SCHEMBL10459155

SCHEMBL10459155

IC1C2CC3CC(C2)CC1C3

nearest known ligand 0.47

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
CYP2C9 P11712 1/20 0.47
EPHX2 P34913 2/20 0.35
HSD11B1 P28845 1/20 0.33
CYP2A13 Q16696 1/20 0.32
CA1 P00915 1/20 0.32
CA2 P00918 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14730128 0.77
SCHEMBL14202660 0.76 HSD11B1 (0.37) CYP2C9HSD11B1
Adamantane SCHEMBL29707714 0.71 CYP2C9 (0.46) CYP2C9EPHX2HSD11B1
Adamantane SCHEMBL9016497 0.71 CYP2C9 (0.46) CYP2C9EPHX2HSD11B1
Adamantane SCHEMBL1527414 0.71 CYP2C9 (0.46) CYP2C9EPHX2HSD11B1
Adamantane SCHEMBL12761 0.71 CYP2C9 (0.46) CYP2C9EPHX2HSD11B1
SCHEMBL24525978 0.70
SCHEMBL2189873 0.70 CYP2C9 (0.50) CYP2C9EPHX2HSD11B1CYP2A13CA1
Adamantane SCHEMBL20741994 0.66 CYP2C9 (0.43) CYP2C9EPHX2
Adamantane SCHEMBL21820021 0.66 CYP2C9 (0.43) CYP2C9EPHX2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119661596-A Preparation method and application of 1, 2-dioxan luminous compound 苏州亚科科技股份有限公司 2025-03-21 CN claimed
CN-119661596-A Preparation method and application of 1, 2-dioxan luminous compound 苏州亚科科技股份有限公司 2025-03-21 CN disclosed
EP-3018118-B1 BASE GENERATOR, BASE-REACTIVE COMPOSITION CONTAINING SAID BASE GENERATOR, AND BASE GENERATION METHOD FUJIFILM WAKO PURE CHEMICAL CORP (JP) 2023-07-05 EP disclosed
US-20230002417-A1 ORGANIC ELECTROLUMINESCENT MATERIALS AND DEVICES UNIVERSAL DISPLAY CORPORATION (US) 2023-01-05 US disclosed
EP-3327002-B1 ACID-RESISTANT BASE AND/OR RADICAL GENERATOR, AND CURABLE RESIN COMPOSITION CONTAINING SAID BASE AND/OR RADICAL GENERATOR FUJIFILM WAKO PURE CHEMICAL CORP (JP) 2020-08-19 EP disclosed
US-10428015-B2 Acid-resistant base and/or radical generator, and curable resin composition containing said base and/or radical generator FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) 2019-10-01 US disclosed
US-10428014-B2 Base generator, base-reactive composition containing said base generator, and base generation method FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) 2019-10-01 US disclosed
US-10392455-B2 Process for controlling the polymer composition of an ethylene copolymer obtained by a catalyst system comprising a transition metal catalyst component and a Ziegler catalyst component BASELL POLYOLEFINE GMBH (DE) 2019-08-27 US disclosed
US-20190002403-A1 ACID-RESISTANT BASE AND/OR RADICAL GENERATOR, AND CURABLE RESIN COMPOSITION CONTAINING SAID BASE AND/OR RADICAL GENERATOR FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) 2019-01-03 US disclosed
EP-3098226-B1 BORATE-BASED BASE GENERATOR, AND BASE-REACTIVE COMPOSITION COMPRISING SUCH BASE GENERATOR FUJIFILM WAKO PURE CHEMICAL CORP (JP) 2018-12-12 EP disclosed
US-20160340374-A1 BORATE-BASED BASE GENERATOR, AND BASE-REACTIVE COMPOSITION COMPRISING SUCH BASE GENERATOR FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) 2016-11-24 US disclosed
EP-2794691-B1 PROCESS FOR CONTROLLING THE POLYMER COMPOSITION OF AN ETHYLENE COPOLYMER OBTAINED BY A CATALYST SYSTEM COMPRISING A TRANSITION METAL CATALYST COMPONENT AND A ZIEGLER CATALYST COMPONENT BASELL POLYOLEFINE GMBH (DE) 2016-06-22 EP disclosed
EP-3018118-A1 BASE GENERATOR, BASE-REACTIVE COMPOSITION CONTAINING SAID BASE GENERATOR, AND BASE GENERATION METHOD Wako Pure Chemical Industries, Ltd. (JP) 2016-05-11 EP disclosed
US-20160122292-A1 BASE GENERATOR, BASE-REACTIVE COMPOSITION CONTAINING SAID BASE GENERATOR, AND BASE GENERATION METHOD TOKYO UNIVERSITY OF SCIENCE FOUNDATION (JP) 2016-05-05 US disclosed
US-20140329978-A1 PROCESS FOR CONTROLLING THE POLYMER COMPOSITION OF AN ETHYLENE COPOLYMER OBTAINED BY A CATALYST SYSTEM COMPRISING A TRANSITION METAL CATALYST COMPONENT AND A ZIEGLER CATALYST COMPONENT BASELL POLYOLEFINE GMBH (DE) 2014-11-06 US disclosed
EP-2794691-A1 PROCESS FOR CONTROLLING THE POLYMER COMPOSITION OF AN ETHYLENE COPOLYMER OBTAINED BY A CATALYST SYSTEM COMPRISING A TRANSITION METAL CATALYST COMPONENT AND A ZIEGLER CATALYST COMPONENT Basell Polyolefine GmbH (DE) 2014-10-29 EP disclosed
WO-2013092453-A1 PROCESS FOR CONTROLLING THE POLYMER COMPOSITION OF AN ETHYLENE COPOLYMER OBTAINED BY A CATALYST SYSTEM COMPRISING A TRANSITION METAL CATALYST COMPONENT AND A ZIEGLER CATALYST COMPONENT BASELL POLYOLEFINE GMBH (DE) 2013-06-27 WO disclosed
EP-2607391-A1 Process for controlling the polymer composition of an ethylene copolymer obtained by a catalyst system comprising a transition metal catalyst component and a Ziegler catalyst component Basell Polyolefine GmbH (DE) 2013-06-26 EP disclosed
US-4942210-A ISOOLEFIN POLYMER WITH TERMINAL ADAMANTANE GROUP EXXON CHEMICAL PATENTS INC. (US) 1990-07-17 US disclosed
US-4711866-A Adamantane polymerization catalyst EXXON CHEMICAL PATENTS INC. (US) 1987-12-08 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (6 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-10428015-B2 Acid-resistant base and/or radical generator, and curable resin composition containing said base and/or radical generator REV1, RER1, CBR1 CYP2C9 1067/4885EPHX2 1045/4885HSD11B1 3236/4885
US-10428014-B2 Base generator, base-reactive composition containing said base generator, and base generation method HPRT1, GNG2, BLM CYP2C9 524/4885EPHX2 417/4885HSD11B1 1257/4885
US-20190002403-A1 ACID-RESISTANT BASE AND/OR RADICAL GENERATOR, AND CURABLE RESIN COMPOSITION CONTAINING SAID BASE AND/OR RADICAL GENERATOR REV1, RER1, CBR1 CYP2C9 1067/4885EPHX2 1045/4885HSD11B1 3236/4885
US-20230002417-A1 ORGANIC ELECTROLUMINESCENT MATERIALS AND DEVICES OCIAD1, OCIAD2, ODC1 CYP2C9 167/4885EPHX2 573/4885HSD11B1 980/4885
US-20160340374-A1 BORATE-BASED BASE GENERATOR, AND BASE-REACTIVE COMPOSITION COMPRISING SUCH BASE GENERATOR ENPP3, GNG2, ENPP1 CYP2C9 2978/4885EPHX2 395/4885HSD11B1 4137/4885
US-20160122292-A1 BASE GENERATOR, BASE-REACTIVE COMPOSITION CONTAINING SAID BASE GENERATOR, AND BASE GENERATION METHOD GNG2, EPHX2, ARHGEF1 CYP2C9 188/4885EPHX2 2/4885HSD11B1 664/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.