Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SLC2A1 | P11166 | 2/20 | 0.42 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.39 |
| ▸ | MEN1 | O00255 | 2/20 | 0.39 |
| ▸ | GAA | P10253 | 1/20 | 0.39 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.39 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.39 |
| ▸ | CNR1 | P21554 | 3/20 | 0.39 |
| ▸ | CNR2 | P34972 | 3/20 | 0.39 |
| ▸ | WDR5 | P61964 | 1/20 | 0.38 |
| ▸ | TSHR | P16473 | 3/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.38 |
| ▸ | FABP4 | P15090 | 6/20 | 0.37 |
| ▸ | FABP5 | Q01469 | 6/20 | 0.37 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.36 |
| ▸ | ABCB1 | P08183 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7047138 | 0.89 | PTGS2 (0.39) | SLC2A1KMT2AMEN1GAATDP1 | |
| SCHEMBL36281 | 0.88 | SLC2A1 (0.41) | SLC2A1KMT2AMEN1GAATDP1 | |
| SCHEMBL3873415 | 0.86 | SLC2A1 (0.40) | SLC2A1KMT2AMEN1GAATDP1 | |
| SCHEMBL703653 | 0.82 | KMT2A (0.44) | SLC2A1KMT2AMEN1GAATDP1 | |
| SCHEMBL3872557 | 0.82 | FABP4 (0.42) | SLC2A1KMT2AMEN1GAATDP1 | |
| SCHEMBL190940 | 0.81 | SLC2A1 (0.38) | SLC2A1KMT2AMEN1GAATDP1 | |
| SCHEMBL448403 | 0.81 | SLC2A1 (0.37) | SLC2A1KMT2AMEN1GAATDP1 | |
| SCHEMBL36663 | 0.77 | TSHR (0.43) | SLC2A1KMT2AMEN1GAATDP1 | |
| SCHEMBL2520945 | 0.77 | HTT (0.36) | SLC2A1KMT2AMEN1TSHRALDH1A1 | |
| SCHEMBL1057944 | 0.77 | ALOX5 (0.34) | SLC2A1KMT2AMEN1L3MBTL1TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7638261-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2009-12-29 | — | — | US | disclosed |
| US-20090148790-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2009-06-11 | — | — | US | disclosed |
| US-7521169-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2009-04-21 | — | — | US | disclosed |
| US-20060234153-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2006-10-19 | — | — | US | disclosed |
| EP-1557718-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2005-07-27 | — | — | EP | disclosed |
| US-20030219680-A1 | Photoresists useful for microfabrication utilizing deep ultraviolet rays such as an excimer laser, x-rays such as synchrotron radiation, and electron beams | JSR CORPORATION (JP) | 2003-11-27 | — | — | US | disclosed |