Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA12 | O43570 | 3/20 | 0.39 |
| ▸ | CA1 | P00915 | 3/20 | 0.39 |
| ▸ | CA2 | P00918 | 3/20 | 0.39 |
| ▸ | CA7 | P43166 | 3/20 | 0.39 |
| ▸ | CA9 | Q16790 | 3/20 | 0.39 |
| ▸ | CA6 | P23280 | 2/20 | 0.39 |
| ▸ | CA14 | Q9ULX7 | 2/20 | 0.39 |
| ▸ | CA5B | Q9Y2D0 | 2/20 | 0.39 |
| ▸ | CA3 | P07451 | 1/20 | 0.39 |
| ▸ | CA4 | P22748 | 1/20 | 0.39 |
| ▸ | TSHR | P16473 | 2/20 | 0.35 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.35 |
| ▸ | MEN1 | O00255 | 2/20 | 0.35 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.35 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.35 |
| ▸ | RECQL | P46063 | 1/20 | 0.35 |
| ▸ | CA5A | P35218 | 1/20 | 0.34 |
| ▸ | MTNR1A | P48039 | 1/20 | 0.34 |
| ▸ | CACNA1B | Q00975 | 1/20 | 0.33 |
| ▸ | NPC1 | O15118 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3150421 | 0.89 | TSHR (0.41) | CA12CA1CA2CA7CA9 | |
| SCHEMBL446602 | 0.88 | CA1 (0.38) | CA12CA1CA2CA7CA9 | |
| SCHEMBL445117 | 0.87 | CA1 (0.39) | CA12CA1CA2CA7CA9 | |
| SCHEMBL4996700 | 0.87 | CA1 (0.37) | CA12CA1CA2CA7CA9 | |
| SCHEMBL4996984 | 0.86 | CA12 (0.42) | CA12CA1CA2CA7CA9 | |
| SCHEMBL4994535 | 0.86 | CA1 (0.36) | CA12CA1CA2CA7CA9 | |
| SCHEMBL5002070 | 0.86 | CA1 (0.36) | CA12CA1CA2CA7CA9 | |
| SCHEMBL4993290 | 0.86 | CA1 (0.36) | CA12CA1CA2CA7CA9 | |
| SCHEMBL447417 | 0.81 | TSHR (0.32) | CA12CA1CA2CA7CA9 | |
| SCHEMBL3876852 | 0.79 | THRA (0.32) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 204 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12631962-B2 | Resist composition and method for forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2026-05-19 | — | — | US | disclosed |
| US-12624392-B2 | Molecular array generation using photoresist | 10X GENOMICS, INC. (US) | 2026-05-12 | — | — | US | disclosed |
| US-12393115-B2 | Positive working photosensitive material | MERCK PATENT GMBH (DE) | 2025-08-19 | — | — | US | disclosed |
| EP-4516394-A2 | HIGH DEFINITION MOLECULAR ARRAY FEATURE GENERATION USING PHOTORESIST | 10x Genomics, Inc. (US) | 2025-03-05 | — | — | EP | disclosed |
| EP-4481059-A2 | MOLECULAR ARRAY GENERATION USING PHOTORESIST | 10x Genomics, Inc. (US) | 2024-12-25 | — | — | EP | disclosed |
| EP-4405094-B1 | HIGH DEFINITION MOLECULAR ARRAY FEATURE GENERATION USING PHOTORESIST | 10X GENOMICS INC (US) | 2024-12-18 | — | — | EP | disclosed |
| EP-4271511-B1 | MOLECULAR ARRAY GENERATION USING PHOTORESIST | 10X GENOMICS INC (US) | 2024-10-09 | — | — | EP | disclosed |
| WO-2024176973-A1 | METHOD FOR PRODUCING PURIFIED RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND PURIFIED RESIST COMPOSITION | 東京応化工業株式会社 | 2024-08-29 | — | — | WO | disclosed |
| US-20240231231-A1 | METHOD FOR FORMING RESIST UNDERLAYER FILM, METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE, COMPOSITION, AND RESIST UNDERLAYER FILM | JSR CORPORATION (JP) | 2024-07-11 | — | — | US | disclosed |
| US-20240167077-A1 | COVALENT ATTACHMENT OF SPLINT OLIGONUCLEOTIDES FOR MOLECULAR ARRAY GENERATION USING LIGATION | 10X GENOMICS, INC. (US) | 2024-05-23 | — | — | US | disclosed |
| EP-2444845-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2012-04-25 | — | — | EP | disclosed |
| US-20120082936-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2012-04-05 | — | — | US | disclosed |
| US-20120065291-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER, AND COMPOUND | JSR CORPORATION (JP) | 2012-03-15 | — | — | US | disclosed |
| US-20110076619-A1 | METHOD FOR MODIFYING FIRST FILM AND COMPOSITION FOR FORMING ACID TRANSFER RESIN FILM USED THEREFOR | JSR CORPORATION (JP) | 2011-03-31 | — | — | US | disclosed |
| US-20110027718-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND COMPOUND | JSR CORPORATION (JP) | 2011-02-03 | — | — | US | disclosed |
| US-20100190109-A1 | ACID TRANSFER COMPOSITION, ACID TRANSFER FILM, AND PATTERN FORMING METHOD | JSR CORPORATION (JP) | 2010-07-29 | — | — | US | disclosed |
| US-20090053649-A1 | Lactone copolymer and radiation-sensitive resin composition | JSR CORPORATION | 2009-02-26 | — | — | US | disclosed |
| EP-1757628-A1 | LACTONE COPOLYMER AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2007-02-28 | — | — | EP | disclosed |
| EP-1757980-A1 | Radiation sensitive resin composition | JSR Corporation (JP) | 2007-02-28 | — | — | EP | disclosed |
| US-20070042292-A1 | Radiation sensitive resin composition | JSR CORPORATION (JP) | 2007-02-22 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12631962-B2 | Resist composition and method for forming resist pattern | TERB1, TERF2, LSM8 | CA12 783/4885CA1 577/4885CA2 677/4885 |
| US-12624392-B2 | Molecular array generation using photoresist | POLL, LIG4, LIG3 | CA12 2581/4885CA1 3957/4885CA2 2965/4885 |
| US-20110027718-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND COMPOUND | SMARCC1, RXRA, RXRB | CA12 564/4885CA1 112/4885CA2 939/4885 |
| US-20120065291-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER, AND COMPOUND | RAD51, RER1, XRCC5 | CA12 3655/4885CA1 2343/4885CA2 3646/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.