Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP2C9 | P11712 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL105280 | 0.79 | CYP2C9 (0.33) | CYP2C9 | |
| SCHEMBL27337496 | 0.77 | CYP2C9 (0.32) | CYP2C9 | |
| SCHEMBL109644 | 0.73 | — | — | |
| SCHEMBL105578 | 0.73 | HSD11B1 (0.30) | — | |
| SCHEMBL4939949 | 0.72 | CYP2C9 (0.33) | CYP2C9 | |
| SCHEMBL3614316 | 0.70 | L3MBTL1 (0.32) | — | |
| SCHEMBL7710163 | 0.67 | — | — | |
| SCHEMBL103782 | 0.64 | HSD11B1 (0.31) | — | |
| SCHEMBL1130112 | 0.64 | SLC6A3 (0.33) | — | |
| SCHEMBL8169382 | 0.63 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 193 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2628745-B1 | Silicon-containing surface modifier, resist lower layer film-forming composition containing the same, and patterning process | SHINETSU CHEMICAL CO (JP) | 2015-03-25 | — | — | EP | claimed |
| US-20260118767-A1 | REVERSE PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-04-30 | — | — | US | disclosed |
| EP-4700067-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING FILM, METHOD FOR FORMING FILM, AND SUPERSTRATE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-02-25 | — | — | EP | disclosed |
| US-20260044081-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST FILM AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-02-12 | — | — | US | disclosed |
| EP-4692941-A2 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST FILM AND PATTERNING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2026-02-11 | — | — | EP | disclosed |
| US-20260029706-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING FILM, METHOD FOR FORMING FILM, AND SUPER STRAIGHT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-01-29 | — | — | US | disclosed |
| EP-4660703-A2 | METAL-CONTAINING FILM PATTERNING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2025-12-10 | — | — | EP | disclosed |
| US-20250372377-A1 | METAL-CONTAINING FILM PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-12-04 | — | — | US | disclosed |
| EP-4621486-A2 | POLYVALENT AMMONIUM SALT COMPOUND, COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-09-24 | — | — | EP | disclosed |
| US-20250289931-A1 | POLYVALENT AMMONIUM SALT COMPOUND, COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-09-18 | — | — | US | disclosed |
| US-5595827-A | BLEND WITH POLYTERPENE AND/OR PETROLEUM RESIN, MULTILAYER FILM FOR PACKAGING, WATER VAPOR BARRIER | MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) | 1997-01-21 | — | — | US | disclosed |
| EP-0634455-B1 | Polypropylene resin composition and the use of the same | MITSUI PETROCHEMICAL IND (JP) | 1997-01-08 | — | — | EP | disclosed |
| US-5579913-A | PACKAGING; WATERPROOFING, TRANSPARENT, HIGH MODULUS | MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) | 1996-12-03 | — | — | US | disclosed |
| EP-0743326-A1 | Solid titanium catalyst component, process for preparing same, olefin polymerization catalyst containing same, and olefin polymerization process | MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) | 1996-11-20 | — | — | EP | disclosed |
| US-5412020-A | Impact strength | MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) | 1995-05-02 | — | — | US | disclosed |
| EP-0641807-A2 | Olefin polymerization catalyst and process for preparing polypropylene and a propylene block copolymer | MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) | 1995-03-08 | — | — | EP | disclosed |
| EP-0636650-A1 | Propylene polymer compositions | MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) | 1995-02-01 | — | — | EP | disclosed |
| EP-0634455-A1 | Polypropylene resin composition and the use of the same | MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) | 1995-01-18 | — | — | EP | disclosed |
| EP-0605180-A1 | Polypropylene composition | MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) | 1994-07-06 | — | — | EP | disclosed |
| EP-0585869-A1 | Solid titanium catalyst component for olefin polymerization, process for preparing the same, catalyst for olefin polymerization and process for olefin polymerization | MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) | 1994-03-09 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20250289931-A1 | POLYVALENT AMMONIUM SALT COMPOUND, COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM, AND PATTERNING PROCESS | ASH2L, PUF60, IDUA | CYP2C9 4419/4885 |
| US-20260029706-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING FILM, METHOD FOR FORMING FILM, AND SUPER STRAIGHT | SMC2, F12, SMC1A | CYP2C9 1540/4885 |
| US-20260118767-A1 | REVERSE PATTERNING PROCESS | EFNA1, EPHA4, ETV6 | CYP2C9 4158/4885 |
| US-20260044081-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST FILM AND PATTERNING PROCESS | SMC1A, SPOUT1, LBR | CYP2C9 2871/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.