SCHEMBL10400142

SCHEMBL10400142

C[Si](C)(CCC(N)C1CCCCC1)O[Si](C)(C)CCC(N)C1CCCCC1

nearest known ligand 0.39

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
EPHX1 P07099 1/20 0.33
DPP4 P27487 1/20 0.33
SHBG P04278 1/20 0.33
SIGMAR1 Q99720 1/20 0.33
TP53 P04637 1/20 0.31
KDM4E B2RXH2 1/20 0.31
GMNN O75496 1/20 0.31
LMNA P02545 1/20 0.31
MAPT P10636 1/20 0.31
BLM P54132 1/20 0.31
PMP22 Q01453 1/20 0.31
SMN1; SMN2 Q16637 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28370484 0.82 EPHX1 (0.37) EPHX1DPP4SHBGSIGMAR1TP53
SCHEMBL3388586 0.80 DPP4 (0.33) EPHX1DPP4SHBGSIGMAR1TP53
SCHEMBL1754268 0.78 EPHX1 (0.33) EPHX1DPP4SHBGSIGMAR1TP53
SCHEMBL3724884 0.75 SHBG (0.35) EPHX1DPP4SHBGSIGMAR1
SCHEMBL2781157 0.75 EPHX1 (0.48) EPHX1DPP4SHBGSIGMAR1TP53
SCHEMBL21099017 0.74 SIGMAR1 (0.38) EPHX1DPP4SHBGSIGMAR1TP53
SCHEMBL30142421 0.71 SHBG (0.46) EPHX1DPP4SHBGSIGMAR1TP53
SCHEMBL7104978 0.71 SHBG (0.46) EPHX1DPP4SHBGSIGMAR1TP53
SCHEMBL20319041 0.71 SHBG (0.46) EPHX1DPP4SHBGSIGMAR1TP53
SCHEMBL3834490 0.71 EPHX1 (0.44) EPHX1DPP4SHBGSIGMAR1TP53

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4892918-A TOUGHENING THERMOSETTING MATRIX RESINS BASF CORPORATION (US) 1990-01-09 US disclosed
US-4847154-A Thermosetting resin systems containing secondary amine-terminated siloxane modifiers BASF CORPORATION (US) 1989-07-11 US disclosed
EP-0312771-A1 Thermosetting resin systems containing secondary amine-terminated siloxane modifiers BASF Aktiengesellschaft (DE) 1989-04-26 EP disclosed