SCHEMBL10167766

SCHEMBL10167766

OCCc1ccc(-[s+]2c3ccc(CCO)cc3c3cc(CCO)ccc32)cc1

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 1/20 0.42
ALDH1A1 P00352 1/20 0.42
ALOX5 P09917 1/20 0.42
GAA P10253 1/20 0.42
MAPT P10636 1/20 0.42
BACE1 P56817 1/20 0.42
CA2 P00918 2/20 0.42
TDP1 Q9NUW8 1/20 0.39
CA12 O43570 1/20 0.35
CA1 P00915 1/20 0.35
CA4 P22748 1/20 0.35
CA6 P23280 1/20 0.35
CA5A P35218 1/20 0.35
CA7 P43166 1/20 0.35
CA9 Q16790 1/20 0.35
CA14 Q9ULX7 1/20 0.35
CA5B Q9Y2D0 1/20 0.35
TSHR P16473 1/20 0.35
CYP4F2 P78329 4/20 0.33
CYP4A11 Q02928 4/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2611753 0.86 MAPKAPK2 (0.40) KDM4EALDH1A1ALOX5GAAMAPT
SCHEMBL10167792 0.86 CA2 (0.37) KDM4EALDH1A1ALOX5GAAMAPT
SCHEMBL2611729 0.82 RXRA (0.35) KDM4EALDH1A1ALOX5GAAMAPT
SCHEMBL682975 0.81 TDP1 (0.48) KDM4EALDH1A1ALOX5GAAMAPT
SCHEMBL10167772 0.81 TDP1 (0.44) KDM4EALDH1A1ALOX5GAAMAPT
SCHEMBL2611741 0.80 LMNA (0.35)
Iodide SCHEMBL546036 0.80 TDP1 (0.47) KDM4EALDH1A1ALOX5GAAMAPT
Acetic Acid SCHEMBL3775709 0.73 TSHR (0.39) ALDH1A1CA2TDP1CA12CA1
SCHEMBL40656 0.69 CA2 (0.77) KDM4EALDH1A1ALOX5GAAMAPT
SCHEMBL2611737 0.69 CA2 (0.41) ALOX5MAPTCA2TDP1CYP4F2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8110333-B2 Resist composition containing novel sulfonium compound, pattern-forming method using the resist composition, and novel sulfonium compound FUJIFILM CORPORATION (JP) 2012-02-07 US disclosed
US-7858289-B2 Positive resist composition for electron beam, X-ray or EUV and pattern forming method using the same FUJIFILM CORPORATION (JP) 2010-12-28 US disclosed
US-20090111047-A1 POSITIVE RESIST COMPOSITION FOR ELECTRON BEAM, X-RAY OR EUV AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2009-04-30 US disclosed
US-20090042124-A1 RESIST COMPOSITION CONTAINING NOVEL SULFONIUM COMPOUND, PATTERN-FORMING METHOD USING THE RESIST COMPOSITION, AND NOVEL SULFONIUM COMPOUND FUJIFILM CORPORATION (JP) 2009-02-12 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20090042124-A1 RESIST COMPOSITION CONTAINING NOVEL SULFONIUM COMPOUND, PATTERN-FORMING METHOD USING THE RESIST COMPOSITION, AND NOVEL SULFONIUM COMPOUND ADH5, SRRM2, ADH1A KDM4E 3872/4885ALDH1A1 1228/4885ALOX5 2439/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.