Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | THRB | P10828 | 1/20 | 0.41 |
| ▸ | TSHR | P16473 | 4/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.34 |
| ▸ | LMNA | P02545 | 1/20 | 0.34 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.34 |
| ▸ | MGAM | O43451 | 1/20 | 0.33 |
| ▸ | GAA | P10253 | 1/20 | 0.33 |
| ▸ | SI | P14410 | 1/20 | 0.33 |
| ▸ | MGAM2 | Q2M2H8 | 1/20 | 0.33 |
| ▸ | GLO1 | Q04760 | 1/20 | 0.32 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.30 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12186492 | 0.85 | HTT (0.44) | THRBTSHRALDH1A1 | |
| SCHEMBL26893069 | 0.81 | HTT (0.34) | THRBTSHR | |
| SCHEMBL10475855 | 0.78 | ALDH1A1 (0.38) | TSHRALDH1A1 | |
| SCHEMBL20924746 | 0.77 | ALDH1A1 (0.32) | THRBTSHRALDH1A1LMNAHSD17B10 | |
| SCHEMBL7074875 | 0.76 | THRB (0.47) | THRBTSHRALDH1A1LMNAHSD17B10 | |
| SCHEMBL28810373 | 0.75 | THRB (0.47) | THRBTSHRALDH1A1LMNAHSD17B10 | |
| SCHEMBL1655798 | 0.74 | TSHR (0.48) | THRBTSHRALDH1A1LMNAHSD17B10 | |
| SCHEMBL15721249 | 0.74 | THRB (0.42) | THRBTSHRALDH1A1LMNAHSD17B10 | |
| SCHEMBL20924749 | 0.74 | ALDH1A1 (0.34) | TSHRALDH1A1 | |
| SCHEMBL8600304 | 0.74 | ALDH1A1 (0.39) | TSHRALDH1A1LMNAHSD17B10MGAM |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2479614-B1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYMER AND POLYMERIZABLE COMPOUND | JSR CORP (JP) | 2019-07-24 | — | — | EP | disclosed |
| EP-2781959-B1 | Radiation-sensitive resin composition, method for forming resist pattern, polymer and polymerizable compound | JSR CORP (JP) | 2019-04-24 | — | — | EP | disclosed |
| EP-2781959-B1 | Radiation-sensitive resin composition, method for forming resist pattern, polymer and polymerizable compound | JSR CORP (JP) | 2019-04-24 | — | — | EP | disclosed |
| US-9513548-B2 | Radiation-sensitive resin composition, method for forming resist pattern, polymer and polymerizable compound | JSR CORPORATION (JP) | 2016-12-06 | — | — | US | disclosed |
| US-9513548-B2 | Radiation-sensitive resin composition, method for forming resist pattern, polymer and polymerizable compound | JSR CORPORATION (JP) | 2016-12-06 | — | — | US | disclosed |
| US-9513548-B2 | Radiation-sensitive resin composition, method for forming resist pattern, polymer and polymerizable compound | JSR CORPORATION (JP) | 2016-12-06 | — | — | US | disclosed |
| US-20160179003-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYMER AND POLYMERIZABLE COMPOUND | JSR CORPORATION (JP) | 2016-06-23 | — | — | US | disclosed |
| US-20160179003-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYMER AND POLYMERIZABLE COMPOUND | JSR CORPORATION (JP) | 2016-06-23 | — | — | US | disclosed |
| US-20160179003-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYMER AND POLYMERIZABLE COMPOUND | JSR CORPORATION (JP) | 2016-06-23 | — | — | US | disclosed |
| EP-2781959-A2 | Radiation-sensitive resin composition, method for forming resist pattern, polymer and polymerizable compound | JSR Corporation (JP) | 2014-09-24 | — | — | EP | disclosed |
| US-20140212813-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYMER AND POLYMERIZABLE COMPOUND | JSR CORPORATION (JP) | 2014-07-31 | — | — | US | disclosed |
| US-8728706-B2 | Radiation-sensitive resin composition, method for forming resist pattern, polymer and polymerizable compound | JSR CORPORATION (JP) | 2014-05-20 | — | — | US | disclosed |
| US-8728706-B2 | Radiation-sensitive resin composition, method for forming resist pattern, polymer and polymerizable compound | JSR CORPORATION (JP) | 2014-05-20 | — | — | US | disclosed |
| US-8728706-B2 | Radiation-sensitive resin composition, method for forming resist pattern, polymer and polymerizable compound | JSR CORPORATION (JP) | 2014-05-20 | — | — | US | disclosed |
| US-20120237875-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYMER AND POLYMERIZABLE COMPOUND | JSR CORPORATION (JP) | 2012-09-20 | — | — | US | disclosed |
| US-20120237875-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYMER AND POLYMERIZABLE COMPOUND | JSR CORPORATION (JP) | 2012-09-20 | — | — | US | disclosed |
| US-20120237875-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYMER AND POLYMERIZABLE COMPOUND | JSR CORPORATION (JP) | 2012-09-20 | — | — | US | disclosed |
| EP-2479614-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYMER AND POLYMERIZABLE COMPOUND | JSR Corporation (JP) | 2012-07-25 | — | — | EP | disclosed |
| EP-2479614-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYMER AND POLYMERIZABLE COMPOUND | JSR Corporation (JP) | 2012-07-25 | — | — | EP | disclosed |
| WO-2011034176-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYMER AND POLYMERIZABLE COMPOUND | JSR株式会社 (JP) | 2011-03-24 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20120237875-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYMER AND POLYMERIZABLE COMPOUND | RER1, RDX, PRXL2A | THRB 3768/4885TSHR 1194/4885ALDH1A1 1383/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.