Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PRMT5 | O14744 | 1/20 | 0.36 |
| ▸ | WDR77 | Q9BQA1 | 1/20 | 0.36 |
| ▸ | SLC1A3 | P43003 | 2/20 | 0.34 |
| ▸ | SLC1A2 | P43004 | 2/20 | 0.34 |
| ▸ | SLC1A1 | P43005 | 2/20 | 0.34 |
| ▸ | GBA1 | P04062 | 2/20 | 0.33 |
| ▸ | UGCG | Q16739 | 2/20 | 0.33 |
| ▸ | GBA2 | Q9HCG7 | 2/20 | 0.33 |
| ▸ | CTSL | P07711 | 1/20 | 0.33 |
| ▸ | CTSB | P07858 | 1/20 | 0.33 |
| ▸ | CTSK | P43235 | 1/20 | 0.33 |
| ▸ | LMNA | P02545 | 1/20 | 0.33 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12056418 | 0.98 | PRMT5 (0.34) | PRMT5WDR77SLC1A3SLC1A2SLC1A1 | |
| SCHEMBL131722 | 0.93 | SLC1A3 (0.32) | PRMT5WDR77SLC1A3SLC1A2SLC1A1 | |
| SCHEMBL130874 | 0.88 | — | — | |
| SCHEMBL13002262 | 0.79 | PRMT5 (0.33) | PRMT5WDR77SLC1A3SLC1A2SLC1A1 | |
| SCHEMBL20266033 | 0.78 | CTSK (0.35) | SLC1A3SLC1A2SLC1A1GBA1UGCG | |
| SCHEMBL12687460 | 0.78 | SPHK2 (0.36) | PRMT5WDR77LMNACYP1A2 | |
| SCHEMBL12687468 | 0.78 | SPHK2 (0.36) | PRMT5WDR77LMNACYP1A2 | |
| SCHEMBL10307716 | 0.78 | TDP1 (0.40) | GBA1 | |
| SCHEMBL8977001 | 0.78 | — | — | |
| SCHEMBL19289097 | 0.78 | SHBG (0.32) | PRMT5WDR77SLC1A3SLC1A2SLC1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 34 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2024026486-A2 | CDK2 INHIBITORS AND METHODS OF USING THE SAME | CEDILLA THERAPEUTICS, INC. (US) | 2024-02-01 | — | — | WO | disclosed |
| US-11852970-B2 | Material for lithography, production method therefor, composition for lithography, pattern formation method, compound, resin, and method for purifying the compound or the resin | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2023-12-26 | — | — | US | disclosed |
| US-11852970-B2 | Material for lithography, production method therefor, composition for lithography, pattern formation method, compound, resin, and method for purifying the compound or the resin | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2023-12-26 | — | — | US | disclosed |
| US-20230185191-A1 | COMPOUND, PRODUCTION METHOD THEREFOR, ACID GENERATOR, COMPOSITION, RESIST FILM, UNDERLAYER FILM, PATTERN FORMATION METHOD, AND OPTICAL COMPONENT | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2023-06-15 | — | — | US | disclosed |
| US-20230185191-A1 | COMPOUND, PRODUCTION METHOD THEREFOR, ACID GENERATOR, COMPOSITION, RESIST FILM, UNDERLAYER FILM, PATTERN FORMATION METHOD, AND OPTICAL COMPONENT | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2023-06-15 | — | — | US | disclosed |
| US-11572430-B2 | Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2023-02-07 | — | — | US | disclosed |
| CN-109310601-B | Fragrance material | 高砂香料工业株式会社 | 2022-05-24 | — | — | CN | disclosed |
| US-11143962-B2 | Material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography and production method thereof, pattern forming method, resin, and purification method | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2021-10-12 | — | — | US | disclosed |
| US-20210063880-A1 | RESIST COMPOSITION AND PATTERN FORMATION METHOD USING SAME, COMPOUND AND RESIN | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2021-03-04 | — | — | US | disclosed |
| US-20210047457-A1 | COMPOUND, RESIN, COMPOSITION AND PATTERN FORMATION METHOD | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2021-02-18 | — | — | US | disclosed |
| US-8846292-B2 | Radiation-sensitive composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2014-09-30 | — | — | US | disclosed |
| US-20130150627-A1 | PURIFICATION METHOD FOR CYCLIC COMPOUND | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2013-06-13 | — | — | US | disclosed |
| US-20130122423-A1 | COMPOUND, RADIATION-SENSITIVE COMPOSITION AND RESIST PATTERN FORMATION METHOD | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2013-05-16 | — | — | US | disclosed |
| US-8334290-B2 | CETP inhibitors | MERCK SHARP & DOHME CORP. (US) | 2012-12-18 | — | — | US | disclosed |
| US-8334290-B2 | CETP inhibitors | MERCK SHARP & DOHME CORP. (US) | 2012-12-18 | — | — | US | disclosed |
| US-20120171379-A1 | RADIATION-SENSITIVE COMPOSITION | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2012-07-05 | — | — | US | disclosed |
| US-8110334-B2 | Radiation-sensitive composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2012-02-07 | — | — | US | disclosed |
| US-20100047709-A1 | RADIATION-SENSITIVE COMPOSITION | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2010-02-25 | — | — | US | disclosed |
| US-20090264405-A1 | Cetp Inhibitors | MERCK SHARP & DOHME LLC | 2009-10-22 | — | — | US | disclosed |
| US-20090264405-A1 | Cetp Inhibitors | MERCK SHARP & DOHME LLC | 2009-10-22 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (9 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20090264405-A1 | Cetp Inhibitors | CETP, APOB, PCSK9 | PRMT5 2732/4885WDR77 1050/4885SLC1A3 4180/4885 |
| US-11852970-B2 | Material for lithography, production method therefor, composition for lithography, pattern formation method, compound, resin, and method for purifying the compound or the resin | SLC39A11, CROCC, TERB1 | PRMT5 433/4885WDR77 133/4885SLC1A3 1835/4885 |
| US-20130150627-A1 | PURIFICATION METHOD FOR CYCLIC COMPOUND | PCLAF, PCNA, VIP | PRMT5 3073/4885WDR77 4013/4885SLC1A3 4305/4885 |
| US-20230185191-A1 | COMPOUND, PRODUCTION METHOD THEREFOR, ACID GENERATOR, COMPOSITION, RESIST FILM, UNDERLAYER FILM, PATTERN FORMATION METHOD, AND OPTICAL COMPONENT | SOAT2, SOAT1, FAR1 | PRMT5 2682/4885WDR77 2783/4885SLC1A3 1379/4885 |
| US-20130122423-A1 | COMPOUND, RADIATION-SENSITIVE COMPOSITION AND RESIST PATTERN FORMATION METHOD | DDB1, DNAJB11, RAD51 | PRMT5 3192/4885WDR77 2995/4885SLC1A3 4856/4885 |
| US-11572430-B2 | Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method | C9, C5, C1R | PRMT5 132/4885WDR77 2073/4885SLC1A3 2342/4885 |
| US-20120171379-A1 | RADIATION-SENSITIVE COMPOSITION | PARG, RAD51, SRMS | PRMT5 1981/4885WDR77 2004/4885SLC1A3 4366/4885 |
| US-20100047709-A1 | RADIATION-SENSITIVE COMPOSITION | C1S, C9, RAD51 | PRMT5 2497/4885WDR77 2275/4885SLC1A3 4037/4885 |
| US-11143962-B2 | Material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography and production method thereof, pattern forming method, resin, and purification method | MLLT1, MLLT3, KDM2B | PRMT5 243/4885WDR77 3382/4885SLC1A3 1634/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.