APDE4C |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8092978-B2 | Positive resist composition for electron beam, X-ray or EUV and pattern forming method using the same | FUJIFILM CORPORATION (JP) | 2012-01-10 | — | — | US | disclosed |
| US-20090246685-A1 | POSITIVE RESIST COMPOSITION FOR ELECTRON BEAM, X-RAY OR EUV AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2009-10-01 | — | — | US | disclosed |