Tetraphenylphosphonium

Tetraphenylphosphonium

SCHEMBL1032707

O=C([O-])c1ccccc1.c1ccc([P+](c2ccccc2)(c2ccccc2)c2ccccc2)cc1

nearest known ligand 0.70

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

CACNA1CCACNA1DCACNA1FCACNA1SDPP4HTR1BHTR1D

The experimentally established mechanism targets of Tetraphenylphosphonium. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA2 P00918 11/20 0.70
CA4 P22748 2/20 0.70
TSHR P16473 3/20 0.44
CES2 O00748 2/20 0.44
CES1 P23141 2/20 0.44
DAO P14920 1/20 0.44
NAPRT Q6XQN6 1/20 0.44
ALDH1A1 P00352 1/20 0.44
CA1 P00915 10/20 0.43
TDP1 Q9NUW8 2/20 0.41
L3MBTL1 Q9Y468 2/20 0.41
POLB P06746 1/20 0.41
CYP3A4 P08684 1/20 0.41
PARP1 P09874 1/20 0.41
MAPT P10636 1/20 0.41
CYP2C19 P33261 1/20 0.41
RECQL P46063 1/20 0.41
BLM P54132 1/20 0.41
PMP22 Q01453 1/20 0.41
HSD17B10 Q99714 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Tetraphenylphosphonium SCHEMBL21957806 0.95 CA2 (0.62) CA2CA4TSHRCES2CES1
Tetraphenylphosphonium SCHEMBL2000464 0.94 CA2 (0.61) CA2CA4TSHRCES2CES1
Tetraphenylphosphonium SCHEMBL7616105 0.90 CA2 (0.57) CA2CA4TSHRCES2CES1
Tetraphenylphosphonium SCHEMBL11233696 0.90 CA2 (0.56) CA2CA4TSHRCES2CES1
Tetraphenylphosphonium SCHEMBL7614263 0.87 CA2 (0.53) CA2CA4TSHRCES2CES1
Benzoic Acid SCHEMBL7872905 0.86 CA2 (0.57) CA2CA4CES2CES1ALDH1A1
Tetraphenylphosphonium SCHEMBL4388860 0.85 CA2 (0.46) CA2CA4TSHRCES2CES1
Benzoic Acid SCHEMBL11789341 0.85 CA2 (0.94) CA2CA4TSHRCES2CES1
Tetraphenylphosphonium SCHEMBL21957776 0.84 ALDH1A1 (0.52) CA2CA4TSHRCES2CES1
Tetraphenylphosphonium SCHEMBL1155888 0.83 CA2 (0.44) CA2CA4TSHRCES2CES1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 188 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8450403-B2 Branched polycarbonate resin composition, and branched polycarbonate resin and molded product made using the same CHEIL INDUSTRIES INC. (KR) 2013-05-28 US claimed
US-20100160572-A1 Branched Polycarbonate Resin Composition, and Branched Polycarbonate Resin and Molded Product Made Using the Same CHEIL INDUSTRIES INC. (KR) 2010-06-24 US claimed
US-7122613-B1 Method for the production of polycarbonates GENERAL ELECTRIC COMPANY (US) 2006-10-17 US claimed
EP-1578840-A1 METHOD FOR THE PRODUCTION OF POLYCARBONATES General Electric Company (US) 2005-09-28 EP claimed
WO-2004060963-A1 METHOD FOR THE PRODUCTION OF POLYCARBONATES GENERAL ELECTRIC COMPANY (US) 2004-07-22 WO claimed
US-6316575-B1 MELT TRANSESTERIFICATION OF DIOL COMPOUND AND CARBOANTE COMPOUND USING CATALYST COMPRISING A PHOSPHORUS-CONTAINING BASIC COMPOUND QUATERNARY PHOSPHONIUM SALT TO FORM POLYCARBONATE IDEMITSU KOSAN CO., LTD. (JP) 2001-11-13 US claimed
US-5153335-A Reacting halophthalic anhydride and alkali metal salt with acid or acid derivative catalyst OCCIDENTAL CHEMICAL CORPORATION (US) 1992-10-06 US claimed
US-20260118767-A1 REVERSE PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2026-04-30 US disclosed
US-20260044081-A1 COMPOSITION FOR FORMING SILICON-CONTAINING RESIST FILM AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2026-02-12 US disclosed
EP-4692941-A2 COMPOSITION FOR FORMING SILICON-CONTAINING RESIST FILM AND PATTERNING PROCESS Shin-Etsu Chemical Co., Ltd. (JP) 2026-02-11 EP disclosed
US-20250340697-A1 METHOD FOR THE MANUFACTURE OF POLYCARBONATE SABIC GLOBAL TECHNOLOGIES BV (NL) 2025-11-06 US disclosed
EP-4621486-A2 POLYVALENT AMMONIUM SALT COMPOUND, COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2025-09-24 EP disclosed
US-20250289931-A1 POLYVALENT AMMONIUM SALT COMPOUND, COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2025-09-18 US disclosed
EP-0826658-A1 Catalyst for decarbonylation reaction UBE INDUSTRIES, LTD. (JP) 1998-03-04 EP disclosed
EP-0702044-A1 Polycarbonate redistribution method GENERAL ELECTRIC COMPANY (US) 1996-03-20 EP disclosed
US-5459226-A Melt extrusion in presence of tetraorganophosphonium carboxylate salt GENERAL ELECTRIC COMPANY (US) 1995-10-17 US disclosed
EP-0671428-A1 Method for making polycarbonates GENERAL ELECTRIC COMPANY (US) 1995-09-13 EP disclosed
US-5412061-A Polycarbonate melt condensation synthesis using a tetraorganophosphonium carboxylate salt catalyst GENERAL ELECTRIC COMPANY (US) 1995-05-02 US disclosed
US-5153335-A Reacting halophthalic anhydride and alkali metal salt with acid or acid derivative catalyst OCCIDENTAL CHEMICAL CORPORATION (US) 1992-10-06 US disclosed
EP-0460687-A2 Process for the preparation of oxydiphthalic anhydride and acyloxyphthalic anhydrides OCCIDENTAL CHEMICAL CORPORATION (US) 1991-12-11 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20250289931-A1 POLYVALENT AMMONIUM SALT COMPOUND, COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM, AND PATTERNING PROCESS ASH2L, PUF60, IDUA CA2 1064/4885CA4 749/4885TSHR 3217/4885
US-20260118767-A1 REVERSE PATTERNING PROCESS EFNA1, EPHA4, ETV6 CA2 2902/4885CA4 281/4885TSHR 770/4885
US-20260044081-A1 COMPOSITION FOR FORMING SILICON-CONTAINING RESIST FILM AND PATTERNING PROCESS SMC1A, SPOUT1, LBR CA2 2105/4885CA4 1681/4885TSHR 446/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.