SCHEMBL106499

SCHEMBL106499

CC(O[SiH2]OC(C)c1ccccc1)c1ccccc1

nearest known ligand 0.50

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
ADRA2A P08913 2/20 0.43
ADRA2C P18825 2/20 0.43
LMNA P02545 1/20 0.43
HIF1A Q16665 1/20 0.43
KDM4E B2RXH2 1/20 0.43
DPP4 P27487 2/20 0.42
F2 P00734 1/20 0.42
ALDH1A1 P00352 1/20 0.41
HCAR2 Q8TDS4 1/20 0.41
TAAR1 Q96RJ0 3/20 0.39
ADRA2B P18089 1/20 0.39
CYP2D6 P10635 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8809690 0.87 HCAR2 (0.37) ADRA2AADRA2CLMNAHIF1AKDM4E
SCHEMBL7794349 0.83 TAAR1 (0.37) ADRA2AADRA2CLMNAHCAR2TAAR1
SCHEMBL4195243 0.81 HCAR2 (0.39) ADRA2AADRA2CLMNAHIF1AKDM4E
SCHEMBL13685162 0.81 HCAR2 (0.43) ADRA2AADRA2CLMNAHIF1AKDM4E
SCHEMBL16309500 0.81 HCAR2 (0.39) ADRA2AADRA2CLMNAHIF1AKDM4E
SCHEMBL8440986 0.80 ADRA2A (0.35) ADRA2AADRA2CHCAR2TAAR1ADRA2B
SCHEMBL19809465 0.80 GPR88 (0.35) ADRA2ALMNAHCAR2TAAR1ADRA2B
SCHEMBL8502515 0.78 HCAR2 (0.35) ADRA2AADRA2CLMNAHIF1AKDM4E
SCHEMBL18800689 0.77 HCAR2 (0.47) ADRA2AADRA2CLMNAHIF1AKDM4E
SCHEMBL297137 0.77 HCAR2 (0.47) ADRA2AADRA2CLMNAHIF1AKDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 324 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4634324-A1 AMPHIPHILIC ABRASIVE PARTICLES AND THEIR USE FOR CHEMICAL MECHANICAL PLANARIZATION Versum Materials US, LLC (US) 2025-10-22 EP claimed
CN-119431794-A Organosilicon tackifier and preparation method and application thereof 杭州之江有机硅化工有限公司 2025-02-14 CN claimed
CN-117866204-B Silicon-containing surface modifier and etching-resistant agent underlayer film composition, and preparation method and application thereof 福建泓光半导体材料有限公司 2024-12-13 CN claimed
CN-119100394-A Method for preparing high-purity nano silicon carbide powder by combining microwave heating technology with self-suspension carbothermal reduction technology 绍兴晶彩科技有限公司 2024-12-10 CN claimed
WO-2024129435-A1 AMPHIPHILIC ABRASIVE PARTICLES AND THEIR USE FOR CHEMICAL MECHANICAL PLANARIZATION VERSUM MATERIALS US, LLC (US) 2024-06-20 WO claimed
CN-117866204-A Silicon-containing surface modifier and etching-resistant agent underlayer film composition, and preparation method and application thereof 福建泓光半导体材料有限公司 2024-04-12 CN claimed
CN-117866205-A Silicon-containing surface modifier and resist underlayer film composition, and preparation method and application thereof 福建泓光半导体材料有限公司 2024-04-12 CN claimed
CN-117327281-A Core-shell type organic silicon resin and ink prepared from same for packaging flexible OLED display thin film 江苏广信感光新材料股份有限公司 2024-01-02 CN claimed
CN-115181223-B Low-gloss matte auxiliary agent, preparation method thereof and molded body 铨盛聚碳科技股份有限公司 2023-08-29 CN claimed
CN-116120777-A Preparation method of modified silica sol for water-based ink 山东科翰硅源新材料有限公司 2023-05-16 CN claimed
CN-114456385-A Preparation method of MDT (methyl phenyl silicone oil) for cosmetics 湖南科技学院 2022-05-10 CN claimed
CN-109320720-B Anhydrous synthesis preparation method of MQ type organic silicon resin 深圳市广业电子科技有限公司 2021-05-04 CN claimed
EP-2628744-B1 Silicon-containing surface modifier, resist underlayer film composition containing this, and patterning process SHINETSU CHEMICAL CO (JP) 2016-11-30 EP claimed
EP-2628745-B1 Silicon-containing surface modifier, resist lower layer film-forming composition containing the same, and patterning process SHINETSU CHEMICAL CO (JP) 2015-03-25 EP claimed
EP-0457175-B1 Method of purification of alkoxysilanes TOSHIBA SILICONE (JP) 1997-02-12 EP claimed
EP-0278157-B1 A RUBBER COMPOSITION Shin-Etsu Chemical Co., Ltd. (JP) 1993-06-16 EP claimed
US-5104999-A METHOD OF PURIFICATION OF ALKOXYSILANES TOSHIBA SILICONE CO., LTD. (JP) 1992-04-14 US claimed
EP-0457175-A2 Method of purification of alkoxysilanes TOSHIBA SILICONE CO., LTD. (JP) 1991-11-21 EP claimed
US-20260118767-A1 REVERSE PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2026-04-30 US disclosed
WO-1981003496-A1 OPTICALLY CLEAR SILICONE COMPOSITIONS CURABLE TO ELASTOMERS DOW CORNING (US) 1981-12-10 WO disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20260118767-A1 REVERSE PATTERNING PROCESS EFNA1, EPHA4, ETV6 ADRA2A 2541/4885ADRA2C 2932/4885LMNA 755/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.