SCHEMBL10172875

SCHEMBL10172875

O=C(OCCS(=O)(=O)O)c1ccc(O)cc1

nearest known ligand 0.65

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 4/20 0.61
TSHR P16473 2/20 0.61
ALDH1A1 P00352 2/20 0.61
CHRM1 P11229 1/20 0.61
SLC6A2 P23975 1/20 0.61
KDR P35968 1/20 0.61
TDP1 Q9NUW8 1/20 0.61
LMNA P02545 3/20 0.57
SMN1; SMN2 Q16637 2/20 0.57
CYP2D6 P10635 2/20 0.57
MAPK1 P28482 2/20 0.57
CYP1A2 P05177 1/20 0.57
CYP2C19 P33261 1/20 0.57
NR1H2 P55055 1/20 0.57
RNASEL Q05823 1/20 0.57
ESR2 Q92731 3/20 0.55
MEN1 O00255 2/20 0.55
KMT2A Q03164 2/20 0.55
CA12 O43570 2/20 0.55
CA1 P00915 2/20 0.55

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27600533 0.93 TSHR (0.48) ESR1TSHRALDH1A1CHRM1SLC6A2
SCHEMBL10172838 0.90 ESR1 (0.63) ESR1TSHRALDH1A1CHRM1SLC6A2
SCHEMBL10172868 0.88 ESR1 (0.61) ESR1TSHRALDH1A1CHRM1SLC6A2
SCHEMBL28588190 0.87 ESR1 (0.59) ESR1TSHRALDH1A1CHRM1SLC6A2
SCHEMBL27600534 0.86 TDP1 (0.47) ESR1TSHRALDH1A1CHRM1SLC6A2
SCHEMBL18775851 0.84 GAA (0.53) ESR1TSHRALDH1A1CHRM1SLC6A2
SCHEMBL18775896 0.84 HPGD (0.49) ESR1TSHRALDH1A1CHRM1SLC6A2
SCHEMBL18775820 0.84 KMT2A (0.45) ESR1TSHRALDH1A1CHRM1SLC6A2
SCHEMBL18775903 0.84 LMNA (0.58) TSHRALDH1A1LMNACYP2D6CYP1A2
SCHEMBL18775901 0.84 TSHR (0.42) ESR1TSHRALDH1A1CHRM1SLC6A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11366386-B2 Patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2022-06-21 US disclosed
US-11231649-B2 Patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2022-01-25 US disclosed
US-10808148-B2 Adhesive composition, bio-electrode, method for manufacturing a bio-electrode, and salt SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-10-20 US disclosed
US-20190354016-A1 PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2019-11-21 US disclosed
US-20190354017-A1 PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2019-11-21 US disclosed
US-20190258160-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2019-08-22 US disclosed
US-20180086948-A1 ADHESIVE COMPOSITION, BIO-ELECTRODE, METHOD FOR MANUFACTURING A BIO-ELECTRODE, AND SALT SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-03-29 US disclosed
US-20180086948-A1 ADHESIVE COMPOSITION, BIO-ELECTRODE, METHOD FOR MANUFACTURING A BIO-ELECTRODE, AND SALT SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-03-29 US disclosed
US-20180072930-A1 ADHESIVE COMPOSITION, BIO-ELECTRODE, AND METHOD FOR MANUFACTURING A BIO-ELECTRODE SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-03-15 US disclosed
US-20170115566-A1 RESIST COMPOSITION, PATTERNING PROCESS, AND BARIUM, CESIUM AND CERIUM SALTS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-04-27 US disclosed
US-20170115566-A1 RESIST COMPOSITION, PATTERNING PROCESS, AND BARIUM, CESIUM AND CERIUM SALTS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-04-27 US disclosed
US-9200098-B2 Radiation-sensitive composition and compound JSR CORPORATION (JP) 2015-12-01 US disclosed
US-9200098-B2 Radiation-sensitive composition and compound JSR CORPORATION (JP) 2015-12-01 US disclosed
US-20120164582-A1 RADIATION-SENSITIVE COMPOSITION AND COMPOUND JSR CORPORATION (JP) 2012-06-28 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (6 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20170115566-A1 RESIST COMPOSITION, PATTERNING PROCESS, AND BARIUM, CESIUM AND CERIUM SALTS CASR, LIFR, LBR ESR1 818/4885TSHR 508/4885ALDH1A1 4520/4885
US-10808148-B2 Adhesive composition, bio-electrode, method for manufacturing a bio-electrode, and salt SLC9A1, FN1, EPCAM ESR1 269/4885TSHR 1655/4885ALDH1A1 755/4885
US-11366386-B2 Patterning process FEM1B, EGLN1, TET1 ESR1 392/4885TSHR 4031/4885ALDH1A1 960/4885
US-20180086948-A1 ADHESIVE COMPOSITION, BIO-ELECTRODE, METHOD FOR MANUFACTURING A BIO-ELECTRODE, AND SALT SLC9A1, FN1, EPCAM ESR1 298/4885TSHR 1721/4885ALDH1A1 749/4885
US-20190354017-A1 PATTERNING PROCESS FEM1B, EGLN1, TET1 ESR1 392/4885TSHR 4031/4885ALDH1A1 960/4885
US-20120164582-A1 RADIATION-SENSITIVE COMPOSITION AND COMPOUND RAD51, RER1, ATP6AP1 ESR1 282/4885TSHR 1556/4885ALDH1A1 1300/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.