SCHEMBL1096992

SCHEMBL1096992

O=[N+]([O-])c1ccc(S(=O)(=O)n2cncn2)cc1

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PARL Q9H300 1/20 0.47
LMNA P02545 3/20 0.45
SMN1; SMN2 Q16637 2/20 0.45
MEN1 O00255 1/20 0.45
PKM P14618 1/20 0.45
HPGD P15428 1/20 0.45
KMT2A Q03164 1/20 0.45
NOD1 Q9Y239 1/20 0.45
CA1 P00915 4/20 0.44
CA2 P00918 4/20 0.44
CA12 O43570 3/20 0.44
CA9 Q16790 3/20 0.44
CA14 Q9ULX7 3/20 0.44
CA3 P07451 2/20 0.44
CA4 P22748 2/20 0.44
CA6 P23280 2/20 0.44
CA5A P35218 2/20 0.44
CA7 P43166 2/20 0.44
CA13 Q8N1Q1 2/20 0.44
CA5B Q9Y2D0 2/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1826706 0.78 CA1 (0.46) LMNASMN1; SMN2MEN1PKMKMT2A
SCHEMBL24668714 0.74 TP53 (0.38) SMN1; SMN2PKMKMT2A
SCHEMBL24670440 0.74 CA1 (0.44) MEN1KMT2ACA1CA2CA12
SCHEMBL6034692 0.71 FBP1 (0.60) LMNASMN1; SMN2MEN1PKMHPGD
SCHEMBL31024013 0.71 TP53 (0.59) PARLKMT2ANOD1CA1CA2
SCHEMBL3734126 0.71 PARL (0.47) PARLLMNASMN1; SMN2MEN1PKM
SCHEMBL5594350 0.69 CA1 (0.55) PARLLMNASMN1; SMN2NOD1CA1
SCHEMBL1519692 0.68 ALDH1A1 (0.69) PARLLMNASMN1; SMN2MEN1KMT2A
SCHEMBL994055 0.68 CYP19A1 (0.57) LMNASMN1; SMN2MEN1PKMHPGD
SCHEMBL2701279 0.68 ALDH1A1 (0.44) LMNASMN1; SMN2MEN1PKMHPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 75 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20090061339-A1 TRIAZOLE CONTAINING PHOTOCONDUCTORS XEROX CORPORATION (US) 2009-03-05 US claimed
EP-4656626-A1 COMPOUND AND METHOD FOR USING SAME, PLASTICIZER COMPOSITION, RESIN COMPOSITION, RESIN MOLDED BODY, AND LAMINATED BODY Zeon Corporation (JP) 2025-12-03 EP disclosed
CN-119731222-A Mixed composition, retardation film, circularly polarizing plate, and method for producing mixed composition 住友化学株式会社 2025-03-28 CN disclosed
CN-119213041-A Polymerizable compound, polymerizable composition, optical film, and display device 住友化学株式会社 2024-12-27 CN disclosed
CN-115280199-B Polymerizable liquid crystal composition, retardation film, elliptical polarizing plate, and optical display 住友化学株式会社 2024-12-20 CN disclosed
CN-119060741-A Mixture, polymerizable liquid crystal composition, phase difference film, polarizing plate, and optical display 住友化学株式会社 2024-12-03 CN disclosed
WO-2024042834-A1 MIXED COMPOSITION, RETARDATION FILM, CIRCULARLY POLARIZING PLATE, PRODUCTION METHOD FOR MIXED COMPOSITION 住友化学株式会社 2024-02-29 WO disclosed
WO-2023223639-A1 POLYMERIZABLE COMPOUND, POLYMERIZABLE COMPOSITION, OPTICAL FILM, AND DISPLAY APPARATUS 住友化学株式会社 2023-11-23 WO disclosed
WO-2023199630-A1 POLYMERIZABLE COMPOUND AND MIXED COMPOSITION 住友化学株式会社 2023-10-19 WO disclosed
CN-116745664-A Polymerizable liquid crystal mixture and polymerizable liquid crystal composition 住友化学株式会社 2023-09-12 CN disclosed
US-20090061339-A1 TRIAZOLE CONTAINING PHOTOCONDUCTORS XEROX CORPORATION (US) 2009-03-05 US disclosed
EP-1910320-A2 INTERMEDIATE COMPOUND FOR SYNTHESIZING PHARMACEUTICAL AGENT AND PRODUCTION METHOD THEREOF Mitsubishi Tanabe Pharma Corporation (JP) 2008-04-16 EP disclosed
EP-1239332-B1 PHOTOSENSITIVE POLYSILAZANE COMPOSITION, METHOD OF FORMING PATTERN THEREFROM, AND METHOD OF BURNING COATING FILM THEREOF AZ ELECTRONIC MATERIALS USA (US) 2007-02-21 EP disclosed
WO-2007011065-A2 INTERMEDIATE COMPOUND FOR SYNTHESIZING PHARMACEUTICAL AGENT AND PRODUCTION METHOD THEREOF MITSUBISHI TANABE PHARMA CORPORATION (JP) 2007-01-25 WO disclosed
US-20060160014-A1 Photosensitive composition for interlayer dielectric and method of forming patterned interlayer dielectric NAGAHARA TATSURO 2006-07-20 US disclosed
EP-1560069-A1 PHOTOSENSITIVE COMPOSITION FOR INTERLAYER DIELECTRIC AND METHOD OF FORMING PATTERNED INTERLAYER DIELECTRIC AZ Electronic Materials (Japan) K.K. (JP) 2005-08-03 EP disclosed
EP-1548499-A1 PHOTOSENSITIVE COMPOSITION FOR INTERLAYER DIELECTRIC AND METHOD OF FORMING PATTERNED INTERLAYER DIELECTRIC AZ Electronic Materials (Japan) K.K. (JP) 2005-06-29 EP disclosed
US-6902875-B2 Photosensitive polysilazane composition, method of forming pattern therefrom, and method of burning coating film thereof CLARIANT FINANCE (BVI) LIMITED (VG) 2005-06-07 US disclosed
US-20030113657-A1 Photosensitive ploysilazane composition, method of forming pattern therefrom, and method of burning coating film thereof MERCK PATENT GMBH (DE) 2003-06-19 US disclosed
EP-1239332-A1 PHOTOSENSITIVE POLYSILAZANE COMPOSITION, METHOD OF FORMING PATTERN THEREFROM, AND METHOD OF BURNING COATING FILM THEREOF CLARIANT INTERNATIONAL LTD. (CH) 2002-09-11 EP disclosed