SCHEMBL10441237

SCHEMBL10441237

CCC(c1ccc(Oc2ccc(N=C=O)cc2)cc1)c1ccc(Oc2ccc(N=C=O)cc2)cc1

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP3A4 P08684 2/20 0.42
TSHR P16473 2/20 0.42
CYP17A1 P05093 1/20 0.39
FFAR1 O14842 2/20 0.35
TRPA1 O75762 1/20 0.34
NOS3 P29474 2/20 0.34
NOS1 P29475 2/20 0.34
NOS2 P35228 2/20 0.34
ALDH1A1 P00352 1/20 0.33
MIF P14174 1/20 0.33
LTA4H P09960 1/20 0.33
CYP1A2 P05177 1/20 0.33
GABRA1 P14867 1/20 0.33
GABRB2 P47870 1/20 0.33
MAPK1 P28482 1/20 0.33
TDP1 Q9NUW8 1/20 0.33
ACACB O00763 1/20 0.32
ACACA Q13085 1/20 0.32
ESR1 P03372 1/20 0.32
HIF1A Q16665 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1900349 0.90 CYP3A4 (0.50) CYP3A4TSHRCYP17A1TRPA1MIF
SCHEMBL50333 0.80 CYP3A4 (0.54) CYP3A4TSHRTRPA1ALDH1A1MIF
SCHEMBL4544188 0.80 CYP3A4 (0.54) CYP3A4TSHRTRPA1ALDH1A1MIF
SCHEMBL4551613 0.80 CYP3A4 (0.54) CYP3A4TSHRTRPA1ALDH1A1MIF
Ether SCHEMBL2581487 0.80 CYP3A4 (0.47) CYP3A4TSHRTRPA1NOS3NOS1
SCHEMBL10299707 0.79 NOS3 (0.42) CYP3A4TSHRTRPA1NOS3NOS1
SCHEMBL10299637 0.78 LTA4H (0.53) CYP3A4TSHRALDH1A1LTA4HCYP1A2
SCHEMBL242048 0.77 LTA4H (0.50) CYP3A4TSHRNOS3NOS1NOS2
SCHEMBL28508068 0.77 LTA4H (0.47) TSHRCYP17A1LTA4HACACBACACA
SCHEMBL28101787 0.75 LTA4H (0.48) CYP3A4TSHRTRPA1NOS3ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-106552517-B Barrier filter, method for filtering, method for producing purified product of liquid chemical for lithography, and method for forming resist pattern 东京应化工业株式会社 2021-10-26 CN disclosed
EP-0384036-A2 Heat-resistant resin paste and integrated circuit device produced by using the heat-resistant resin paste Hitachi Chemical Co., Ltd. (JP) 1990-08-29 EP disclosed