SCHEMBL10351730

SCHEMBL10351730

O=C(Cc1ccccc1)c1ccc(O)c(O)c1

nearest known ligand 0.61

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 3/20 0.58
L3MBTL1 Q9Y468 2/20 0.58
SRD5A2 P31213 2/20 0.56
KDM4E B2RXH2 3/20 0.55
RAB9A P51151 2/20 0.55
PLAU P00749 1/20 0.55
NPC1 O15118 1/20 0.55
SMN1; SMN2 Q16637 1/20 0.55
GAA P10253 3/20 0.53
POLB P06746 2/20 0.53
CA12 O43570 1/20 0.53
CA1 P00915 1/20 0.53
CA2 P00918 1/20 0.53
CA4 P22748 1/20 0.53
CA6 P23280 1/20 0.53
PTGS2 P35354 1/20 0.53
CA7 P43166 1/20 0.53
CA9 Q16790 1/20 0.53
CA14 Q9ULX7 1/20 0.53
ERCC1 P07992 1/20 0.53

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL108103 0.85 KDM4E (0.62) MAPTL3MBTL1KDM4ERAB9AGAA
SCHEMBL4296416 0.84 LMNA (0.56) MAPTL3MBTL1SRD5A2KDM4ERAB9A
SCHEMBL9240920 0.84 HNF4A (0.58) MAPTL3MBTL1SRD5A2KDM4ERAB9A
SCHEMBL14533992 0.84 MAPT (0.57) MAPTL3MBTL1SRD5A2KDM4ERAB9A
SCHEMBL10350541 0.83 RAB9A (0.56) MAPTL3MBTL1SRD5A2KDM4ERAB9A
SCHEMBL10705887 0.83 AKR1B1 (0.55) MAPTL3MBTL1SRD5A2KDM4ERAB9A
SCHEMBL13799781 0.82 ALPG (0.51) MAPTL3MBTL1KDM4EGAAPOLB
SCHEMBL7129800 0.82 MAPT (0.80) MAPTL3MBTL1SRD5A2KDM4ERAB9A
SCHEMBL2937587 0.81 KDM4E (0.63) MAPTL3MBTL1SRD5A2KDM4EPLAU
SCHEMBL6575456 0.80 GAA (0.56) MAPTL3MBTL1KDM4ERAB9ANPC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109232251-A 3, 4-Dihydroxyacetophenone derivative, preparation method, application and pharmaceutical composition 潍坊医学院 2019-01-18 CN disclosed
EP-0092444-B1 POSITIVE TYPE PHOTOSENSITIVE RESIN COMPOSITION JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1990-08-29 EP disclosed
US-4499171-A IN ALKALI SOLUBLE NOVOLAK RESIN JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1985-02-12 US disclosed
EP-0092444-A2 Positive type photosensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1983-10-26 EP disclosed