SCHEMBL10167792

SCHEMBL10167792

Cc1ccc2c(c1)c1cc(C)ccc1[s+]2-c1ccc(CCO)cc1

nearest known ligand 0.37

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA2 P00918 2/20 0.37
MAP2K4 P45985 2/20 0.36
CYP4F2 P78329 4/20 0.35
CYP4A11 Q02928 4/20 0.35
TDP1 Q9NUW8 1/20 0.34
BACE1 P56817 2/20 0.34
KDM4E B2RXH2 1/20 0.34
ALDH1A1 P00352 1/20 0.34
ALOX5 P09917 1/20 0.34
GAA P10253 1/20 0.34
MAPT P10636 1/20 0.34
IGF1R P08069 1/20 0.33
ALOX15 P16050 1/20 0.33
CYP1A2 P05177 1/20 0.32
CYP2A6 P11509 1/20 0.32
TAAR1 Q96RJ0 1/20 0.32
CA12 O43570 1/20 0.32
CA1 P00915 1/20 0.32
CA4 P22748 1/20 0.32
CA6 P23280 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10167766 0.86 KDM4E (0.42) CA2CYP4F2CYP4A11TDP1BACE1
SCHEMBL2611753 0.81 MAPKAPK2 (0.40) CA2TDP1BACE1KDM4EALDH1A1
SCHEMBL682975 0.76 TDP1 (0.48) CA2CYP4F2CYP4A11TDP1BACE1
SCHEMBL10167772 0.75 TDP1 (0.44) CA2TDP1BACE1KDM4EALDH1A1
Iodide SCHEMBL546036 0.75 TDP1 (0.47) CA2CYP4F2CYP4A11TDP1BACE1
SCHEMBL20413 0.72 CA2 (0.59) CA2CYP4F2CYP4A11TDP1BACE1
SCHEMBL2611741 0.72 LMNA (0.35) ACHE
Acetic Acid SCHEMBL3775709 0.71 TSHR (0.39) CA2CYP4F2CYP4A11TDP1ALDH1A1
SCHEMBL15725304 0.70 CA2 (0.52) CA2CYP4F2CYP4A11TDP1BACE1
SCHEMBL8737948 0.69 LMNA (0.37) TDP1KDM4EALDH1A1MAPTCYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8110333-B2 Resist composition containing novel sulfonium compound, pattern-forming method using the resist composition, and novel sulfonium compound FUJIFILM CORPORATION (JP) 2012-02-07 US disclosed
US-7858289-B2 Positive resist composition for electron beam, X-ray or EUV and pattern forming method using the same FUJIFILM CORPORATION (JP) 2010-12-28 US disclosed
US-20090111047-A1 POSITIVE RESIST COMPOSITION FOR ELECTRON BEAM, X-RAY OR EUV AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2009-04-30 US disclosed
US-20090042124-A1 RESIST COMPOSITION CONTAINING NOVEL SULFONIUM COMPOUND, PATTERN-FORMING METHOD USING THE RESIST COMPOSITION, AND NOVEL SULFONIUM COMPOUND FUJIFILM CORPORATION (JP) 2009-02-12 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20090042124-A1 RESIST COMPOSITION CONTAINING NOVEL SULFONIUM COMPOUND, PATTERN-FORMING METHOD USING THE RESIST COMPOSITION, AND NOVEL SULFONIUM COMPOUND ADH5, SRRM2, ADH1A CA2 3080/4885MAP2K4 3821/4885CYP4F2 2227/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.