Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TLR8 | Q9NR97 | 1/20 | 0.54 |
| ▸ | CNR2 | P34972 | 1/20 | 0.49 |
| ▸ | USP2 | O75604 | 1/20 | 0.47 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.47 |
| ▸ | CHRM2 | P08172 | 2/20 | 0.45 |
| ▸ | CHRM1 | P11229 | 2/20 | 0.45 |
| ▸ | CHRM4 | P08173 | 1/20 | 0.45 |
| ▸ | CHRM3 | P20309 | 1/20 | 0.45 |
| ▸ | ACKR3 | P25106 | 3/20 | 0.44 |
| ▸ | EPHX2 | P34913 | 3/20 | 0.44 |
| ▸ | HRH2 | P25021 | 6/20 | 0.43 |
| ▸ | HRH1 | P35367 | 6/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8526096 | 1.00 | TLR8 (0.54) | TLR8CNR2USP2SMN1; SMN2CHRM2 | |
| SCHEMBL29129466 | 0.98 | TLR8 (0.53) | TLR8CNR2USP2SMN1; SMN2CHRM2 | |
| SCHEMBL4543892 | 0.95 | TLR8 (0.55) | TLR8CNR2USP2SMN1; SMN2CHRM2 | |
| SCHEMBL8253901 | 0.92 | USP2 (0.51) | TLR8USP2SMN1; SMN2CHRM2CHRM1 | |
| Pyrazine SCHEMBL28467340 | 0.92 | TLR8 (0.51) | TLR8CNR2CHRM2CHRM1CHRM4 | |
| SCHEMBL20873847 | 0.90 | USP2 (0.53) | TLR8USP2SMN1; SMN2CHRM2CHRM1 | |
| SCHEMBL2616174 | 0.88 | USP2 (0.51) | TLR8USP2SMN1; SMN2CHRM2CHRM1 | |
| SCHEMBL27097882 | 0.88 | TLR8 (0.50) | TLR8EPHX2HRH2HRH1 | |
| SCHEMBL12193455 | 0.87 | USP2 (0.47) | TLR8USP2SMN1; SMN2CHRM2CHRM1 | |
| SCHEMBL8242595 | 0.86 | USP2 (0.61) | TLR8USP2SMN1; SMN2CHRM2CHRM1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 56 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11656548-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, mask blank with resist film, method for producing photomask, and method for manufacturing electronic device | FUJIFILM CORPORATION (JP) | 2023-05-23 | — | — | US | disclosed |
| US-20170184973-A1 | ORGANIC TREATMENT LIQUID FOR PATTERNING RESIST FILM, METHOD OF PRODUCING ORGANIC TREATMENT LIQUID FOR PATTERNING RESIST FILM, STORAGE CONTAINER OF ORGANIC TREATMENT LIQUID FOR PATTERNING RESIST FILM, PATTERN FORMING METHOD USING THE SAME, AND METHOD OF PRODUCING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2017-06-29 | — | — | US | disclosed |
| US-20170115571-A1 | PATTERN FORMING METHOD AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE USING SAME | FUJIFILM CORPORATION (JP) | 2017-04-27 | — | — | US | disclosed |
| US-9551931-B2 | Method of forming pattern, actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film, process for manufacturing electronic device and electronic device | FUJIFILM CORPORATION (JP) | 2017-01-24 | — | — | US | disclosed |
| US-9482947-B2 | Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device and electronic device | FUJIFILM CORPORATION (JP) | 2016-11-01 | — | — | US | disclosed |
| US-9429840-B2 | Pattern forming method, composition used therein, method for manufacturing electronic device, and electronic device | FUJIFILM CORPORATION (JP) | 2016-08-30 | — | — | US | disclosed |
| US-9423689-B2 | Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device and electronic device | FUJIFILM CORPORATION (JP) | 2016-08-23 | — | — | US | disclosed |
| US-9417528-B2 | Pattern forming method, multi-layered resist pattern, multi-layered film for organic solvent development, resist composition, method for manufacturing electronic device, and electronic device | FUJIFILM CORPORATION (JP) | 2016-08-16 | — | — | US | disclosed |
| US-9383645-B2 | Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, manufacturing method of electronic device, and electronic device | FUJIFILM CORPORATION (JP) | 2016-07-05 | — | — | US | disclosed |
| US-9250532-B2 | Pattern forming method, multi-layered resist pattern, multi-layered film for organic solvent development, resist composition, method for manufacturing electronic device, and electronic device | FUJIFILM CORPORATION (JP) | 2016-02-02 | — | — | US | disclosed |
| US-20130004740-A1 | ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM AND PATTERN FORMING METHOD EACH USING THE COMPOSITION, METHOD FOR PREPARING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2013-01-03 | — | — | US | disclosed |
| US-20120219758-A1 | RESIST COMPOSITION, RESIST FILM THEREFROM AND METHOD OF FORMING NEGATIVE PATTERN USING THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2012-08-30 | — | — | US | disclosed |
| US-20120135348-A1 | ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, AND PATTERN FORMING METHOD | FUJIFILM CORPORATION (JP) | 2012-05-31 | — | — | US | disclosed |
| US-20120058427-A1 | PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION AND RESIST FILM | FUJIFILM CORPORATION (JP) | 2012-03-08 | — | — | US | disclosed |
| US-7632833-B2 | Anticancer agents | MERCK & CO., INC. (US) | 2009-12-15 | — | — | US | disclosed |
| US-20080287414-A1 | Mitotic Kinesin Inhibitors | MERCK & CO., INC. (US) | 2008-11-20 | — | — | US | disclosed |
| CN-101255170-A | 2,3-dihydroimidazo[2,1-b]oxazole compound | OTSUKA PHARMA CO LTD (JP) | 2008-09-03 | — | — | CN | disclosed |
| CN-101172981-A | 2,3-dihydroimidazo[2,1-b]oxazole compound | OTSUKA PHARMA CO LTD (JP) | 2008-05-07 | — | — | CN | disclosed |
| CN-100366624-C | 2, 3-dihydro-6-nitroimidazo [2,1-b ] * azole compounds | OTSUKA PHARMA CO LTD (JP) | 2008-02-06 | — | — | CN | disclosed |
| CN-1705670-A | 2, 3-dihydro-6-nitroimidazo [2, 1-b ] oxazole compounds | OTSUKA PHARMA CO LTD (JP) | 2005-12-07 | — | — | CN | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20170184973-A1 | ORGANIC TREATMENT LIQUID FOR PATTERNING RESIST FILM, METHOD OF PRODUCING ORGANIC TREATMENT LIQUID FOR PATTERNING RESIST FILM, STORAGE CONTAINER OF ORGANIC TREATMENT LIQUID FOR PATTERNING RESIST FILM, PATTERN FORMING METHOD USING THE SAME, AND METHOD OF PRODUCING ELECTRONIC DEVICE | MYB, NCL, SMYD2 | TLR8 4364/4885CNR2 4167/4885USP2 1148/4885 |
| US-20080287414-A1 | Mitotic Kinesin Inhibitors | KIF5B, KIF2C, KIF18B | TLR8 4871/4885CNR2 4666/4885USP2 2472/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.