SCHEMBL1057944

SCHEMBL1057944

CCCCOc1ccc2c(OCCCC)ccc(S3(OS(=O)(=O)C(F)(F)F)CCCC3)c2c1

nearest known ligand 0.34

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALOX5 P09917 4/20 0.34
PTGES O14684 3/20 0.34
PPARA Q07869 6/20 0.34
PPARG P37231 4/20 0.34
PPARD Q03181 4/20 0.34
MAOB P27338 1/20 0.33
SLC2A1 P11166 1/20 0.33
TSHR P16473 2/20 0.32
MAPK1 P28482 1/20 0.32
RECQL P46063 1/20 0.32
L3MBTL1 Q9Y468 1/20 0.32
MEN1 O00255 1/20 0.32
KMT2A Q03164 1/20 0.32
PSEN1 P49768 1/20 0.32
CA12 O43570 1/20 0.32
CA1 P00915 1/20 0.32
CA2 P00918 1/20 0.32
CA7 P43166 1/20 0.32
CA9 Q16790 1/20 0.32
PTGDR2 Q9Y5Y4 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL36281 0.89 SLC2A1 (0.41) SLC2A1TSHRL3MBTL1MEN1KMT2A
SCHEMBL703653 0.83 KMT2A (0.44) SLC2A1TSHRL3MBTL1MEN1KMT2A
SCHEMBL36663 0.78 TSHR (0.43) SLC2A1TSHRRECQLMEN1KMT2A
SCHEMBL190940 0.78 SLC2A1 (0.38) SLC2A1TSHRL3MBTL1MEN1KMT2A
SCHEMBL2520945 0.78 HTT (0.36) SLC2A1TSHRMEN1KMT2A
SCHEMBL3150421 0.78 TSHR (0.41) TSHRMAPK1RECQLL3MBTL1MEN1
SCHEMBL449173 0.78 CA12 (0.39) TSHRMAPK1RECQLL3MBTL1MEN1
SCHEMBL448403 0.77 SLC2A1 (0.37) SLC2A1TSHRL3MBTL1MEN1KMT2A
SCHEMBL3883695 0.77 SLC2A1 (0.42) SLC2A1TSHRL3MBTL1MEN1KMT2A
SCHEMBL2521409 0.77 ELANE (0.39) SLC2A1TSHRL3MBTL1PTGDR2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 31 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250199403-A1 COMPOSITION INCLUDING ALKALINE-SOLUBLE POLYMER AND COLORANT MERCK ELECTRONICS KGAA (DE) 2025-06-19 US disclosed
US-11630390-B2 Negative type photosensitive composition curable at low temperature MERCK PATENT GMBH (DE) 2023-04-18 US disclosed
EP-3830153-B1 A COMPOSITION MERCK PATENT GMBH (DE) 2022-08-03 EP disclosed
US-20210208503-A1 NEGATIVE TYPE PHOTOSENSITIVE COMPOSITION CURABLE AT LOW TEMPERATURE RIDGEFIELD ACQUISITION (LU) 2021-07-08 US disclosed
EP-3356888-B1 A PHOTOSENSITIVE COMPOSITION AND COLOR CONVERTING FILM MERCK PATENT GMBH (DE) 2021-03-03 EP disclosed
US-10916661-B2 Thin film transistor substrate provided with protective film and method for producing same MERCK PATENT GMBH (DE) 2021-02-09 US disclosed
EP-3491101-B1 A PHOTOSENSITIVE COMPOSITION, COLOR CONVERTING MEDIUM, OPTICAL DEVICES AND METHOD FOR PRODUCING SAME MERCK PATENT GMBH (DE) 2020-11-25 EP disclosed
US-20190319131-A1 THIN FILM TRANSISTOR SUBSTRATE PROVIDED WITH PROTECTIVE FILM AND METHOD FOR PRODUCING SAME MERCK PATENT GMBH (DE) 2019-10-17 US disclosed
EP-3491101-A1 A PHOTOSENSITIVE COMPOSITION, COLOR CONVERTING MEDIUM, OPTICAL DEVICES AND METHOD FOR PREPARING THE THEREOF Merck Patent GmbH (DE) 2019-06-05 EP disclosed
US-20190153307-A1 A COLOR CONVERSION SHEET AND AN OPTICAL DEVICE MERCK PATENT GMBH (DE) 2019-05-23 US disclosed
US-20150331319-A1 NEGATIVE-WORKING PHOTOSENSITIVE SILOXANE COMPOSITION AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L. 2015-11-19 US disclosed
US-9164386-B2 Negative-working photosensitive siloxane composition AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L. (LU) 2015-10-20 US disclosed
US-20150064613-A1 NEGATIVE-WORKING PHOTOSENSITIVE SILOXANE COMPOSITION AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L. 2015-03-05 US disclosed
US-8883397-B2 Positive photosensitive siloxane composition AZ ELECTRONIC MATERIALS USA CORP. (US) 2014-11-11 US disclosed
US-20130216952-A1 POSITIVE PHOTOSENSITIVE SILOXANE COMPOSITION AZ ELECTRONIC MATERIALS USA CORP. (US) 2013-08-22 US disclosed
US-8486604-B2 Positive-type radiation-sensitive composition, cured film, interlayer insulating film, method of forming interlayer insulating film, display device, and siloxane polymer for forming interlayer insulating film JSR CORPORATION (JP) 2013-07-16 US disclosed
US-20110008730-A1 POSITIVE-TYPE RADIATION-SENSITIVE COMPOSITION, CURED FILM, INTERLAYER INSULATING FILM, METHOD OF FORMING INTERLAYER INSULATING FILM, DISPLAY DEVICE, AND SILOXANE POLYMER FOR FORMING INTERLAYER INSULATING FILM JSR CORPORATION (JP) 2011-01-13 US disclosed
US-7714033-B2 Photosensitive insulating resin composition, cured product thereof and electronic component comprising the same JSR CORPORATION (JP) 2010-05-11 US disclosed
EP-1892574-A1 Photosensitive insulating resin composition, cured product thereof and electronic component having the same JSR Corporation (JP) 2008-02-27 EP disclosed
US-20080045621-A1 PHOTOSENSITIVE INSULATING RESIN COMPOSITION, CURED PRODUCT THEREOF AND ELECTRONIC COMPONENT COMPRISING THE SAME JSR CORPORATION (JP) 2008-02-21 US disclosed