SCHEMBL10178729

SCHEMBL10178729

CCC(C)c1cccc(COCCOc2ccc(C(=O)c3ccccc3)cc2)c1

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
L3MBTL1 Q9Y468 4/20 0.54
LMNA P02545 3/20 0.54
MAPK1 P28482 1/20 0.54
MAPT P10636 3/20 0.47
MRGPRX4 Q96LA9 2/20 0.46
PPARG P37231 2/20 0.46
GAA P10253 2/20 0.46
ALDH1A1 P00352 4/20 0.46
SMN1; SMN2 Q16637 4/20 0.46
HTT P42858 2/20 0.46
RAB9A P51151 1/20 0.46
PLA2G4B P0C869 1/20 0.45
KDM4E B2RXH2 1/20 0.45
POLB P06746 1/20 0.45
RECQL P46063 1/20 0.45
CA12 O43570 3/20 0.45
CA1 P00915 3/20 0.45
CA2 P00918 3/20 0.45
CA4 P22748 3/20 0.45
CA9 Q16790 3/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10178740 0.90 MRGPRX4 (0.57) L3MBTL1LMNAMAPK1MAPTMRGPRX4
SCHEMBL10178727 0.89 MAPT (0.45) L3MBTL1LMNAMAPK1MAPTMRGPRX4
SCHEMBL10178650 0.88 ALDH1A1 (0.54) L3MBTL1LMNAMAPK1MAPTPPARG
SCHEMBL10178744 0.85 CHRNB2 (0.40) BCHE
SCHEMBL5727237 0.81 SRD5A2 (0.65) L3MBTL1LMNAMAPK1MAPTPPARG
SCHEMBL6378011 0.80 SRD5A2 (0.63) L3MBTL1LMNAMAPK1MAPTPPARG
SCHEMBL10178722 0.78 MAOB (0.64) L3MBTL1MRGPRX4ALDH1A1SMN1; SMN2HTT
SCHEMBL10178734 0.78 MRGPRX4 (0.51) MRGPRX4SMN1; SMN2RAB9ABCHETP53
SCHEMBL10178735 0.77 LMNA (0.56) L3MBTL1LMNAMAPTALDH1A1SMN1; SMN2
SCHEMBL10178585 0.77 ALDH1A1 (0.67) L3MBTL1MAPTPPARGGAAALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8124310-B2 Positive resist composition and pattern forming method using the same FUJIFILM CORPORATION (JP) 2012-02-28 US disclosed
US-20090087784-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2009-04-02 US disclosed