Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 1/20 | 0.42 |
| ▸ | LMNA | P02545 | 2/20 | 0.41 |
| ▸ | TYR | P14679 | 1/20 | 0.41 |
| ▸ | KIF11 | P52732 | 2/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.35 |
| ▸ | GAA | P10253 | 2/20 | 0.35 |
| ▸ | HTT | P42858 | 2/20 | 0.35 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.35 |
| ▸ | MEN1 | O00255 | 1/20 | 0.35 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.35 |
| ▸ | NPC1 | O15118 | 2/20 | 0.33 |
| ▸ | MAPT | P10636 | 2/20 | 0.33 |
| ▸ | RAB9A | P51151 | 2/20 | 0.33 |
| ▸ | HPGD | P15428 | 1/20 | 0.33 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.33 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.33 |
| ▸ | SIGMAR1 | Q99720 | 1/20 | 0.33 |
| ▸ | NPY1R | P25929 | 1/20 | 0.33 |
| ▸ | NPY2R | P49146 | 1/20 | 0.33 |
| ▸ | NPY4R | P50391 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL98257 | 0.98 | TSHR (0.41) | TSHRLMNATYRKIF11ALDH1A1 | |
| Bromide SCHEMBL1923160 | 0.98 | TSHR (0.41) | TSHRLMNATYRKIF11ALDH1A1 | |
| SCHEMBL1696855 | 0.81 | RAB9A (0.41) | TSHRLMNATYRKIF11ALDH1A1 | |
| SCHEMBL4569615 | 0.79 | TSHR (0.37) | TSHRLMNATYRALDH1A1GAA | |
| SCHEMBL12257129 | 0.79 | CNR2 (0.41) | LMNASMN1; SMN2NPC1MAPTRAB9A | |
| Hydrochloric Acid SCHEMBL31108772 | 0.79 | RAB9A (0.41) | TSHRLMNATYRKIF11ALDH1A1 | |
| SCHEMBL7059010 | 0.76 | LMNA (0.38) | TSHRLMNAALDH1A1GAASMN1; SMN2 | |
| SCHEMBL31400064 | 0.74 | RAB9A (0.40) | TSHRLMNATYRKIF11ALDH1A1 | |
| SCHEMBL137128 | 0.71 | ACHE (0.40) | LMNAALDH1A1GAASMN1; SMN2ACHE | |
| SCHEMBL424728 | 0.71 | TSHR (0.73) | TSHRLMNATYRKIF11ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 242 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-116096760-B | Hindered amine stabilized UV-active organopalladium catalyzed polycycloolefin compositions as optical materials | 住友电木株式会社 | 2024-08-02 | — | — | CN | disclosed |
| US-11897991-B2 | UV active derivatives of Pd(AcAc)2 catalyzed polycycloolefin compositions as optical materials | PROMERUS, LLC (US) | 2024-02-13 | — | — | US | disclosed |
| WO-2023158767-A1 | DUAL CATALYST SYSTEM FOR MASS VINYL ADDITION AND CATIONIC POLYMERIZABLE COMPOSITIONS | PROMERUS, LLC (US) | 2023-08-24 | — | — | WO | disclosed |
| WO-2023158768-A1 | DUAL CATALYST SYSTEM FOR MASS ROMP AND CATIONIC POLYMERIZABLE COMPOSITIONS | PROMERUS, LLC (US) | 2023-08-24 | — | — | WO | disclosed |
| US-11667731-B2 | Stabilized UV active organopalladium compounds as vinyl addition catalysts | PROMERUS, LLC (US) | 2023-06-06 | — | — | US | disclosed |
| CN-116096760-A | Hindered amine stabilized UV-active organopalladium catalyzed polycycloolefin compositions as optical materials | 普罗米鲁斯有限责任公司 | 2023-05-09 | — | — | CN | disclosed |
| US-20230038665-A1 | STABILIZED UV ACTIVE ORGANOPALLADIUM COMPOUNDS AS VINYL ADDITON CATALYSTS | PROMERUS, LLC (US) | 2023-02-09 | — | — | US | disclosed |
| WO-2023278649-A1 | STABILIZED UV ACTIVE ORGANOPALLADIUM COMPOUNDS AS VINYL ADDITION CATALYSTS | PROMERUS, LLC (US) | 2023-01-05 | — | — | WO | disclosed |
| EP-4085083-A1 | UV ACTIVE DERIVATIVES OF PD(ACAC)2 CATALYZED POLYCYCLOOLEFIN COMPOSITIONS AS OPTICAL MATERIALS | Promerus, LLC (US) | 2022-11-09 | — | — | EP | disclosed |
| US-20170285482-A1 | ORGANIC PROCESSING LIQUID AND PATTERN FORMING METHOD | FUJIFILM CORPORATION (JP) | 2017-10-05 | — | — | US | disclosed |
| US-20100304300-A1 | PHOTOSENSITIVE COMPOSITION AND PATTERN-FORMING METHOD USING THE PHOTOSENSITIVE COMPOSITION | FUJIFILM CORPORATION (JP) | 2010-12-02 | — | — | US | disclosed |
| US-20090325102-A1 | PHOTOSENSITIVE COMPOSITION AND PATTERN FORMING METHOD USING SAME | FUJIFILM CORPORATION (JP) | 2009-12-31 | — | — | US | disclosed |
| US-20090325103-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING SAME | FUJIFILM CORPORATION (JP) | 2009-12-31 | — | — | US | disclosed |
| US-7592125-B2 | Chemically-amplified positive photoresist compositions that contain a photoactive component and blend of at least two distinct resins; a first resin that comprises hydroxy naphthyl groups and a second cross-linked resin; reduced line edge roughness | ROHM AND HAAS ELECTRIC MATERIALS LLC (US) | 2009-09-22 | — | — | US | disclosed |
| US-7592126-B2 | Positive resist composition and pattern forming method using the resist composition | FUJIFILM CORPORATION (JP) | 2009-09-22 | — | — | US | disclosed |
| US-7465528-B2 | Positive-working photosensitive composition and pattern forming method using the same | FUJIFILM CORPORATION (JP) | 2008-12-16 | — | — | US | disclosed |
| US-7341817-B2 | Photosensitive composition, compound for use in the photosensitive composition, and pattern forming method using the photosensitive composition | FUJIFILM CORPORATION (JP) | 2008-03-11 | — | — | US | disclosed |
| US-20070087288-A1 | Positive-working photosensitive composition and pattern forming method using the same | FUJIFILM CORPORATION | 2007-04-19 | — | — | US | disclosed |
| US-20030134227-A1 | Cyclic sulfonium and sulfoxonium photoacid generators and photoresists comprising same | SHIPLEY COMPANY, LLC | 2003-07-17 | — | — | US | disclosed |
| EP-1308781-A2 | Cyclic sulfonium and sulfoxonium photoacid generators and photoresists containing them | Shipley Co. L.L.C. (US) | 2003-05-07 | — | — | EP | disclosed |