SCHEMBL10312376

SCHEMBL10312376

CO[Si](CCCNS(=O)(=O)c1ccc(S(=O)(=O)NCCC[Si](CO)(CO)CO)cc1)(OC)OC

nearest known ligand 0.54

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 9/20 0.54
PKM P14618 3/20 0.54
USP2 O75604 1/20 0.48
MAPK1 P28482 2/20 0.44
SMN1; SMN2 Q16637 2/20 0.43
LMNA P02545 2/20 0.43
MAPT P10636 2/20 0.43
KDM4E B2RXH2 1/20 0.43
NPC1 O15118 1/20 0.43
HPGD P15428 1/20 0.43
RAB9A P51151 1/20 0.43
MEN1 O00255 2/20 0.43
KMT2A Q03164 2/20 0.43
HTT P42858 1/20 0.42
POLB P06746 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14980269 0.84 ALDH1A1 (0.60) ALDH1A1PKMLMNAMAPTHPGD
SCHEMBL14150586 0.82 MAPK1 (0.65) ALDH1A1PKMMAPK1SMN1; SMN2LMNA
SCHEMBL2616685 0.80 POLB (0.68) ALDH1A1PKMSMN1; SMN2LMNAKDM4E
SCHEMBL10312356 0.78 RELA (0.31)
SCHEMBL16015204 0.76 ALDH1A1 (0.65) ALDH1A1SMN1; SMN2LMNAPOLB
SCHEMBL10312354 0.74 ALDH1A1 (0.64) ALDH1A1SMN1; SMN2LMNAPOLB
SCHEMBL18311526 0.74 ALDH1A1 (0.68) ALDH1A1PKMUSP2SMN1; SMN2LMNA
SCHEMBL17077606 0.73 MAPK1 (0.59) ALDH1A1PKMUSP2MAPK1SMN1; SMN2
Hydrochloric Acid SCHEMBL18553820 0.73 ALDH1A1 (0.51) ALDH1A1PKMUSP2SMN1; SMN2LMNA
SCHEMBL18573521 0.72 MAPK1 (0.55) ALDH1A1PKMUSP2MAPK1SMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8828879-B2 Silicon-containing composition having sulfonamide group for forming resist underlayer film NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2014-09-09 US disclosed
US-20120178261-A1 SILICON-CONTAINING COMPOSITION HAVING SULFONAMIDE GROUP FOR FORMING RESIST UNDERLAYER FILM NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2012-07-12 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20120178261-A1 SILICON-CONTAINING COMPOSITION HAVING SULFONAMIDE GROUP FOR FORMING RESIST UNDERLAYER FILM STS, SI, MUS81 ALDH1A1 2958/4885PKM 2643/4885USP2 376/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.