Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SLC22A1 | O15245 | 3/20 | 0.52 |
| ▸ | SLC22A2 | O15244 | 1/20 | 0.46 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.42 |
| ▸ | TP53 | P04637 | 1/20 | 0.42 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.42 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.42 |
| ▸ | TSHR | P16473 | 1/20 | 0.42 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.42 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.42 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.42 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.42 |
| ▸ | CES2 | O00748 | 4/20 | 0.41 |
| ▸ | CES1 | P23141 | 4/20 | 0.41 |
| ▸ | DNM1 | Q05193 | 4/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Tetrabuthylammonium SCHEMBL10529094 | 0.88 | SLC22A1 (0.48) | SLC22A1SLC22A2ALDH1A1TP53CYP3A4 | |
| Tetrapropylammonium SCHEMBL107933 | 0.86 | SLC22A1 (0.48) | SLC22A1SLC22A2CES2CES1 | |
| Tetrabuthylammonium SCHEMBL2350563 | 0.84 | SLC22A1 (0.55) | SLC22A1SLC22A2ALDH1A1TP53CYP3A4 | |
| Tetrabuthylammonium SCHEMBL106861 | 0.84 | SLC22A1 (0.67) | SLC22A1SLC22A2ALDH1A1TP53CYP3A4 | |
| Tetrabuthylammonium SCHEMBL107845 | 0.83 | SLC22A1 (0.52) | SLC22A1SLC22A2HSD17B10CES2CES1 | |
| Tetrabuthylammonium SCHEMBL105664 | 0.83 | SLC22A1 (0.52) | SLC22A1SLC22A2ALDH1A1TP53CYP3A4 | |
| Tetrabuthylammonium SCHEMBL5988879 | 0.83 | SLC22A1 (0.52) | SLC22A1SLC22A2ALDH1A1TP53CYP3A4 | |
| Tetrabuthylammonium SCHEMBL193669 | 0.81 | SLC22A1 (0.63) | SLC22A1SLC22A2ALDH1A1TP53CYP3A4 | |
| Tetrabuthylammonium SCHEMBL9119754 | 0.81 | SLC22A1 (0.63) | SLC22A1SLC22A2ALDH1A1TP53CYP3A4 | |
| Tetrabuthylammonium SCHEMBL109269 | 0.81 | SLC22A1 (0.63) | SLC22A1SLC22A2ALDH1A1TP53CYP3A4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 131 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10724143-B1 | Electrochemical deblocking solution for electrochemical oligomer synthesis on an electrode array | CUSTOMARRAY, INC. (US) | 2020-07-28 | — | — | US | claimed |
| US-20090012303-A1 | CLEAN, HIGH-YIELD PREPARATION OF S,S AND R,S AMINO ACID ISOSTERES | AEROJET FINE CHEMICALS LLC (US) | 2009-01-08 | — | — | US | claimed |
| US-6867311-B2 | Clean, high-yield preparation of S,S and R,S amino acid isosteres | AEROJET FINE CHEMICALS LLC (US) | 2005-03-15 | — | — | US | claimed |
| US-20030225292-A1 | Clean, high-yield preparation of S,S and R,S amino acid isosteres | AEROJET FINE CHEMICALS LLC, A DELAWARE LIMITED LIABILITY COMPANY | 2003-12-04 | — | — | US | claimed |
| US-20260118767-A1 | REVERSE PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-04-30 | — | — | US | disclosed |
| EP-4700067-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING FILM, METHOD FOR FORMING FILM, AND SUPERSTRATE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-02-25 | — | — | EP | disclosed |
| US-20260044081-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST FILM AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-02-12 | — | — | US | disclosed |
| EP-4692941-A2 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST FILM AND PATTERNING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2026-02-11 | — | — | EP | disclosed |
| US-20260029706-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING FILM, METHOD FOR FORMING FILM, AND SUPER STRAIGHT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-01-29 | — | — | US | disclosed |
| EP-4621486-A2 | POLYVALENT AMMONIUM SALT COMPOUND, COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-09-24 | — | — | EP | disclosed |
| US-20250289931-A1 | POLYVALENT AMMONIUM SALT COMPOUND, COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-09-18 | — | — | US | disclosed |
| EP-4592299-A1 | SILICON-CONTAINING SULFONIUM SALT COMPOUND, COMPOSITION FOR FORMING A SILICON-CONTAINING RESIST UNDERLAYER FILM, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-07-30 | — | — | EP | disclosed |
| US-7128976-B2 | Composition for film formation, method of film formation, and silica-based film | JSR CORPORATION (JP) | 2006-10-31 | — | — | US | disclosed |
| WO-2006105037-A2 | ELECTROCHEMICAL DEBLOCKING SOLUTION FOR ELECTROCHEMICAL OLIGOMER SYNTHESIS ON AN ELECTRODE ARRAY | COMBIMATRIX CORPORATION (US) | 2006-10-05 | — | — | WO | disclosed |
| US-20050171170-A1 | Clean, high-yield preparation of S,S and R,S amino acid isosteres | AEROJET FINE CHEMICALS LLC, A DELAWARE LIMITED LIABILITY COMPANY (US) | 2005-08-04 | — | — | US | disclosed |
| US-6867311-B2 | Clean, high-yield preparation of S,S and R,S amino acid isosteres | AEROJET FINE CHEMICALS LLC (US) | 2005-03-15 | — | — | US | disclosed |
| US-20030225292-A1 | Clean, high-yield preparation of S,S and R,S amino acid isosteres | AEROJET FINE CHEMICALS LLC, A DELAWARE LIMITED LIABILITY COMPANY | 2003-12-04 | — | — | US | disclosed |
| US-6605732-B1 | Clean, high-yield preparation of S,S and R,S amino acid isosteres | AEROJET FINE CHEMICALS LLC | 2003-08-12 | — | — | US | disclosed |
| US-20030091838-A1 | Composition for film formation, method of film formation, and silica-based film | JSR CORPORATION (JP) | 2003-05-15 | — | — | US | disclosed |
| EP-1050532-A2 | Preparation of S,S and R,S amino acid isosteres | Aerojet Fine Chemicals LLC (US) | 2000-11-08 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (8 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20090012303-A1 | CLEAN, HIGH-YIELD PREPARATION OF S,S AND R,S AMINO ACID ISOSTERES | SRMS, HCK, BHMT2 | SLC22A1 4872/4885SLC22A2 4835/4885ALDH1A1 3396/4885 |
| US-20050171170-A1 | Clean, high-yield preparation of S,S and R,S amino acid isosteres | SRMS, HCK, BHMT2 | SLC22A1 4815/4885SLC22A2 4702/4885ALDH1A1 2833/4885 |
| US-20250289931-A1 | POLYVALENT AMMONIUM SALT COMPOUND, COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM, AND PATTERNING PROCESS | ASH2L, PUF60, IDUA | SLC22A1 1953/4885SLC22A2 2428/4885ALDH1A1 4472/4885 |
| US-20260029706-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING FILM, METHOD FOR FORMING FILM, AND SUPER STRAIGHT | SMC2, F12, SMC1A | SLC22A1 2667/4885SLC22A2 3137/4885ALDH1A1 1644/4885 |
| US-20260118767-A1 | REVERSE PATTERNING PROCESS | EFNA1, EPHA4, ETV6 | SLC22A1 4619/4885SLC22A2 4601/4885ALDH1A1 4452/4885 |
| US-20260044081-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST FILM AND PATTERNING PROCESS | SMC1A, SPOUT1, LBR | SLC22A1 2467/4885SLC22A2 2619/4885ALDH1A1 1558/4885 |
| US-10724143-B1 | Electrochemical deblocking solution for electrochemical oligomer synthesis on an electrode array | DNMT1, DNASE1, DNPEP | SLC22A1 2371/4885SLC22A2 2229/4885ALDH1A1 2887/4885 |
| US-20030225292-A1 | Clean, high-yield preparation of S,S and R,S amino acid isosteres | SRMS, HCK, BHMT2 | SLC22A1 4815/4885SLC22A2 4702/4885ALDH1A1 2833/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.