SCHEMBL106513

SCHEMBL106513

CCC(O[SiH2]OC(CC)c1ccccc1)c1ccccc1

nearest known ligand 0.45

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.45
SLC6A4 P31645 1/20 0.38
MIF P14174 1/20 0.37
DPP4 P27487 2/20 0.37
F2 P00734 1/20 0.37
SLC7A5 Q01650 1/20 0.36
IGLV6-57 P01721 1/20 0.36
HKDC1 Q2TB90 1/20 0.36
TRPA1 O75762 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL704365 0.83 AOC3 (0.41) LMNASLC6A4
SCHEMBL10704774 0.83 LMNA (0.42) LMNASLC6A4MIFSLC7A5IGLV6-57
SCHEMBL706191 0.80 POLB (0.41) LMNASLC6A4SLC7A5
SCHEMBL2792023 0.79 LMNA (0.50) LMNASLC6A4MIFSLC7A5IGLV6-57
SCHEMBL36373 0.79 LMNA (0.50) LMNASLC6A4MIFSLC7A5HKDC1
SCHEMBL11915432 0.77 LMNA (0.48) LMNASLC6A4MIFSLC7A5IGLV6-57
SCHEMBL8269660 0.77 LMNA (0.48) LMNASLC6A4MIFSLC7A5IGLV6-57
SCHEMBL1068693 0.77 LMNA (0.48) LMNASLC6A4MIFSLC7A5IGLV6-57
SCHEMBL3481761 0.76 TACR1 (0.40) LMNASLC6A4IGLV6-57HKDC1
SCHEMBL3481539 0.76 TP53 (0.42) LMNASLC6A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 252 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119431794-A Organosilicon tackifier and preparation method and application thereof 杭州之江有机硅化工有限公司 2025-02-14 CN claimed
CN-119100394-A Method for preparing high-purity nano silicon carbide powder by combining microwave heating technology with self-suspension carbothermal reduction technology 绍兴晶彩科技有限公司 2024-12-10 CN claimed
CN-117327281-A Core-shell type organic silicon resin and ink prepared from same for packaging flexible OLED display thin film 江苏广信感光新材料股份有限公司 2024-01-02 CN claimed
CN-115181223-B Low-gloss matte auxiliary agent, preparation method thereof and molded body 铨盛聚碳科技股份有限公司 2023-08-29 CN claimed
CN-115181223-A Low-gloss matte auxiliary agent, preparation method thereof and formed body 铨盛聚碳科技股份有限公司 2022-10-14 CN claimed
CN-114456385-A Preparation method of MDT (methyl phenyl silicone oil) for cosmetics 湖南科技学院 2022-05-10 CN claimed
EP-2628744-B1 Silicon-containing surface modifier, resist underlayer film composition containing this, and patterning process SHINETSU CHEMICAL CO (JP) 2016-11-30 EP claimed
EP-2628745-B1 Silicon-containing surface modifier, resist lower layer film-forming composition containing the same, and patterning process SHINETSU CHEMICAL CO (JP) 2015-03-25 EP claimed
US-20120071700-A1 CATALYSTS FOR HYDROGENATION OF UNSATURATED HYDROCARBONS AND PREPARATIONS AND USES THEREOF CHINA PETROLEUM & CHEMICAL CORPORATION (CN) 2012-03-22 US claimed
EP-0278157-B1 A RUBBER COMPOSITION Shin-Etsu Chemical Co., Ltd. (JP) 1993-06-16 EP claimed
US-20260118767-A1 REVERSE PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2026-04-30 US disclosed
US-20260103392-A1 CRYSTALLINE TITANIUM OXIDE CORE-SHELL PARTICLES AND DISPERSION CONTAINING SAME JGC CATALYSTS AND CHEMICALS LTD. (JP) 2026-04-16 US disclosed
EP-4696404-A1 SEPARATION MEMBRANE AND METHOD FOR PRODUCING SAME Hiroshima University (JP) 2026-02-18 EP disclosed
US-20260044081-A1 COMPOSITION FOR FORMING SILICON-CONTAINING RESIST FILM AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2026-02-12 US disclosed
EP-4692941-A2 COMPOSITION FOR FORMING SILICON-CONTAINING RESIST FILM AND PATTERNING PROCESS Shin-Etsu Chemical Co., Ltd. (JP) 2026-02-11 EP disclosed
US-6949324-B2 Alkali-soluble siloxane polymer, positive type resist composition, resist pattern, process for forming the same, electronic device and process for manufacturing the same FUJITSU LIMITED (JP) 2005-09-27 US disclosed
US-6743885-B2 MIXTURE OF POLYSILSESQUIOXANE AND ACID GENERATOR SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2004-06-01 US disclosed
US-20030211407-A1 Alkali-soluble siloxane polymer, positive type resist composition, resist pattern, process for forming the same, electronic device and process for manufacturing the same FUJITSU LIMITED (JP) 2003-11-13 US disclosed
US-20030092854-A1 Resin composition for intermediate layer of three-layer resist SUMITOMO CHEMICAL COMPANY, LIMITED 2003-05-15 US disclosed
EP-0193643-A2 Curable resin composition KABUSHIKI KAISHA TOSHIBA (JP) 1986-09-10 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20260103392-A1 CRYSTALLINE TITANIUM OXIDE CORE-SHELL PARTICLES AND DISPERSION CONTAINING SAME STRA6, RAB5IF, CCT4 LMNA 1723/4885SLC6A4 2045/4885MIF 2593/4885
US-20260118767-A1 REVERSE PATTERNING PROCESS EFNA1, EPHA4, ETV6 LMNA 755/4885SLC6A4 2308/4885MIF 2937/4885
US-20120071700-A1 CATALYSTS FOR HYDROGENATION OF UNSATURATED HYDROCARBONS AND PREPARATIONS AND USES THEREOF HRH3, HRH2, HRH1 LMNA 3059/4885SLC6A4 4118/4885MIF 589/4885
US-20260044081-A1 COMPOSITION FOR FORMING SILICON-CONTAINING RESIST FILM AND PATTERNING PROCESS SMC1A, SPOUT1, LBR LMNA 2488/4885SLC6A4 1806/4885MIF 2038/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.